Chemical vapor deposition of aluminum for ulsi applications

Aluminum has been used widely as a conducting material in the fabrication of integrated circuits, and chemical vapor deposition process for Al has been actively investigated for the application in ultra large scale integration. In this review, various precursors, mainly alkyl aluminum and alane compounds, and reaction mechanisms of these precursors in Al CVI) are described. Epitaxial growth and selectivity of the deposition are also discussed. In addition to thermal reactions, plasma and photochemical reactions are also briefly described.     

提高大口径金属主镜面形精度的方法

分析了影响Ｒｉｔｃｈｅｙ－Ｃｈｒｅｉｔｉｅｎ光学系统中金属主反射镜面形精度因素，采用有限元法对立交易的加工过程及其安装进行了模拟，指出提高主镜的面形镜度，既要合理主镜材料的热处理工艺，也要对加工参数进行控制。良好的稳定化处理可以有效地消除材料内部的残余应力，保证主镜尺寸的稳定性。提高加工基准的精度，并采用组合加工镜面，可以大大提高主镜的面形精度，最后，给出了主镜的干涉仪检测结果。     

厚膜导体的金属迁移研究

金属迁移能导致混合微电路发生灾难性失效。本文介绍一种简单易行的测试方法－水滴试验法，来测量厚膜电路的实际金属迁移率。用引方法测量时，发现Ｐｄ－Ａｇ导体的迁移率最大，Ｐｔ－Ａｕ导体的金属迁移率最小。     

In situ13C NMR study of tert-butanol interaction with moderately concentrated sulfuric acid

An in situ NMR study of tert-butanol dehydration in 95 and 85% sulfuric acid did not indicate the formation of tert-butyl cations as active reaction intermediates. Instead, only NMR lines from oxonium ions under the condition of fast exchange with water and the acid were observed. It is most likely that, in the concentrated acid, the active intermediates of this reaction are represented by tert-butyl sulfuric ester which probably is a precursor of invisible tert-butyl carbenium ions representing short-lived excited or transition states.     

Electrodeionisation 3: The removal of nickel ions from dilute solutions

The removal of nickel ions from dilute solutions using a process that combines an ion-exchange bed with electrodialysis has been studied. The main aspects include: the concentration of nickel ions in the diluate, the voltage over the cell and the current density distribution along the ion-exchange bed. The current density distribution provides insight into the state of the bed as it is simultaneously loaded with Ni²⁺ and regenerated with an electric potential difference applied perpendicular to it. A simple model is used to describe the state of the bed and the quantity of nickel removed from it as a function of time. Under specific conditions the precipitation of metal hydroxides is observed in the compartment containing the ion-exchange bed. The results show that hydroxide precipitation is related to the nickel concentration in solution and the electric potential gradient across the bed.     

Pitting corrosion of Cr–Mn–N steel in sulphuric acid media

The resistance to pitting corrosion of austenitic stainless steel Cr18Mn12N has been studied in model solutions of sulphuric acid (0.5 m) containing chloride ions (0.5 m). The cyclic potentiodynamic method has been employed to investigate the effects of chloride ions and agitation rate on the pitting and repassivation potentials. Electron and optical microscopy, electron diffraction spectroscopy and atomic absorption spectrometry have been used to detect the surface sites for pit formation and the growth of pit nuclei. The results obtained with chromium–manganese–nitrogen steel have been compared with those of austenitic Cr18Ni9 stainless steel. A similarity in pit initiation is established, while steel composition exhibits no significant effect. Cr18Mn12N steel is less prone to repassivation as compared with Cr18Ni9 steel.     

High concentration erbium doping of silicon-rich SiO2 thin films on silicon

In this work, high concentration erbium doping in silicon-rich SiO₂ thin films is demonstrated. Si plus Er dual-implanted thermal SiO₂ thin films on Si substrates have been fabricated by using a new method, the metal vapor vacuum arc ion source implantation with relatively low ion energy, strong flux and very high dose. X-Ray photoelectron spectroscopy measurement shows that very high Er concentrations on the surfaces of the samples, corresponding to 10 at.% or the doping level of 10²¹ atoms cm⁻³, are achieved. This value is much higher than that obtained by using other fabrication methods such as the high-energy ion implantation and molecular beam epitaxy. Reflective high-energy electron diffraction, atomic force microscopy and cross-section high-resolution transmission electron microscopy observations show that the excess Si atoms in SiO₂ matrix accumulate to form Si clusters and then crystallize gradually into Si nanoparticles embedded in SiO₂ films during dual-ion implantation followed by rapid thermal annealing. Er segregation and precipitates are not formed. Photoluminescence at the wavelength of 1.54 μm exhibits very weak temperature dependence due to the introduction of Si nanocrystals into the SiO₂ matrix. The 1.54-μm light emission signals from annealed samples decrease by less than a factor of 2 when the measuring temperature increases from 77 K to room temperature.     

