Microstructure of ternary Zn1-xCdxO films on silicon substrate

Ternary Zn1-x CdxO alloying films were deposited on silicon substrates by a reactive magnetron sputtering method. The structures of the films were characterized by transmission electron microscopy(TEM) and X-ray diffraction(XRD) analysis, respectively. The XRD measurement shows that the wurtzite-type structure of Zn1-xCdxO can be stabilized up to Cd content of x=0.53 without a cubic CdO phase separation. The TEM measurement shows that the films have a columnar structure and the grains are highly c-axis oriented perpendicularly on silicon substrate although some grain boundaries are slightly tilted. High resolution TEM observation indicates that a native layer of amorphous SiO2 exists at the ZnCdO/Si interface and that ZnCdO grains with c-axis preferred orientation nucleate directly on substrate surface.     

Effects of ZrO2 on the structure and magnetic properties of CoPt thin films

[CoPt 1.5 ml/ZrO2 xnm]10 multilayer films were deposited on glass substrates by magnetron sputtering and then annealed in vacuum at 600℃ for 30 min. Their structures and magnetic properties were investigated as a function of ZrO2 content. The results show that the grain size and coercivity first increase and then decrease with the increase in ZrO2 content. The maximum coercivity and grain size are obtained at 37 vol.% of ZrO2. The content of ZrO2 in the film plays an important role in the separation of CoPt grains and in the reduction of intergrain exchange interaction. On the basis of the studies of angular dependent coercivity, it is found that the magnetization reversal of CoPt films with （111 ） texture is different from either the domain wall motion or the S-W type of rotation mode.     

Microstructure and mechanical properties of pulsed DC magnetron sputtered nanocomposite Cr-Cu-N thin films

The nanocomposite Cr-Cu-N thin films have been deposited at a substrate temperature of 250 °C by a bipolar asymmetric pulsed DC reactive magnetron sputtering process. Different Cu contents ranging from 0.4 to 14.9 at.% were achieved. The structures of Cr-Cu-N thin films were analyzed by XRD. The surface and cross sectional morphologies of thin films were examined by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The nanoindentation and scratch tests were adopted to evaluate the mechanical and tribological properties of Cr-Cu-N coatings. The influences of Cu content on the structure, mechanical and tribological properties of Cr-Cu-N coatings were explored. It is observed that the columnar structure no longer exists when the Cu content exceeds 10.9 at.%. The stability of CrN phase in the coating is influenced by the Cu content. The scratching coefficient of thin films decreases with increasing Cu content. Sufficient adhesion and tribological properties of Cr-Cu-N coatings are achieved. The maximum average hardness around 20 GPa and scratching coefficient around 0.1 are found in the coatings with around 2.1 to 2.6 at.% Cu in this work.     

Microstructure, mechanical and tribological properties of Cr1−xAlxN films deposited by pulsed-closed field unbalanced magnetron sputtering (P-CFUBMS)

Nanocrystallized Cr_1−xAl_xN films with various Al contents (0 to 68 at.%) were deposited by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS). The effects of aluminum content on the microstructure, mechanical and tribological properties of the Cr_1−xAl_xN films have been investigated. It was found that the hardness and elastic modulus of Cr_1−xAl_xN films increased with increasing Al contents in the films and reached the highest value of 36 GPa and 370 GPa, respectively, at an Al content of 58.5 at.%. Addition of Al beyond 64.0 at.% resulted in a change in crystal structure from B1 cubic to B4 hexagonal phase. The wear resistance improved gradually with the increase of Al in the Cr_1−xAl_xN films. A combination of the abrasive and adhesive wear mechanism was proposed based on the SEM and EDS analysis of the wear track. The steady state dry coefficient of friction measured against a WC ball for the Cr_1−xAl_xN films were in the range of 0.36-0.55, and the wear rate was in the 10^− 6 mm³ N^− 1 m^− 1 range.     

