中频数字化及数字式正交解调

本文介绍用数字式下变频法实现中频正交解调的基本原理及主要性能。     

树脂热解炭制备碳化硅晶须

用自制的配合醛树脂热解和炭源，用ＳＩＯ２超细汾作原，根据碳热还原原理，利用常规加热和微波加热两种方式，分别制备了直径在纳米级的ＳｉＣ晶须，Ｘ射线衍射、透射电检测结果表明：制备工艺和条件对ＳｉＣ晶须的性质有较大的影响。     

间苯二酚溶剂萃取液液相平衡研究

测定了“醋酸正丁酯-间苯二酚(溶质)-盐水(含0.2质量分率NaCl)”三元系在24℃、101.33kPa下的液液相平衡数据并给出了三角相图,用Hand公式对相平衡数据进行了关联,获得了可供工业连续萃取过程设计使用的关联式。本研究将醋酸正丁酯和正丁醇作为溶剂萃取间苯二酚进行了对比,并指出:醋酸正丁酯优于正丁醇。     

Littman光栅外腔可调谐Yb3+双包层光纤激光器

本文对LD泵浦的光栅外腔可调谐双包层Yb3 光纤激光器进行了实验研究．采用Littman外腔结构，研究了Yb3 光纤激光器的调谐特性．输出激光调谐范围42nm，谱线宽度0．08nm，最大输出功率达到了460mW，斜率效率约30％．并对其输出光功率随波长的变化进行了观测和分析．     

水平井眼轨迹对气井出砂趋势及工作制度的影响

出砂是影响油气井正常生产的重要因素之一。借助FEPG有限元程序自动生成平台，建立了三维应力场弹塑性地层出砂模型，并运用有限元法计算分析了不同轨迹的裸眼井井壁周围的有效塑性应变分布规律及出砂趋势，研究了气藏压力衰竭对完井方式的影响。研究表明，水平井眼轨迹对出砂有重要的影响，同一地应力环境下向不同方位延伸的水平井在投产时应该采取不同的生产压差和不同的生产制度，水平井眼轨迹对出砂的影响程度随着3个地应力差异的增大而加剧。气藏压力衰竭对井壁的稳定性和出砂趋势都有重要影响。随着气藏压力的衰竭，井壁稳定性将变得越来越差，最终导致井筒出砂。因此，对气井完井不仅应该考虑到气藏开发初期地层的稳定性状况，而且还应该考虑到气藏压力衰竭后可能出现的井壁失稳问题。     

PLC陶瓷工业窑炉可靠性及自动巡检功能设计

介绍了由PLC组成的陶瓷刀具高温烧结窑的热工系统控制及自动故障巡检功能 ,讨论了系统设计中的主要环节及出现的问题     

低价硫化铝法从氧化铝直接炭还原制铝的动力学研究

低价硫化铝法从氧化铝直接炭还原制铝的动力学过程极为复杂,过程的前期受界面化学反应控制,过程后期受扩散过程控制,并求得不同时期的活化能,反应前期:E1=63.81 kJ/mol(6.67 Pa)、E2=50.82 kJ/mol(66.7 Pa)、E3=54.72 kJ/mol(666.7 Pa)、E4=39.61 kJ/mol(1333 Pa);反应后期:E*1=112.90 kJ/mol(6.67 Pa)、E*2=89.92 kJ/mol(66.7 Pa)、E*3=97.32 kJ/mol(666.7 Pa)、E*4=51.83 kJ/mol(1333 Pa).从动力学的角度提出了反应的较佳条件.温度、真空度的提高一方面可增大反应速率,但另一方面却加大了硫化铝的挥发,仅从增大速率而言,温度应大于1100 ℃,真空度应优于1333 Pa为宜.     

用分解法编制轴类零件图程序

采用分解法编写轴类零件程序，即将具有典型结构的轴分解成若干部分，把每一部分编成通用子程序，连同尺寸标注子程序、表面粗糙度子程序、剖面线子程序、尺寸公差及形位公差子程序等一并存贮在程序库中，需要时一一调用。     

Surface tailoring of an ethylene propylene diene elastomeric terpolymer via plasma‐polymerized coating of tetramethyldisiloxane

In the research presented here, we explore the use of a low‐energy plasma to deposit thin silicone polymer films using tetramethyldisiloxane (TMDSO) (H(CH₃)₂? Si? O? Si? (CH₃)₂H) on the surface of an ethylene propylene diene elastomeric terpolymer (EPDM) in order to enhance the surface hydrophobicity, lower the surface energy and improve the degradation/wear characteristics. The processing conditions were varied over a wide range of treatment times and discharge powers to control the physical characteristics, thickness, morphology and chemical structure of the plasma polymer films. Scanning electron microscopy (SEM) shows that pore‐free homogeneous plasma polymer thin films of granular microstructure composed of small grains are formed and that the morphology of the granular structure depends on the plasma processing conditions, such as plasma power and time of deposition. The thicknesses of the coatings were determined using SEM, which confirmed that the thicknesses of the deposited plasma‐polymer films could be precisely controlled by the plasma parameters. The kinetics of plasma‐polymer film deposition were also evaluated. Contact angle measurements of different solvent droplets on the coatings were used to calculate the surface energies of the coatings. These coatings appeared to be hydrophobic and had low surface energies. X‐ray photoelectron spectroscopy (XPS) and photoacoustic Fourier‐transform infrared (PA‐FT‐IR) spectroscopy were used to investigate the detailed chemical structures of the deposited films. The optimum plasma processing conditions to achieve the desired thin plasma polymer coatings are discussed in the light of the chemistry that takes place at the interfaces. Copyright © 2004 Society of Chemical Industry