退火温度对CuGa_(0.8)Ge_(0.2)Se_2薄膜结构及光学特性的影响

采用脉冲激光沉积法在SiO2衬底上制备了CuGa0.8Ge0.2Se2薄膜。采用X射线衍射和X射线能谱仪研究了退火温度对薄膜晶体结构和成分的影响,利用扫描电子显微镜表征了薄膜的表面形貌,采用紫外—可见分光光度计分析了薄膜的光学特性。结果表明,在CuGaSe2中掺杂Ⅳ族元素Ge,光子吸收能量分别为0.65和0.92 e V,禁带宽度为1.57 e V,能够形成中间带。并随着退火温度的升高,CuGa0.8Ge0.2Se2薄膜的光学带隙逐渐减小。     

巨大晶胞化合物Ho117Fe52Ge112的结构磁性能研究

利用X射线衍射技术和振动样品磁强计（VSM）研究了巨大晶胞三元化合物Ho117Fe52Ge112的结构与磁性能,测定了外加磁场为0．5T时该化合物的磁矩随温度的变化关系。该化合物具有Tb117Fe52Ge112结构类型,空间群为Fm3m（No．225）点阵参数为a=2．80832（8）nm。在90K到室温的范围内,Ho117Fe52Ge112的磁化率与温度关系服从居里——外斯定律,每个化学式有效磁矩的实验值为ueff=111．25us。测定了室温（300K）时磁矩随外加磁场的变化关系。当外加磁场到2．1T时,该化合物的磁矩约为3．61emu／g,还没有达到饱和状态。     

Comparison of Bi3Fe5O12 film giant Faraday rotators grown on (111) and (001) Gd3Ga5O12 single crystals

Bismuth iron garnet (Bi₃Fe₅O₁₂, BIG) epitaxial thin films were grown on single crystal (Gd₃Ga₅O₁₂, GGG) (111) and (001) substrates by rf-magnetron sputtering technique. Processing parameters have been optimized to obtain high deposition rate (2.74 μm/h) and the surface rms roughness less than 10 nm. X-ray diffraction reveals films epitaxial quality: exclusive (111) or (001) orientation with narrow rocking curves and strong in-plane texture. Films possess low optical loss and magneto-optical Faraday rotation (FR) as high as 5 deg/μm at 677 nm wavelength. Comparative analysis of films grown on (111) and (001) substrates clearly shows significant superiority of BIG/GGG(001) film. For this film, the coercive field ∼100 Oe appears to be 2.5 times lower while the optical transmission to be 10% higher than that for BIG/GGG(111) film. Enhanced magneto-optical performance of BIG/GGG(001) films relies upon better accommodation of the film-to-substrate mismatch strain through the tetragonal BIG lattice distortions compared to the rhombohedral one in BIG/GGG(111) films.     

Use of water vapor for suppressing the growth of unstable low-κ interlayer in HfTiO gate-dielectric Ge metal-oxide-semiconductor capacitors with sub-nanometer capacitance equivalent thickness

Annealing of high-permittivity HfTiO gate dielectric on Ge substrate in different gases (N₂, NH₃, NO and N₂O) with or without water vapor is investigated. Analysis by transmission electron microscopy indicates that the four wet anneals can greatly suppress the growth of a GeO_x interlayer at the dielectric/Ge interface, and thus decrease interface states, oxide charges and gate leakage current. Moreover, compared with the wet N₂ anneal, the wet NH₃, NO and N₂O anneals decrease the equivalent permittivity of the gate dielectric due to the growth of a GeO_xN_y interlayer. Among the eight anneals, the wet N₂ anneal produces the best dielectric performance with an equivalent relative permittivity of 35, capacitance equivalent thickness of 0.81 nm, interface-state density of 6.4 × 10¹¹ eV^− 1 cm^− 2 and gate leakage current of 2.7 × 10^− 4 A/cm² at V_g = 1 V.     

