基于介电泳效应的高速抛光电极分布仿真研究与实验验证

目的解决传统平面环抛过程中存在的两种问题:(1)抛光液受抛光盘和工件旋转离心力作用而抛光液在加工区域分布不均,导致加工工件高平面度差;(2)抛光液受到的离心力作用限制了抛光盘转速,导致抛光效率低。方法提出一种基于介电泳效应的平面抛光方法(DEPP),在抛光区域增加一个非均匀电场,利用中性粒子在非均匀电场中极化后受介电泳力的作用,使其具有向电极和抛光区域中心运动的现象,降低旋转离心力对抛光液的甩出作用,实现对平面工件的高速、高精度抛光。采用有限元分析软件数值模拟极化后磨粒所受介电泳力对离心力的抑制作用,优化产生非均匀电场的不同电极宽度,得到最优非均匀电场电极分布参数,实际测量优化电极后抛光液所受介电泳力的大小和方向,最后搭建试验平台验证介电泳效应高速抛光平面工件的有效性。结果提高抛光盘转速,进行抛光磨砂玻璃对比实验,加工1 h以后,采用介电泳效应抛光能完全去除玻璃磨砂层,工件平整度好,最终RMS值为0.276λ;无介电泳效应抛光后,工件中心部分磨砂层仍有存在,工件平整度相对较差,最终RMS值为0.694λ。通过测量加工去除量,介电泳效应抛光比无介电泳效应抛光的去除率提升了18%结论通过仿真模拟和实验验证,证明了调整电极布置形式以及优化电极分布参数后,介电泳效应高速平面抛光的方法能够有效提升抛光效率和抛光后工件表面平面度。     

石雕工艺石加工用软磨具的研究及应用

本文提出采用进口AMINO MOULDING COMPOUND(氨基浇铸压模混合物)取代目前国内生产使用酚醛树脂，并加入氯丁橡胶进行混炼对氨基树脂进行改性，制作成锋利又耐磨、耐热、耐水，剥离强度高，柔韧性好的软磨具磨具，应用于石雕工艺品磨削加工，获得较好的效果。     

蓝宝石晶片纳米级超光滑表面加工技术研究

本文提出以蓝宝石塑性磨削和化学机械抛光为主要手段，以原子力显微镜为主要检测工具，来制备满足光电子领域要求的纳米级超光滑蓝宝石晶片的新方法。在高刚性磨床上，用W7的金刚石砂轮以f=1μm／r进给量，实现了蓝宝石晶片的浅损伤塑性域磨削。配制了以SiO2溶胶为抛光料的监宝石晶片专用抛光液，稳定地获得了无损伤层的RMS小于0.2nm的超光滑蓝宝石晶片表面。GaN外延生长所需蓝宝石晶片的合理抛光参数是：SiO2的粒子直径为7nm、浓度为3％、pH=11、压力P=200Pa。     

Ab-initio calculation of enthalpies of formation of intermetallic compounds and enthalpies of mixing of solid solutions

A large number of ab-initio calculations of energies of formation of intermetallic compounds have been performed in the last 15 years. The currently used methods are listed. The paper presents a review of the aluminium based compounds which have been studied. Comparisons of calculated and experimental enthalpies of formation are provided for aluminim-3d and-4d transition metal alloys at equiatomic composition. The modelling of the enthalpies of mixing of solid solutions based on a given lattice is described.     

长余辉发光粒子与光催化剂在SiC晶圆化学机械抛光中的协同作用

目的 获得一种可改善单晶SiC晶圆化学机械抛光(CMP)效率的复合增效技术，实现单晶SiC晶圆高效率和低成本的加工要求，并对其增效机理进行深入研究。方法 通过抛光实验和原子力显微镜测试，探究长余辉发光粒子(LPPs)与不同光催化剂的协同作用对SiC–CMP的材料去除速率和表面粗糙度的影响。结合扫描电子显微镜(SEM)、紫外–可见漫反射光谱仪(UV–vis)、光致发光光谱仪(PL)和X射线光电子能谱仪(XPS)等仪器的测试结果，研究LPPs与光催化剂的协同增效机理。结果 与传统CMP的条件相比，在光催化条件下采用LPPs(质量分数0.5%)+TiO2(质量分数0.5%)+ H2O2(质量分数1.5%)+Al2O3(质量分数2%)的抛光液时，SiC的材料去除速率(MRR)由294 nm/h提高到605 nm/h，同时获得的晶圆表面粗糙度(Ra)为0.477 nm。然而，采用含有LPPs和ZrO2的抛光液抛光SiC时，其材料去除速率和表面粗糙度都未得到明显改善。XPS测试结果表明，LPPs与光催化剂的协同作用增强了抛光液对SiC的氧化作用。UV–vis和PL测试结果显示，LPPs与不同光催化剂协同效果的差异主要与其光学性能有关。结论 在光催化条件下，LPPs和TiO2对单晶SiC–CMP具有协同增效的作用，然而LPPs和ZrO2没有展现出协同增效的作用，即LPPs与光催化剂的协同作用可以改善SiC–CMP的性能，但是光催化剂的选择需要考虑LPPs的发光特性。     

