激光冲击LY2铝合金的薄膜性能

脉冲激光冲击LY2铝合金,在试样表面形成约1.7mm的薄膜,研究了薄膜与基体接合处横截面的微观形貌以及激光冲击搭接率和激光冲击次数对薄膜层残余应力的影响。研究结果表明:激光冲击的光斑搭接率对试样横截面的残余应力影响显著;在薄膜层最大残余应力存在于试样的表层或者近表层,深度方向的残余应力值和残余压应力值变化率均与表层深度成反比;多次冲击能够获得较大的残余应力值,但对于激光冲击LY2铝合金薄膜深度影响较小。     

陕西物联网产业联盟(ASII)

陕西物联网产业联盟是由陕西地区从事物联网产业相关技术研究、产品生产的企事业单位和团体自愿组成,于2011年3月由陕西省工业和信息化厅批复正式成立,联盟秘书处设在西安光电子专业孵化器,西安中星测控有限公司为第二届理事会理事长单位。联盟致力于推动物联网及相关产业发展,服务于企业、服务于政府,促进交流合作,努力形成产、学、研、用开放式的合作机制。     

Effect of rubber particle modification on properties of rubberized concrete

To improve the combination of cement matrix and waste tire rubber particles in concrete, the rubber particles were treated with acrylic acid（ACA） and polyethylene glycol（PEG） for grafting hydrophilic groups on their surfaces. The X-Ray photoelectron spectroscopy（XPS） and surface contact angle were used to characterize the hydrophilicity and surface functional group of rubber particles. The effect of rubber particle modifi cation on fresh/hardened properties of rubberized concrete was studied. The experimental results show that the contact angle between rubber particle surface and water decreases when rubber particle is modifi ed. Compared with the unmodifi ed rubberized concrete（RC）, the unit weight of modifi ed rubberized concrete（MRC） changes slightly. However, the slump, air-entrainment, compressive strength, flexural strength, and impact performance of MRC are obviously improved. Under good condition of slump, the water-cement ratio of the MRC can be reduced from 0.4 to 0.38. And the compressive strength and fl exural strength of the MRC（10% rubber particle content） can be increased by 25.9% and 26.4%, respectively.     

Selective removal of heavy metal ions from aqueous solutions with surface functionalized silica nanoparticles by different functional groups

The industrial silica fume pretreated by nitric acid at 80 °C was re-used in this work. Then, the obtained silica nanoparticles were surface functionalized by silane coupling agents, such as（3-Mercaptopropyl） triethoxysilane（MPTES） and（3-Amincpropyl） trithoxysilane（APTES）. Some further modifications were studied by chloroaceetyl choride and 1,8-Diaminoaphalene for amino modified silica. The surface functionalized silica nanoparticles were characterized by Fourier transform infrared（FI-IR） and X-ray photoelectron spectroscopy（XPS）. The prepared adsorbent of surface functionalized silica nanoparticles with differential function groups were investigated in the selective adsorption about Pb2＋, Cu2＋, Hg2＋, Cd2＋ and Zn2＋ions in aqueous solutions. The results show that the（3-Mercaptopropyl） triethoxysilane functionalized silica nanoparticles（SiO2-MPTES） play an important role in the selective adsorption of Cu2＋ and Hg2＋, the（3-Amincpropyl） trithoxysilane（APTES） functionalized silica nanoparticles（SiO2-APTES） exhibited maximum removal efficiency towards Pb2＋ and Hg2＋, the 1,8-Diaminoaphalene functionalized silica nanoparticles was excellent for removal of Hg2＋ at room temperature, respectively.     

Dissolution mechanism and solubility of hemimorphite in NH3-(NH4)2SO4-H2O system at 298.15 K简

The dissolution mechanism of hemimorphite in NH3-（NH4）2SO4-H2O system at 298.15 K was investigated by X-ray powder diffraction （XRD）, scanning electron microscopy （SEM）, Fourier transform infrared spectroscopy （FTIR） and X-ray photoelectron spectroscopy （XPS） analysis. The results show that hemimorphite is soluble in NH3-（NH4）2SO4-H2O system and its residue exists in the form of an amorphous SiO2 layer on the hemimorphite surface. The XPS data also indicate that the Si 2p3/2 and O ls spectra of the hemimorphite are broadened and shift to higher binding energies and their binding energies are closer to silica with an increase of total ammonia and time. Solubility of hemimorphite in NH3-（NH4）2SO4-H2O system was measured by means of isothermal solution method at 298.15 K based on the study of the dissolution mechanism of hemimorphite. The results show that the solubility of zinc in solution increases firstly and then decreases with the increase of cr（NH3） （total ammonia concentration） at different NH3/NH4^＋ ratios. The solubility of silicon in solution decreases from 0.0334 mol/kg in ct（NH3）-4.1245 mol/kg NH3-（NH4）2SO4-H2O solution to 0.0046 mol/kg in cT（NH3）=7.6035 mol/kg NH3-（NH4）2SO4-H2O solution.     

