椭球反射镜膜厚均匀性

本文分析了椭球反射镜膜层厚度均匀性对反射率的影响,从理论上得到膜厚计算公式。根据计算的膜厚分布设计了遮蔽板,获得较好的反射特性。     

A Class of Band-limited Chip Waveforms for DS-CDMA Systems

The conventional frequency domain square-root raised cosine （Nyquist） chip waveform has much poorer anti-multiple-access-interference （anti-MAI） capability than the optimal band-limited waveform in direct sequence code division multiple access （DS-CDMA） systems. However, the digital implementation of the optimal chip pulse is very costly due to the slow decaying rate of the time waveform. In addition, its eye diagram and envelope uniformity arc worse than those of the Nyquist pulse for a wide range of roll-off factors, which will incur performance degradation due to timing jitters and post non-linear processing. In this paper, based on an elementary density function of a second order polynomial, a class of second order continuous pulses is proposed. From this class of pulses, we ban find some members have faster decaying rate, bigger eye opening, more uniform envdope and stronger anti-MAI capability than the Nyquist waveform. The normalized-bandwidth-pulse-shape-factor product, the decaying rate of the tail of the time waveform, the opening of the eye diagram and the envelope uniformity of the second order continuous pulses are addressed in this paper which provides the basic information for the selection of the chip pulse for CDMA systems.     

SiH_4－O_2体系LPCVD SiO_2薄膜的工艺及其应用

本文研究了ＳｉＨ４—Ｏ２体系ＬＰＣＶＤＳｉＯ２的工艺及设备。为了得到厚度均匀性好的薄膜，改进了反应气体的进气方式和装片舟的结构，获得了每炉１００片、直径为１００ｍｍ的硅片的膜厚不均匀性≤士５％的结果。     

基于可变影响空间的多目标进化算法的解集均匀性评价方法

解集的均匀性评价是多目标进化算法中性能评价的要素之一.文中结合面向个体和面向空间的思想,提出可变影响空间的概念,并基于此提出一种解集均匀性评价方法——基于可变影响空间的多目标进化算法的解集均匀性评价方法(VISUM).该方法通过分析个体在可变影响空间内的相对均匀程度,能准确反映解集的分布均匀性.实验结果证明文中方法的可行性和有效性.     

光刻工艺中关键流程参数分析

主要介绍了光刻工艺的基本流程,并分析了光刻工艺中的流程参数及影响光刻质量的主要因素,讨论了两种不同光刻胶在不同转速下的厚度、均匀性及留膜率,提出了光刻工艺中部分常见问题的解决方法.通过工艺优化,确定AZ3100和AZ703两种光刻胶的最佳工艺参数.     

大面积应用的RF-PECVD技术研究

本文探讨采用小电极与大面积基片相对移动的方法来制造大面积薄膜的可行性,提出了采用小电极等离子体源在大面积基片上移动工作的新方法,可用于沉积(或刻蚀)均匀大面积薄膜或根据需求设计的大面积上非均匀膜厚分布的薄膜,从原理上避免大电极带来的不均匀性.介绍了这种方法中由两个电极构成的等离子体增强化学气相沉积(PECVD)系统.分析了当电极移动时,电极与真空室壁相对位置发生变化时对等离子体参数的影响.我们发现当两个射频电极之间的相位差为定值时,等离子体的分布随电极与真空室壁的距离(极-地距)变化而变化.当极-地距小于80mm时,随极-地距的增加,等离子体的悬浮电位和基片的自偏压下降,离子密度变化不明显.当极-地距大于80mm时,等离子体的分布呈稳定状态,各参数变化不明显.采用PECVD方法镀制了大面积薄膜厚度呈均匀分布和非均匀分布的两种薄膜,提供了膜厚呈线性渐变和抛物线变化的两种薄膜样片,显示了该方法的灵活性和可行性.     

离子注入工艺各个参数的调整

本文以美国EATON公司的中束流注入机为例，阐述了IC芯片生产过程中离子注入工艺如何实现高质量注入；标准注入参数的调整，以及实现高速注入所应采取的各种手段，尽量发挥离子注入机的潜能，使中束流注入机也可以注入大束流，在生产上实现高速机动，加快了工艺流程。     

Improvement of Heater Surface Flatness and Uniformity of TiN Film Deposition

The deposition rate and the thickness uniformity of chemical vapor deposition (CVD) titanium nitride films depend on wafer temperatures. The heater surface conditions, such as flatness, roughness, and surface imperfections, can greatly affect heat transfer efficiency from the heater surface to the wafer, and the process performance. Because heater surface imperfections or “hot spots” that caused poor uniformity had to be eliminated, the origin of “hot spots” was identified by a detailed study of heater surface profiles. A better visualization of “hot spots” could be obtained by comparing wafer-chucking patterns with deposition patterns. Thus, the time needed to locate “hot spots” could be shortened. The manufacturing process was revised to prevent “hot spots” and improve heater performance.     

水泥土搅拌桩桩身均匀性定量判定与评价方法

介绍一种用定量指标判定与评价水泥土搅拌桩桩身均匀性的方法。