Isothermal section at 1673 K of the Mo–Ru–Si diagram and crystallographic structures of ternary phases

Efforts to improve the high temperature behavior of MoSi₂ in oxidizing environments led to the investigation of the Mo–Ru–Si phase diagram. The isothermal section at 1673 K was determined by X-ray diffraction, optical and scanning electron microscopies and EPMA. Five new silicides were identified and their crystallographic structure was characterized using conventional and synchrotron X-ray as well as neutron powder diffraction. Mo₁₅Ru₃₅Si₅₀, denoted α-phase, is of FeSi-type structure, space group P2₁3, a=4.7535 (5) Å, D_x=7.90 g. cm⁻³, Bragg R=7.13. Mo₆₀Ru₃₀Si₁₀ is the ordered extension of the Mo₇₀Ru₃₀ σ-phase with space group P4₂/mnm, a=9.45940(8) Å, c=4.94273(5) Å, D_x=6.14 g. cm⁻³, Bragg R=5.75.     

3D surface topography assessment of the effect of different electrolytes during electrochemical polishing of EDM surfaces

In many countries the most common polishing practice in die making is to hand polish the part as a finishing operation after the electro discharge machining process (EDM). The usual polishing abrasives are silicon carbide paper and diamond paste of different grit sizes.However, during the last decade researchers especially in Japan and the USA have tried to combine EDM and electrochemical machining (ECM) in one machine so as to use the positive aspects of each individual process. The ECM process uses high density, typically 50 A/cm², and also a pulse current with a servo-controlled electrode. These investigators have mostly used sodium nitrate solutions (of different concentrations) as the electrolyte.This paper deals with an experiment that was undertaken in order to assess the effect of four different electrolytes in an electrochemical polishing process (ECP) on the surface topography of EDM surfaces. The primary set of 3D surface parameters was used as a basis to characterise the surface produced by the combined processes in different electrolytic media.     

基于图象识别的高抛光透射面缺陷检测

对高抛光透射面的缺陷进行分类,构建基于图像识别技术的高抛光透射面缺陷检测系统模型,探讨高抛光透射面缺陷图谱分析的技术要点。针对在实际检测过程中出现的图像过曝光和低曝光问题,提出高抛光投射面图像获取时的图像过曝光或低曝光问题的解决办法。在matlba环境下进行图像数字化处理及特征提取,实现高抛光透射面缺陷图谱的计算机自动分析。大量的模拟和真实图像实验结果表明,所给出的方法具有求解精度高、鲁棒性强的优点,表明这些方法是可行的,具有一定的实用价值。     

锑化铟抛光片表面粗糙度优化研究

锑化铟是中波红外探测应用较广的材料。抛光片的表面粗糙度是影响器件性能的关键指标。研究了锑化铟化学机械抛光(Chemical Mechanical Polishing, CMP)液的pH值、氧化剂比例以及抛光液流速对锑化铟抛光片表面粗糙度的影响,并结合原子力显微镜(Atomic Force Microscope, AFM)和表面轮廓仪测试对抛光片的表面粗糙度进行了表征和优化。结果表明,当pH值为8、氧化剂比例为0.75%、抛光液流速为200 L/min时,InSb晶片的表面粗糙度为1.05 nm (AFM),同时晶片的抛光宏观质量较好。     

Empirical approach to develop a multilayer icebonded abrasive polishing tool for ultrafine finishing of Ti-6Al-4V alloy

This paper covers the development of a multilayer icebonded abrasive polishing (IBAP) tool for multistage polishing of Ti-6Al-4V alloy specimens based on a systematic study that determined the number of layers, thickness of each layer, and the type, size and concentration of abrasives in each layer. Based on this study, a three-layered IBAP tool with the bottom layer consisting of soft aluminum oxide abrasives of 3?µm size with 5% concentration, the middle layer with moderately hard silicon carbide abrasives of 8?µm size with 10% concentration and the top layer with hard boron carbide abrasives of 15?µm size with 30% concentration was formulated for ultrafine finishing of Ti-6Al-4V alloy specimen in a single setup. The performance of the three-layered IBAP tool assessed in terms of finish and morphology over the work surface showed 81% improvement in surface finish, showing its effectiveness over a single-layered IBAP tool. Polishing studies have clearly demonstrated the generation of ultrafine surfaces, yielding a finish of 37?nm while the morphological studies on the polished surface have shown a nearly scratch-free surface on the Ti-6Al-4V alloy.