MoO3/SO4^2- —TiO2 catalyst for transesterification of dimethyl cabonate with phenol

A new MoO3/SO4^2- -TiO2 catalyst was prepared by a conventional impregnation of SO42-/TiO2 as carrier with an aqueous solution of ammonium molybdate and used for the synthesis of transesterification of dimethyl carbonate （DMC） with phenol.A series of MoO3/SO42--TiO2 catalysts with different MoO3 loadings were investigated and characterized using X-ray diffraction （XRD）,Fourier transform infrared spectrometer （FTIR）,NH3-temperature programmed desorption （NH3-TPD） and X-ray photoelectron spectroscopy （XPS）.The results show that MoO3 loading is related to the activity of transesterification reaction.With the increase of MoO3 loading,the activity of transesterification reaction increases.The sulfur species in the catalyst have an influence on the molybdenum species,and lead to an increase in the electropositive of molybdenum,which promotes the catalytic activity of MoO3/SO42--TiO2.Among the series of catalysts prepared,MoO3/SO42--TiO2 with 10% MoO3 and 823 K calcinated is found to be the most active catalyst for transesterification reaction.Under the reaction conditions of 453 K and 12 h,the conversion of DMC is 30.5 %,and the yields of MPC and DPC reach 21.2 % and 8.7 %,respectively.     

Electrolyte composition and removal mechanism of Cu electrochemical mechanical polishing

The optimization of electrolytes and the material removal mechanisms for Cu electrochemical mechanical planarization （ECMP） at different pH values including 5-methyl-1H-benzotriazole （TTA）, hydroxyethylidenediphosphoric acid （HEDP）, and tribasic ammonium citrate （TAC） were investigated by electrochemical techniques, X-ray photoelectron spectrometer （XPS） analysis, nano-scratch tests, AFM measurements, and polishing of Cu-coated blanket wafers. The experimental results show that the planarization efficiency and the surface quality after ECMP obtained in alkali-based solutions are superior to that in acidic-based solutions, especially at pH=8. The optimal electrolyte compositions （mass fraction） are 6% HEDP, 0.3% TTA and 3% TAC at pH=8. The main factor affecting the thickness of the oxide layer formed during ECMP process is the applied potential. The soft layer formation is a major mechanism for electrochemical enhanced mechanical abrasion. The surface topography evolution before and after electrochemical polishing （ECP） illustrates the mechanism of mechanical abrasion accelerating electrochemical dissolution, that is, the residual stress caused by the mechanical wear enhances the electrochemical dissolution rate. This understanding is beneficial for optimization of ECMP processes.     

光电探测器薄膜生长条件及机理分析

将苝四甲酸二酐（3,4,9,10-perlenetetracrboxylic dianhydride,PTCDA）真空蒸发到无机半导体p-Si衬底上,研制的p-Si/PTCDA异质结光电探测器,对光照非常敏感,是一种响应度很高的宽带光电子元器件。讨论分析了不同的衬底制备条件制备p-Si/PTCDA异质结薄膜的情况,实验结果表明,制备过程中细微的环境变化,显著影响了器件质量,通过分析成膜质量与器件内部微观机制、能带结构、载流子输运之间的关系,确定制备异质结有机薄膜的硅晶面选择,以及衬底的温度最佳的选择范围。     

Hanks平衡盐溶液中浸泡测试纯钛片上的硅杂质吸附

世界各国广泛采用在玻璃器具内的Hanks平衡盐溶液(HBSS)和模拟体液中浸泡的方法测试材料的生物相容性。为了准确评价材料的相容性，需排除材料表面的硅杂质，因为硅自身可以形成羟基磷灰石。然而，尽管使用的是无硅的溶液测试纯钛片的生物相溶性，通过X射线光电子能谱(XPS)检测，发现钛片上仍有大量的硅化合物。因此，从容器中溶出硅可能是硅的主要来源，但材料上吸附的硅与容器的关系如何，需对此进行研究。     

不锈钢电化学着色工艺及着色膜的XPS研究

介绍了不锈钢电化学着色工艺,采用正交试验的方法对不锈钢电化学着色的试验方案进行了优化,得出最佳试验方案;用X射线光电子能谱(XPS)对不锈钢着色膜的元素组成和元素价态进行了分析,这对着色膜层的进一步开发和应用有十分重要的作用.