THE EFFECTS OF SPUTTERING POWER ON STRUCTURE AND ELECTRICAL PROPERTIES OF Cu FILMS

1. IntroductionCu filnls are very pron1isillg for electronic devices because of both high electromigrationresista11ce alld high electrical conductivity['--']. For a sputter-deposited film, base pressure,deposition rate, substrate temperature and energetic…     

Preparation and optical properties of Nb-NbN multilayer films as solar selective absorptive coatings

Based on the cermet double layer structure, Nb-NbN multi-layer films for solar selective coatings were deposited by direct current reactive magnetron sputtering. The Nb/Nb-NbN/Al2O3 trilayered structure was deposited on a stainless steel (SS) substrate by using a single niobium target. The expected components were adjusted by changing the gas flowing ratios of Ar: N2. The Al2O3 antireflective layer on the top of the film was produced by r. f. magnetron sputtering using Al2O3 ceramic target. A solar absorptivity of 0.94 and a normal emissivity of 0.16 at room temperature have been achieved for the coating. Thermal vacuum aging to the samples was carried out at 350 and 500 ℃ for 1 h. The results show a good thermal stability. Microstructure and its dependence on temperature of the Nb, NbN and Nb-NbN single layers were investigated, respectively.     

High temperature oxidation of a (Cr2N−Mo2S3)/Cr double-layered coating deposited on steel by D.C. magnetron sputtering

A coating consisting of (Cr₂N−Mo₂S₃) overlay coating and an underlying Cr coating was deposited on a steel substrate by D.C. magnetron sputtering. The oxidation characteristics of the deposited double-layered coating were studied at temperatures ranging from 400 to 900 °C in air. The oxidation product was primarily Cr₂O₃. The unreacted coating beneath the oxide scale had some dissolved oxygen, sulfur, and iron. Oxidation of the coating occurred via complex routes such as the outward diffusion of chromium and nitrogen from Cr₂N and iron from the substrate, and the inward transport of oxygen from air, chromium from Cr₂N, and S from Mo₂S₃. This counter diffusion of various ions occurred easily via fine crystallites that constituted the coating, which had some solubility of S, O, and Fe.     

氮化碳薄膜的电子结构和光学性质

在不同条件下用射频溅射方法制备了氮化碳薄膜。薄膜的电子结构和元素成分用傅里叶变换红外光谱(FTIR)和光电子能谱 (XPS)进行分析 ,薄膜的光学性质用紫外可见近红外光谱 (UV)进行检测。薄膜中的最大氮原子含量达到 0 .4 7,C1s和N1s电子的结合能产生了 2 .4 1～ - 1.7eV的移动 ,移动的大小取决于制备条件。UV谱表明氮化碳薄膜能强烈地吸收紫外光 ,而对红外光有较好的透明性 ,在 2 72 0nm附近存在一明锐的吸收峰 ,并给出了形成这一明锐吸收峰的适宜条件。这些结果对作为保护光学涂层的红外应用是有意义的。     

溅射气氛中O2／Ar比及热处理对直流反应磁控溅射法制备玻璃基TiO2薄膜结构与亲水性的影响

在工作气压为0．80Pa的氧氩气混合气氛下，改变氧与氩的流量比(O2／Ar：0．10，0．20，0．30)，在预先镀10nm左右SiO2的普通玻璃基片上用直流(D．C．)磁控溅射法制备了300nm左右的TiO2薄膜试样。离线在500℃、氧气氛下对试样热处理2h。用X射线光电子能谱(XPS)和X射线衍射仪(XRD)分别研究了试样热处理前后的表面元素组成、离子状态和物相组成，用接触角分析仪测试了试样在紫外光(UV)照射后的水润湿角。     

磁控溅射在镁合金表面处理中的应用

采用磁控溅射制备的合金表面膜层具有防腐蚀性能优异、耐磨性强等优点,其作为镁合金表面处理技术具有良好的发展趋势。简要介绍了磁控溅射的基本原理及其在镁合金表面处理中的一些应用,并着重给出了反应磁控溅射“Berg”模型的简化计算方法,最后对国内外磁控溅射的最新技术以及应用于镁合金表面处理的趋势进行了展望。