低磁场条件下Mn5(Ge3-xSbx)(x=0、0.1、0.2、3)合金磁热效应研究

用真空高频悬浮炉在高纯氩气保护下制备了Mn5（Ge3-xSbx）（x=0、0.1、0.2、3）合金系列样品,用直接测量方法测定了在永磁体提供的低磁场（H=1.3T）条件下样品的磁热效应曲线（ΔTad-T）,结果表明,用元素Sb替代Mn5Ge3合金中的Ge原子,不能增强合金的磁热效应,但对合金的居里温度有一定影响.     

Growth of Ge-Si nanowire heterostructures via chemical vapor deposition

The growth of Ge-Si and Ge-Si nanowire (NW) heterostructures was demonstrated via chemical vapor deposition. Due to the influence of interface energy, differing topographies of the heterostructures were observed. On initially grown Ge NWs, numerous Si NW branches were grown near the tip due to Au migration. However, on initially grown Si NWs, high-density Ge nanodots were observed.     

Orientation control of epitaxial Ge thin films growth on SrTiO3 (100) by ultrahigh vacuum sputtering

We report the orientation control of crystalline Ge (111) and Ge (001) growth on SrTiO₃ (100) substrate by adjusting the temperature of substrate. It is found that the substrate temperature plays an important role for the formation of crystalline Ge with different surface orientations and interfacial chemical configuration during the sputtering process. At 500 °C, Ge (111) with good crystalline quality is formed, while Ge (001) is preferably grown on SrTiO₃ substrate at 650 °C. Our results show the possibility of manipulating the surface orientations during Ge growth on SrTiO₃ by controlling the substrate temperatures.     

《步天歌》星象——中国传承星象的晚期定型

:《步天歌》属初唐作品 ,主要记载两汉时期以后的星象。由于其主要靠抄本流传 ,且行文过简 ,枝节缺失较多 ,讹误差错不少。但《步天歌》是对隋唐之际传统的三家星官混一的歌诀式总结 ,流传甚广。朝鲜、日本、越南及邻近我国东南沿海国家都有其流传。因此 ,《步天歌》无疑是一部具有较大影响的古代天文星象诗歌著作     

一种新型SiGe-OI脊形光波导的模式分析及结构参数优化

The mode of a novel SiGe-OI optical waveguide is analyzed, and its single-mode conditions are derived. The Ge content and structure parameters of SiGe-OI optical waveguides are respectively optimized. Under an operation wavelength of 1300 nm, the structures of SiGe-OI rib optical waveguides are built and analyzed with Optiwave software, and the optical field and transmission losses of the SiGe-OI rib optical waveguides are analyzed. The optimization results show that when the structure parameters H, h, W are respectively 500 nm, 250 nm, 500 nm and the Ge content is 5%, the total power loss of SiGe-OI rib waveguides is 0.3683 dB/cm considering the loss of radiation outside the waveguides and materials, which is less than the traditional value of 0.5 dB/cm. The analytical technique for SiGe-OI optical waveguides and structure parameters computed by this paper are proved to be accurate and computationally efficient compared with the beam propagation method （BPM） and the experimental results.     

高剂量离子注入直接形成Ge纳米晶的物理机理

研究了单束双能高剂量Ge离子注入、不经过退火在非晶态SiO2薄膜中直接形成镶嵌结构Ge纳米晶的物理机制．实验中利用不加磁分析器的离子注入机,采用Ge弧光放电离化自动形成的Ge+和Ge2+双电荷离子并存的单束双能离子注入方法,制备了1e16～1e18cm－2多种剂量Ge离子注入的Si基SiO2薄膜样品．用GIXRD表征了Ge纳米晶的存在,并仔细分析得到了纳米晶形成的阈值剂量．通过TEM分析了Ge纳米晶的深度分布和晶粒尺寸．用SRIM程序分别计算了双能离子在SiO2非晶层的射程和深度分布,与实验结合,得到纳米晶形成的物理机制,即纳米晶的形成与单束双能离子注入时Ge＋和Ge2＋相互碰撞产生的能量沉积在SiO2中形成的局域高温有关．