自动替代虚假点数据的数据处理方法

本文给出自动剔除虚假点并使用合理值加以替代的方法。     

湛江发电厂一号机振动的原因分析及处理

对湛江发电厂1号机4号轴瓦振动大的问题进行分析,认为其主要原因为:低压缸变形大导致动静碰摩,轴承座及盘车箱下部脱空引起刚度降低,轴承座的固有频率与工频相近等。对此,采取了相应的处理措施,实施后4号轴瓦振动得到有效解决。     

全新冷却方式双椭圆泵浦腔的实验研究

报导一种全新冷却方式的双椭圆泵浦腔，具有较高的泵浦效率和光学均匀性。１．０６μｍ调Ｑ脉冲输出能量总转换效率η＞０．７５％     

动基座自校零压电陀螺

研制的一种压电陀螺能在动基座条件下自动消除由于温度和时间变化造成的零位漂移。典型的产品可使零位变化小于０．０５°／ｓ。零位的温度系数小于０．０００５°／ｓ／℃。     

一种快速的海面特征SAR成像仿真技术

水下物体运动引起扰动，会在海面产生尾迹。这种尾迹特征同运动物体的参数和下潜的深度以及海况有关。研究这种尾迹特征及其合成孔径雷达(SAR)成像，就有可能利用SAR来检测这个水下运动物体。本文给出了一种水下运动物体的伴流尾迹的快速模拟方法及其合成孔径雷达(SAR)成像仿真方法，并对模拟仿真的结果进行了讨论。     

纯铜双层辉光离子渗钛组织形成机理及性能分析

采用双层辉光离子渗金属技术对纯铜进行了渗钛处理。用配有能谱仪(EDS)的扫描电子显微镜(SEM)、X射线衍射仪和透射电子显微镜对合金层的显微组织形貌、钛含量分布、相组成及相结构类型进行了观察与测定，对合金层的形成机理进行了探讨，并对其性能进行了对比测定。结果表明：渗钛层由合金层和扩散层组成，合金层主要由TiCu (Cu)固溶体 TiCu4构成，TiCu4为Dla型有序相，TiCu为B2型有序相，扩散层为(Cu)固溶体。渗钛处理后纯铜的表面得到显著强化。     

ON THE INVERTIBILITY OF PERIODIC MOVING-AVERAGE MODELS

Abstract. A sufficient condition for the invertibility of univariate periodic moving-average models has been given by Cipra and Ghysels and Hall. We show that this condition is not a necessary one, and provide a necessary and sufficient condition for the general m -variate, d -periodical moving-average MA( q ) case.     

Jitter in ATM networks and its impact on peak rate enforcement

Cells arriving to an ATM network experience random delays due to queueing in upstream multiplexing stages, notably in customer premises. This is the phenomenon of jitter and the aim of the present paper is to study its influence on peak rate enforcement. We first introduce some general characterizations of jitter and then, describe two models of jittered flows based on simple queueing systems. We discuss the objectives of peak rate enforcement and study the impact of jitter on the dimensioning of jumping window and leaky bucket mechanisms. A useful synthetic characterization of jitter appears to be a remote quantile of the cell delay distribution expressed in units of the initial inter-cell interval.     

有机电沉积涂料的新动向

阴极电沉积涂料是 2 0世纪 70年代以来发展起来的一种新的涂装方法 ,具有挥发性有机物 (VOCs)和有害空气污染物(HAPs)含量低、防蚀能力强、漆膜质量好、涂料利用率高、适合涂装结构复杂的构件和设备等特点。介绍了近年来阴极电沉积涂料研发的新动向。它们主要集中在有机双层电涂和高分子 聚电解质 /低聚物电解质复合物多层电涂体系 ,这些新的电涂体系在涂料的稳定性以及涂层的物理化学性质和力学性能方面具有明显的改进。     

Low-resistance polysilicon process in contact application for high density devices

For the lowest resistance, it is required to have the epitaxial silicon contact between the silicon plug and the substrate and good step coverage at the high aspect-ratio contact holes, simultaneously. In this work, a double polysilicon (DPS) deposition technique was proposed for the requirements. The first, thin silicon layer is deposited in a single-wafer process chamber with an in-situ H₂-RTP (rapid thermal process) treatment for the epitaxial contact, and the second silicon layer is formed in a batch-type furnace for good step coverage. From chain resistance, Kelvin R_c, and current-voltage (I–V) measurement, the DPS process meets both low resistance and good uniformity, so that it suggests a breakthrough in the small-sized, semiconductor device application.