浅谈金属着色在现代首饰设计中的应用

金属着色工艺在现代工业技术的条件下已经发展到了很高的水平,有了技术的支撑,金属的固有色可以轻易得到改变,这就为现代首饰设计中各种金属的运用提供了自由空间,从此,色彩在现代首饰设计中真正扮演了主角,真正成为了现代首饰艺术中的关键造型因素,极大地丰富了现代首饰艺术的造型语言和表现力。     

基于像素差异的金属腐蚀区域分割仿真研究

研究基于图像的金属腐蚀区域分割问题,提高分割区域的准确性。针对传统基于金属本身与腐蚀颜色的区别,利用像素差异的变化进行腐蚀区域的分割,因当腐蚀颜色与金属的本体颜色相差不是很大,或者在边沿发生像素的混淆时,利用差异边缘像素相减的方法很难完整分割腐蚀区域的问题。为了解决上述问题,提出利用空间像素差异距离聚类的金属腐蚀区域图像分割算法。通过计算差异像素之间的差异距离概率,将差异像素特征进行严格划分,对划分后的结果进行排序计算,详细描述混淆边沿信息,对腐蚀区域进行完整分割。实验证明,改进方法能够对金属腐蚀造成的细微区域完整分割,取得了满意的效果,为金属腐蚀区检测提供了参考。     

Electrochemical investigation of the iron-containing and no iron-containing AB5-type negative electrodes

The electrochemical behaviour of LaNi_3.55Mn_0.4Al_0.3Co_0.75−xFe_x (x = 0, 0.15, 0.55, 0.75) intermetallic compounds has been studied and presented [C. Khaldi, H. Mathlouthi, J. Lamloumi, A. Percheron-Guégan, Int. J. Hydrogen Energy 29 (2004) 307–311; C. Khaldi, H. Mathlouthi, J. Lamloumi, A. Percheron-Guégan, J. Alloys Compd. 360 (2003) 266–271; C. Khaldi, H. Mathlouthi, J. Lamloumi, A. Percheron-Guégan, J. Alloys Compd. 384 (2004) 249–253]. It has been deduced that the LaNi_3.55Mn_0.4Al_0.3Co_0.4Fe_0.35 compound has interesting electrochemical properties. In this paper we present the electrochemical study of LaNi_3.55Mn_0.4Al_0.3Co_0.4Fe_0.35 compound properties compared with the parent LaNi_3.55Mn_0.4Al_0.3Co_0.75 compound. Several techniques, such as, the chronopotentiometry, the constant potential discharge (CPD), the cyclic voltammetry (CV) and the linear polarization (LP) were applied to characterize these electrochemical properties. The electrochemical discharge capacity of the LaNi_3.55Mn_0.4Al_0.3Co_0.75 alloy increases to reach 294 mAh g⁻¹ after few cycles only (five cycles). However, the activation of the LaNi_3.55Mn_0.4Al_0.3Co_0.4Fe_0.35 alloy takes more than 20 cycles to be achieved and the obtained maximum discharge capacity is 194 mAh g⁻¹. The hydrogen diffusion coefficient D_H was determined by constant potential discharge and cyclic voltammetry techniques. The obtained values of the LaNi_3.55Mn_0.4Al_0.3Co_0.75 and LaNi_3.55Mn_0.4Al_0.3Co_0.4Fe_0.35 compounds are 6.29 × 10⁻¹¹ and 7.62 × 10⁻¹¹, and 2 × 10⁻⁸ and 7.5 × 10⁻⁸ cm² s⁻¹ by CPD and CV techniques, respectively. The exchange current density values, determined by a linear polarization technique, are 44 and 27 mA g⁻¹, respectively, for LaNi_3.55Mn_0.4Al_0.3Co_0.75 and LaNi_3.55Mn_0.4Al_0.3Co_0.4Fe_0.35 alloys.