CrTiAlN薄膜的微观结构及其高温摩擦磨损性能

采用闭合场非平衡磁控溅射离子镀技术,在M2高速钢表面制备CrTiAlN多层薄膜。利用XRD、SEM、EDS和球-盘式摩擦磨损试验机研究薄膜微观结构和高温摩擦磨损性能。结果表明:CrTiAlN薄膜均匀致密,呈FCC结构。高温摩擦磨损试验表明:从室温到600℃,随着温度升高,薄膜摩擦系数先增大后减小,磨损量和磨损率随着温度升高而增加,CrTiAlN薄膜在600℃环境下的磨损形式主要是氧化磨损和磨粒磨损。     

离子氮化对H13钢表面CrTiAlN镀层结合强度的影响

在经过离子氮化处理的H13钢基体上,采用闭合场非平衡磁控溅射法制备了CrTiAlN硬质涂层,并与未氮化的镀膜试样进行了膜基结合强度、膜层微观结构形貌及相组成的对比。结果表明:离子氮化处理可提高基体硬度,形成硬度梯度过渡;氮化+镀膜复合处理可以显著提高膜基结合强度。     

Ti靶电流对CrTiAlN镀层组织结构及硬度的影响

利用磁控溅射技术在高速钢和单晶硅基体上沉积CrTiAlN梯度镀层,研究Ti靶电流对CrTiAlN镀层组织、相结构及硬度的影响.利用EDS、XRD和SEM分析镀层的成分、相结构及形貌,采用显微硬度计测量镀层的硬度.结果表明:随着Ti靶电流的增大,镀层中的Ti原子逐渐置换CrN中的Cr原子形成Cr-Ti-N体系,同时出现少量的TiN相;镀层生长的择优取向由(111)晶面逐渐转变为(200)晶面;镀层柱状晶的结构更为致密,其表面形貌由三棱锥结构逐步变为胞状结构;随Ti靶电流的增大,镀层硬度逐渐由1267HV升至1876HV.     

CrTiAlN涂层的高温抗氧化性能

为提高M2高速钢的高温抗氧化能力,采用闭合场非平衡磁控溅射离子镀技术,在M2高速钢基体上制备了CrTiAlN涂层。在500℃、700℃、900℃这三个温度下对试样进行氧化实验。利用SEM观察CrTiAlN涂层氧化前后表面及断面形貌,采用GIXRD和EDS分析涂层的物相组成。结果表明,CrTiAlN涂层在900℃时仍然具有良好的抗氧化性能。     

溅射沉积铝合金基CrTiAlN涂层的结构、力学以及摩擦学特性

采用反应非平衡磁控溅射技术制备出一系列LY12铝合金基CrTiAlN多层涂层,并通过X射线衍射仪、纳米压痕仪以及多功能摩擦磨损测试仪来研究CrTiAlN涂层的结构、力学以及摩擦学特性。结果表明:CrTiAlN涂层为以TiN0.9和CrN为主要组织取向的FCC结构,N2水平和衬底负偏压对涂层的力学特性和粘附强度有显著的影响。经过优化参数,在衬底偏压?55V和中N2水平条件下,CrTiAlN涂层的结合强度为10 N,显微硬度达到29.87 GPa。     

磁控溅射制备CrTiAlN梯度镀层的热冲击性能研究

采用磁控溅射技术在高速钢基体上制备不同含量的CrTiAlN梯度镀层,温度为600℃时研究镀层的抗热冲击性能,采用X射线光电子能谱仪和X射线衍射仪分析镀层成分及热冲击前后的相结构,利用场发射扫描电镜观察镀层的形貌,利用分析天平对镀层热冲击前后进行精密称重并结合光学显微镜来观察镀层热冲击后的表面形貌。结果表明,热冲击温度为600℃时,镀层有Cr2O3、TiO2等新相生成,有氧化现象发生;对于不同成分的CrTiAlN镀层,Cr含量较高、Ti含量较少的镀层具有较好的抗热冲击性能;镀层失效是循环热应力产生剪切裂纹及镀层原子和氧原子双向扩散形成非接触区共同作用的结果。     

Structure and Tribological Properties of CrTiAlN Coatings Deposited by Multi-Arc Ion Plating

CrTiAlN coatings were prepared by using a home-made industrial scale multi-arc ion plating system. The coatings were found to be composites of face-center-cubic CrN and TiN. The surface roughness, microhardness, and tribological properties of the films were significantly affected by the nitrogen pressure and dc-pulsed bias voltage applied to the substrate. The CrTiAlN coatings with the smoothest surfaces were obtained at optimum conditions of nitrogen pressure of 5.0 Pa and bias voltage of -200 V. The samples were found to exhibit a hardness of 2900 HV0.05 with an average friction coefficient of 0.16 and wear rate of 1.5×10-16 m3/N?m against cemented carbide.     

Bias effects on the tribological behavior of cathodic arc evaporated CrTiAlN coatings on AISI 304 stainless steel

In this study, CrTiAlN coatings were deposited on AISI 304 stainless steel by cathodic arc evaporation under a systematic variation of the substrate bias voltage. The coating morphology and properties including surface roughness, adhesion, hardness/elastic modulus (H/E) ratio, and friction behavior were analyzed to evaluate the impact of the substrate bias voltage on the coating microstructure and properties. The results suggest that for an optimized value of the substrate bias voltage, i.e. − 150 V, the CrTiAlN coatings showed increased Cr content and improved properties, such as higher adhesion strength, hardness, and elastic modulus in comparison to the coatings deposited by other substrate bias voltage. Moreover, the optimum coatings achieved a remarkable reduction in the steel friction coefficient from 0.65 to 0.45.     

Up-scaled Teer-UDP850/4 Unbalanced Magnetron Deposition System Used for Mass-Production of CrTiAlN Hard Coatings

Up-scaled deposition process of Teer-UDP850/4 has been established and used for massive production of CrTiAlN hard coatings in applications of anti-wear, cutting and forming tools. This deposition system uses four magnetrons that are arranged by unbalanced magnets to form closed magnetic field enabling the system running in high current density.Elemental metals of Cr, Ti and Al are used as the target materials which are co-deposited with nitrogen forming multialloy nitride, nanoscale multi-layer or superlattice hard coatings. The substrate turntable is designed as planet rotation mechanism with three folds so that components or tools with complicate geometry can be uniformly coated onto all their surfaces and cutting edges. The power units for the magnetrons are straight dc whilst the substrate is biased by pulsed dc. Two solid heaters are installed in the system to enable running a wide range of deposition temperature from 200℃ to 500℃. The pumping system is powerful that incorporated with a polycold to pump the system to a good vacuum in a very short time. A front door and a movable substrate table are available to benefit easily loading and unloading. Deposition procedure,properties and performance of the coatings is also presented in this paper.