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81.
82.
溶剂对环氧乙烷催化水合制乙二醇的影响 总被引:1,自引:1,他引:0
研究了NY催化剂催化环氧乙烷水合制乙二醇(EG)过程中,溶剂、催化剂添加量和水与环氧乙烷的摩尔比(简称水比)对EG选择性的影响。实验结果表明,以丙三醇作为溶剂使催化剂进行循环,能提高EG的选择性,效果好于以生成的EG作为溶剂循环催化剂。催化剂添加量、水比和溶剂添加量对EG选择性具有较大影响,其中溶剂添加量对EG选择性的影响最显著。在低水比(1.0~4.0)条件下,EG质量分数小于30%、催化剂质量分数大于7.2%时,EG选择性稳定在95.63%~97.92%,平均值为96.80%,此结果对于进一步降低EG合成工艺的能耗具有指导意义。 相似文献
83.
84.
Dong-Soo Yoon Jae Sung Roh Sung-Man Lee Hong Koo Baik 《Journal of Electronic Materials》2003,32(8):890-898
The effect of a thin RuOx layer formed on the Ru/TiN/doped poly-Si/Si stack structure was compared with that on the RuOx/TiN/doped poly-Si/Si stack structure over the post-deposition annealing temperature ranges of 450–600°C. The Ru/TiN/poly-Si/Si
contact system exhibited linear behavior at forward bias with a small increase in the total resistance up to 600°C. The RuOx/TiN/poly-Si/Si contact system exhibited nonlinear characteristics under forward bias at 450°C, which is attributed to no
formation of a thin RuOx layer at the RuOx surface and porous-amorphous microstructure. In the former case, the addition of oxygen at the surface layer of the Ru film
by pre-annealing leads to the formation of a thin RuOx layer and chemically strong Ru-O bonds. This results from the retardation of oxygen diffusion caused by the discontinuity
of diffusion paths. In particular, the RuOx layer in a nonstoichiometric state is changed to the RuO2-crystalline phase in a stoichiometric state after post-deposition annealing; this phase can act as an oxygen-capture layer.
Therefore, it appears that the electrical properties of the Ru/TiN/poly-Si/Si contact system are better than those of the
RuOx/TiN/poly-Si/Si contact system. 相似文献
85.
86.
87.
ZnLiFeO3(ZLF)高温NTC热敏厚膜材料,是以尖晶石结构的ZnLiFeO3导电陶瓷作厚膜浆料的导电相,以Al2O3瓷为基体,用厚膜工艺制成的。实验表明,在氮气中烧结的ZLF厚膜材料,室温方阻103Ω/□级,B值约1000K。在高温500~700℃范围内,方阻降为102Ω/□级,B值仍小于1000K。是一种很有前途的高温热敏材料。 相似文献
88.
89.
Ting Gang Zhu Uttiya Chowdhury Michael M. Wong Jonathan C. Denyszyn Russell D. Dupuis 《Journal of Electronic Materials》2002,31(5):406-410
In this paper, we report the study of the electrical characteristics of GaN and AlGaN vertical p-i-n junctions and Schottky
rectifiers grown on both sapphire and SiC substrates by metal-organic chemical-vapor deposition. For GaN p-i-n rectifiers
grown on SiC with a relatively thin “i” region of 2 μm, a breakdown voltage over 400 V, and forward voltage as low as 4.5
V at 100 A/cm2 are exhibited for a 60-μm-diameter device. A GaN Schottky diode with a 2-μm-thick undoped layer exhibits a blocking voltage
in excess of ∼230 V at a reverse-leakage current density below 1 mA/cm2, and a forward-voltage drop of 3.5 V at a current density of 100 A/cm2. It has been found that with the same device structure and process approach, the leakage current of a device grown on a SiC
substrate is much lower than a device grown on a sapphire substrate. The use of Mg ion implantation for p-guard rings as planar-edge
terminations in mesageometry GaN Schottky rectifiers has also been studied. 相似文献
90.
The purpose of this paper is to evaluate two methods of assessing the productivity and quality impact of Computer Aided Software Engineering (CASE) and Fourth Generation Language (4GL) technologies: (1) by the retrospective method; and (2) the cross-sectional method. Both methods involve the use of questionnaire surveys. Developers' perceptions depend on the context in which they are expressed and this includes expectations about the effectiveness of a given software product. Consequently, it is generally not reliable to base inferences about the relative merits of CASE and 4GLs on a cross-sectional comparison of two separate samples of users. The retrospective method that requires each respondent to directly compare different products is shown to be more reliable. However, there may be scope to employ cross-sectional comparisons of the findings from different samples where both sets of respondents use the same reference point for their judgements, and where numerical rather than verbal rating scales are used to measure perceptions. 相似文献