Optical Properties of One-dimensional Three-component Photonic Band Gap Structure

1　IntroductionMaterialswithPhotonicBandGaps (PBG’s)havebeenwidelystudiedboththeoreticallyandex perimentallyinthepastfew years[1～ 4] .Theexis tenceofgaps,which prohibitthepropagationofelectromagnetic (EM )wavesinacertainrangeoffrequencies,canhavesignificantimpactsbothinsci enceandtechnology .Manypracticalapplicationsofthesestructureshavebeensuggestedanddemon strated ,suchasPhotonicCrystal (PC)microcavi ties[5] ,infraredPC[6] ,PClens[7] ,suppressingspontaneousemission ,manipulatinglight…     

咪唑啉型缓蚀剂的合成及其缓蚀性能研究

以棕榈酸、二乙烯三胺为原料合成咪唑啉，并对其进行水溶性改性制备了咪唑啉型缓蚀剂YG-1，与助剂硫脲复配得到复配缓蚀体系YG-2。应用静态挂片失重法、电化学法评价了该复配缓蚀体系YG-2的缓蚀性能，研究了缓蚀机理，并用扫描电镜分析了腐蚀前后及加入复配缓蚀体系YG-2后A3钢的表面形貌。研究结果表明，在30℃下加入复配缓蚀体系YG-2能有效地抑制饱和CO2的高矿化度盐水对A3钢的腐蚀，其使用浓度为20mg／L时，缓蚀率达到98．5％，腐蚀速率仅为0．009mm／a，远好于我国石油天然气行业标准规定的指标。     

储层应力敏感性影响因素研究

全面分析储层应力敏感性产生的机理认为，外部因素的改变会引起储层产生应力敏感性．而储层岩石物性等内部因素对应力敏感性的强弱起决定性作用。室内岩心应力敏感性评价时．仪器与设备的精度、加载与卸载方式、实验用流体类型以及各种人为因素等都会对评价结果产生影响，其中岩心密封套在高压、高温条件下的密闭性会对实验结果产生较大影响。所以储层应力敏感性不应该从孔隙度和渗透率的高低进行简单评价，中、高渗储层和低渗储层在生产过程也都可能表现出较强的应力敏感性现象。     

Effects of genotype and treatment on the antioxidant activity of sweet potato in Taiwan

Six genotypes of sweet potato commercially available in Taiwan, including TNG57, TNG66, TNG68, TYY1, RP and WP, were used as samples in this study of the effects of steaming and kneading with pre-steaming treatments on the antioxidant components and antioxidant properties of methanolic extracts. Steam treatment increased the total phenols contents of all genotypes (2–13 times), flavonoids content of RP (1.3 times) and anthocyanins contents of RP and WP (5–6 times). Steam treatment also increased the reducing power and scavenging DPPH radical effect of sweet potato flours. For the methanolic extracts of steamed and kneaded flours, reducing powers were 0.02–1.70 at 5.0 mg ml⁻¹ and the scavenging effects on DPPH radicals were 19–92% at 2.5 mg ml⁻¹. Both showed the order of RP > WP > TYY1 and TNG66 > TNG57 and TNG68. However, the chelating effect of the six genotypes at 1.0 mg ml⁻¹ ranged from 50% to 73%. Contents of total phenols, flavonoids, and anthocyanins of sweet potato flours were significantly positively correlated with the reducing power and scavenging DPPH radical effects. After steaming and kneading treatments, RP showed the highest increase in the contents of total phenols, flavonoids and anthocyanins among the six genotypes studied.     

积层板的制造方法

概述了积层板的开发背景、制造工艺和最近的开发动向。     

非线性扩频序列的三项式特性

讨论了三类非线性扩频序列(GMW序列、No序列和Kasami序列)的三项式特性，利用这三类序列的迹表示，证明了GMW序列、No序列和Kasami序列均具有正则三项式对。     

马来酸酐-丙烯酸含膦共聚物的合成及阻垢性能

以水为溶剂，马来酸酐（MA）、丙烯酸（AA）为单体，过硫酸盐-次磷酸盐氧化还原体系为引发剂，合成马来酸酐-丙烯酸含膦共聚物阻垢剂。研究了聚合条件对共聚物阻垢性能的影响，确定最佳聚合条件为：马来酸酐与丙烯酸摩尔比1：3，次磷酸盐用量为单体总质量的20％，引发剂用量为单体总质量的10％，反应温度90℃，反应时间4h。在此反应条件下合成的聚合物对CaCO3和CaSO4有较好的阻垢性能。     

利用静电学和测量数据对碳纳米管膜场致发射规律的定量分析

碳纳米管膜的场致发射电流密度仅由它表面的宏观电场决定，无论其表面形状是平的还是半球状的。对于理想的平行板电极系统，其表面电场强度均匀（UId），发射电流密度、总电流与发射面积成正比：对于半球一平面电极系统半球形的阴极存在一个宏观场增强因子ks，一个与两极距离和球半径之比（d/r）相关的函数，其表面的平均场强为ks U/d。对于d/r=0，ks=1，d≥r的情况，ks接近于常数。对于10〈d／r〈100的情况，存在一个经验的表达式：ks=1＋0．15d/s=0．005（d／r）^2。在引入ks后，不同作者给出的平面电极系统和半球一平面电极系统碳纳米管膜的场致发射电流I与宏观表面电场强度E的关系都可以近似用-经验公式描述：I=a（E-Eo）^b，a，b为常数。该经验公式可为稳定生产的CNT膜片应用产品设计提供方便。     

提高焊膏印刷质量的工艺改进

焊膏印刷作为SMT工艺的第一步，其质量好坏对SMT工艺有着重要影响。文章通过对焊膏成分、特性的分析，讨论了印刷中各种工艺参数的正确选择；对焊膏印刷中容易出现的质量问题进行了详细分析，指出了产生问题的原因，提出了改进措施。     

Effects of surface roughness of substrates on the c-axis preferred orientation of ZnO films deposited by r.f. magnetron sputtering

The c-axis preferred orientation of ZnO film is the most important factor for its successful application in piezoelectric devices. The effects of surface roughness of the substrate on the c-axis preferred orientation of ZnO thin films, deposited by radio frequency magnetron sputtering, were investigated. During sputtering, the oxygen content in the argon environment used was varied from 0 to 70% at a total sputtering pressure of 10 mTorr. Very smooth Si, smooth evaporated Au/Si, smooth evaporated-Al/Si, and rough sputtered-Al/Si were used as substrates. Their r.m.s. roughnesses, as measured by atomic force microscopy, were 1.27, 17.1, 21.1 and 65-118 Å, respectively. The crystalline structure and the angular spread of the (0 0* 2) plane normal to the ZnO films were determined using X-ray diffraction and X-ray rocking curves, respectively. The crystallinity and the preferred c-axis orientation of the ZnO films were strongly dependent on the surface roughness of the substrates rather than on the oxygen content of the working environment or on the chemical nature of the substrate.