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71.
72.
Low dielectric poly[methylsilsesquioxane‐ran‐trifluoropropylsilsesquioxane‐ran‐(2,4,6,8‐tetramethyl‐2,4,6,8‐tetraethylenecyclotetrasiloxane)silsesquioxane]s {P[M‐ran‐TFP‐ran‐(TCS)]SSQs} having various compositions were synthesized using trifluoropropyl trimethoxysilane, methyl trimethoxysilane and 2,4,6,8‐tetramethyl‐2,4,6,8‐tetra(trimethoxysilylethyl)cyclotetrasiloxane. The chemical composition of the polymers and the content of SiOH end‐groups were controlled by adjusting the reaction conditions, and they were characterized by 1H‐NMR. The thermally decomposable trifluoropropyl groups on the P[M‐ran‐TFP‐ran‐(TCS)]SSQ backbone and heptakis(2,3,6‐tri‐O‐methyl)‐β‐cyclodextrin (CD) were employed as pore generators. The dielectric constants of the porous CD/P[M‐ran‐TFP‐ran‐(TCS)]SSQ films were in the range 2.0–2.7 (at 100 kHz) depending on the concentration of the porogens, and showed no change over 4 days under aqueous conditions. The pore size of the films showed a bimodal distribution, with diameters of ca 0.5–1.0 nm for those originating from the trifluoropropyl groups and 1.7 nm from the CD. The elastic modulus and hardness of the 30 vol% CD‐blended film with a dielectric constant of 2.26 were 2.40 and 0.38 GPa, respectively, as determined by a nanoindenter. Copyright © 2005 Society of Chemical Industry 相似文献
73.
This study is concerned with the stability of a two-dimensional incompressible conducting liquid film surrounded by a passive
conducting medium, when an electric field is applied in a direction parallel to the initially flat bounding fluid interfaces.
Currents generate charges at the bounding interfaces which in turn affect the stress balances there. In the absence of an
electric field, the viscous liquid film is stable (instability can be induced by the inclusion of van der Waals forces for
ultra thin films). A complete model is presented, at arbitrary Reynolds number, which accounts for conductivity and permittivity
contrasts between the fluid and surrounding medium, as well as surface tension. The linear stability of the system is considered
for arbitrary Reynolds numbers and it is shown that the stable film can become unstable if, (i) σ
R
ɛ
p
>1, or (ii) σ
R
ɛ
p
<1 and (σ
R
−1)(1−ɛ
p
)<0, where σ
R
is the ratio of outer to inner conductivity and ε
p
is the ratio of inner to outer permittivity. Instability is possible only if the electric field is non-zero and the scalings
near bifurcation points that can be used to construct nonlinear theories are calculated. Several asymptotic limits are also
considered including zero Reynolds numbers and short or long waves. The instability criteria given above are constructed explicitly
in the case of Stokes flow. 相似文献
74.
介绍了池27井实施机抽排水工艺取得累计排水13 334.4m3的明显效果.分析了五次检泵的原因.提出了对池27井机抽排水的四点认识. 相似文献
75.
76.
77.
78.
低渗透油田合理注采井距的确定--以纯41块沙4段低渗透油田为例 总被引:3,自引:1,他引:2
以纯41块沙4段低渗透油田为例,从低渗透油田渗流机理出发,分析了造成低渗透油田开发效果差的主要原因。在计算注水井最大井底流压、油井最小井底流压、油水井之间可建立的最大注采压差的基础上,结合室内试验确定的最小启动压力梯度公式计算油田技术极限注采井距,并结合经济合理井距计算结果,确定了油田合理注采井距,并提出了下二步调整方案,实施后取得了显著的效果。该方法为低渗透油田合理井距的确定、提高低渗透油田的开发效果提供了理论依据。 相似文献
79.
裂缝性油气藏采收率:100个裂缝性油气田实例的经验总结 总被引:5,自引:2,他引:3
通过对世界上100个裂缝性油气藏的综合评价,研究储集层及流体本身的性质(包括孔隙度、渗透率、黏度、可动油比例、含水饱和度、润湿性及裂缝分布特征等)和驱动机制及油藏管理战略(优化日产量和采用不同类型的提高采收率技术)对其最终采收率的影响。将裂缝性油气藏分为4类:I类的基质几乎没有孔隙度和渗透率,裂缝是储存空间和流体流动的通道;Ⅱ类的基质有较低的孔隙度和渗透率,基质提供储存空间,裂缝提供流动通道;Ⅲ类(微孔隙)的基质具有高孔隙度和低渗透率,基质提供储存空间,裂缝提供流动通道;Ⅳ类(大孔隙)的基质具有高的孔隙度和渗透率,基质提供储存空间和流动通道,裂缝仅增加渗透率。对26个Ⅱ类油气藏和20个Ⅲ类油气藏的开采历史的研究表明:Ⅱ类油气藏的采收率受水驱强度和最优日产量控制,日产量过高会很容易破坏Ⅱ类油气藏,一些Ⅱ类油气藏如果管理得当,采收率可以很高,不需要二次或三次采油;Ⅲ类油气藏的采收率主要受岩石和流体本身性质的影响,特别是基质渗透率、流体重度、润湿性以及裂缝强度等,不进行二次或三次采油不可能完全开采,往往需要采用一些提高采收率的专门技术。以往将Ⅱ类和Ⅲ类裂缝性油气藏归为一类,认识它们的区别将有助于选择更好的开发策略。 相似文献
80.
Chemical mechanical polishing of polymer films 总被引:2,自引:0,他引:2
Strategies to reduce capacitance effects associated with shrinking integrated circuit (IC) design rules include incorporating
low resistivity metals and insulators with low dielectric values, or “low-κ” materials. Using such materials in current IC
fabrication schemes necessitates the development of reliable chemical mechanical polishing (CMP) processes and process consumables
tailored for them. Here we present results of CMP experiments performed on FLARE™ 2.0 using a specialized zirconium oxide
(ZrO2) polishing slurry. FLARE™ 2.0 is a poly(arylene) ether from AlliedSignal, Inc. with a nominal dielectric constant of 2.8.
In addition, we provide insight into possible removal mechanisms during the CMP of organic polymers by examining the performance
of numerous abrasive slurries. Although specific to a limited number of polymers, the authors suggest that the information
presented in this paper is relevant to the CMP performance of many polymer dielectric materials. 相似文献