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71.
As an effective method of increasing its total conversion efficiency, the protective layer of solar cells was patterned with a nano-sized moth-eye structure. This pattern with its special shape and size serves as an anti-reflective layer. To form a pattern on the PVC film, the hot-embossing method was used. Moreover, a polyvinyl chloride (PVC) film patterned on both sides was also fabricated to improve the performance of anti-reflection functionality. A solar cell with a patterned PVC film as a protective layer exhibited higher quantum efficiency and total conversion efficiency than a solar cell with a bare PVC film as a protective layer.  相似文献   
72.
研究了一种制作高精度、大高宽比高铝陶瓷微器件的工艺方法。首先利用同步辐射曝光,制作出带有微结构的PMMA模具。模压后,溶去模具,在1 700℃烧结成型。利用这种工艺,获得了宽度23μm,高度400μm的陶瓷微结构。同时,利用该工艺进行了陶瓷微反应器的初步研制,实现了陶瓷微管道的加工。  相似文献   
73.
以塑料微流控芯片的热压加工技术为基础,以实现自动化和批量化为目标,对芯片热压键合设备的机械结构进行设计研究,在保证芯片受压均匀的情况下,对设备机身的结构、加压方式等进行了分析,确定设备机身采用闭式双立柱结构,上部加压方式,通过力矩电机、螺旋升降机带动压头完成压力输出,并对压头的运动进行导向。实验表明,在热压芯片时,该设备能够将优化的工艺参数复现,制作的芯片质量稳定,一致性好。  相似文献   
74.
光学双稳装置在模压全息图片母版拍摄中的应用   总被引:1,自引:1,他引:0  
外界扰动常造成干涉条纹的随机移机。在拍摄模压全息母版时,由于记录时间较长,那么干涉条纹随机漂移将会变得十分严重,使全息图片质量上降。我们提出用光学双稳装置来作条纹稳定器。利用辅助光路事先拍摄好一个辅助全息光栅,拍摄母版时将其复位,再现出干涉条纹作调制函数,用压电陶瓷作电光反馈函数。实验结果表明干涉条纹的漂移得到很好的控制,所拍摄全息图片的信噪比得到较大的提高,降低了对拍摄环境的要求,拍摄的成功率也  相似文献   
75.
光刻胶是纳米压印的关键材料,其性能将影响压印图形复制精度、图形缺陷率和图形向底材转移时刻蚀选择性。提出了成膜性能、硬度黏度、固化速度、界面性质和抗刻蚀能力等压印光刻胶的性能指标。并根据工艺特点和材料成分对光刻胶分类,介绍了热压印光刻胶、紫外压印光刻胶、步进压印式光刻胶和滚动压印式光刻胶的特点以及碳氧类纯有机材料、有机氟材料、有机硅材料做压印光刻胶的优缺点。列举了热压印、紫外压印、步进压印工艺中具有代表性的光刻胶实例,详细分析了其配方中各组分的比例和作用。介绍了可降解光刻胶的原理。展望了压印光刻胶的发展趋势。  相似文献   
76.
以醋酸乙烯酯(VAc)和甲基丙烯酸甲酯(MMA)为硬单体、丙烯酸丁酯(BA)为软单体、交联单体(TM-200)/丙烯酸(AA)为复合交联剂、叔丁基过氧化氢(TBHP)/甲醛合次硫酸钠(吊白块)为氧化-还原型引发剂、可聚合型阴离子乳化剂(SVS-25)为环保型乳化剂和Gohsefimer Z-210为改性保护胶体,采用乳液聚合法制备出食品包装材料用无毒干法覆膜胶。研究结果表明:采用减压脱除及后添加氧化-还原型引发剂,可使覆膜胶中残余单体含量降至0.01%以下;当m(VAc)∶m(MMA)∶m(BA)=30∶10∶60、乳化剂中m(SVS-25)∶m(Gohsefimer Z-210)=1∶1、w(乳化剂)=2.0%和w(氧化-还原型引发剂)=0.20%时,覆膜胶的综合性能相对最好。  相似文献   
77.
In organic photovoltaics (OPVs), active layer thicknesses are limited by exciton diffusion length. Thus, non-planar surfaces and device architectures are desired for enhancing the light absorption in OPVs. The oxidative chemical vapor deposition (oCVD) process enables the formation of conformal films of conducting polymers on complex surface structures. oCVD poly(3,4 ethylenedioxythiophene) (PEDOT) is demonstrated to be compatible with a wide range of nano- to macro-scale textured and non-planar architectures that have been demonstrated to enhance light absorption in photovoltaics by various mechanisms of light trapping, such as lengthening optical pathways and taking advantage of reflective light bouncing. Here, conformal oCVD (PEDOT) layers are demonstrated over submicron features including submicron nanowedges and nanocones (with 70–100 nm groove depth and 100 nm pitch) and square gratings (50–350 nm groove depth and 139–833.3 nm pitch). In contrast, solution-applied PEDOT:PSS exhibits blanketing, thinning at the top of the features, and welling up of material in the bottom of the features, thus failing to conformally coat the complex surfaces. The application of oCVD PEDOT to macro-scale 3D OPV architectures was also explored. Enhanced active layer absorbance is shown using tetraphenyldibenzoperiflanthene (DBP) as the absorbing layer over the PEDOT.  相似文献   
78.
This paper studied the effect of embossing on the microstructure and corrosion behaviour of an Al−1.1 wt% Mn sheet. The microstructure of the embossed Al−1.1 wt% Mn sheets was studied by differential interference contrast microscopy, scanning electron microscopy, transmission electron microscopy, energy-dispersive X-ray spectroscopy, focused ion beam microscopy and X-ray computational tomography. Finite element modelling was used to assess the stress and strain distribution developed during embossing, and to support the experimental analyses. The corrosion behaviour of the embossed sheets was assessed using potentiodynamic anodic polarisation tests, followed by corrosion surface morphology analysis. Results showed a microstructural evolution of the alloy during embossing, which is dependent on both the embossed pattern geometry and the roll forming direction. Nonsymmetrical displacement of material, in respect to the pattern geometry, was caused by the anisotropic forming pressure applied on the strip during roll forming, which yielded the formation of more susceptible sites for pitting and intergranular corrosion on the embossed aluminium surfaces.  相似文献   
79.
High ordered nano-sphere array patterns on Si substrate were fabricated using nanoimprint lithography. First, using hot embossing method, poly vinyl chloride (PVC) based polymer replica template was duplicated from original high ordered nano-sphere array patterns, which was fabricated by evaporation method. The monolayer transferring condition can be achieved by varying hot embossing pressure. Then, through UV nanoimprint lithography with the replicated polymer template, imprinted patterns, which has high ordered nano-sphere array patterns, was successfully fabricated on Si and flexible PET substrate.  相似文献   
80.
Hot‐embossed features are prepared by pushing customized and standard silicon calibration gratings, known as masters, into either polystyrene or polycarbonate, which are kept above their glass transition temperatures. droplet of a silver nanoparticle ink is then dispensed over one of these as‐formed grooves using an inkjet printer. The ink fills the grooves as a consequence of capillary forces and is observed to form tracks with a uniform width. The tracks are described as ‘invisible’ on account of having widths ranging from 5 to 15 µm. Wider tracks can be produced by dispensing more droplets and tracks with different morphologies can be produced by using different masters. Several as‐prepared features are thermally treated to produce conductive silver tracks. The conductivity of the tracks is found to be ~20% that of bulk silver.  相似文献   
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