单片机激光衍射测径系统

电荷耦合器件 CCD,在影像传感、信号处理和数字存贮等领域中已得到广泛应用,而 CCD 应用到衍射计量技术有其独到的优越性,将提高衍射计量的精度,具有一定的先进性和实用性。激光衍射测径仪为非接触、快速、高精度线径测量系统,可进行静态定点检测和动态实时测量,并可对连续生产的系统自动监测,测量范围20—510μm,精度在小于200μm 时为±0.5μm。200—510μm 时为±0.5%,其中 CCD 信号的接收全部采用 Apple-Ⅱ计算机软件编程。本文介绍的是以 MCS-51系列单片微机取代系统机,为微小尺寸计量提供了一种新的检测手段和方法。     

安钢15^t氧气顶吹转炉耳轴轴承更换检修工艺的改进

利用炉底车做为起重装置，顶起炉身和托圈，方法简便易行，取得良好效果。     

无衍射发散光束的判据

本文给出了一个关于无衍射发散光束的简易判据。     

关于衍射的本性

本文对惠更斯－菲涅耳原理和基尔霍夫衍射积分的概念作了本质上的修改。它比较符合物理实际，并有应用价值。     

激光光束质量因子M~2的物理概念与测试方法

激光光束传输质量因子Ｍ２是一种全新的描述激光光束质量的参数，它能定量表征单模、多模光束传播特性。本文介绍Ｍ２的物理概念、特点、测试方法及近年来国外的研究概况。     

光栅衍射法测量超短光脉冲的宽度

本文详细阐明了光栅衍射法测量超短光脉冲宽度的原理。测量了ＴＥＡ－Ｎ２激光器泵浦的短腔染料激光器输出的光脉冲的宽度。其结果与用条纹相机测得的结果一致。     

超晶格（CdTe—ZnTe）／ZnTe／GaAs（001）红外材料的X射线测定

用Ｘ射线衍射并结合Ｘ射线动力学衍射理论模型的计算机模拟方法，对简单和复杂两种结构的（ＣｄＴｅ－ＺｎＴｅ）／ＺｎＴｅ／ＧａＡｓ（００１）应变超晶格材料的结构和完整性进行了研究，得到了它的结构参数。     

Effect of Thickness on the Structure and Tribological Properties of MoSx Coating

MoSx coatings were prepared by bipolar-pulse DC unbalanced magnetron-sputtering system with the variation of coating thickness at different Ar pressures.The composition and surface morphology were determined by using energy dispersive X-ray and scanning electron microscopy;the structural characterization was analyzed by X-ray diffraction.The friction and wear properties were investigated by fretting tests in air with less than 10% and 50% relative humidity.At 0.40 Pa pressure,(002) basal plane orientation was formed throughout the coatings.At 0.88 Pa and 1.60 Pa pressures,(002) basal plane orientation was only noticed in the first stage of coating growth(around 0.20 μm in thickness), and then edge orientations with their basal planes perpendicular to the surface would be evolved in the coatings.Humidity has a minor influence on the coatings that have(002) basal plane orientation,whereas the tribological properties of MoSx coatings with edge orientations are greatly affected by humidity.The mechanisms of coating growth and friction and wear processes are discussed.     

Stress in Thin Films;Diffraction Elastic Constants and Grain Interaction

Untextured bulk polycrystals usually possess macroscopically isotropic elastic properties whereas for most thin films transvers isotropy is expected,owing to the limited dimenionlity .The usually applied models for the calculation of elstic constants of polycrystals from single crystal elastic contants(so-called grain interaction models)erroneously predict macroscopic isotropy for an(untextured) thin film.This paper presents a summary of recent work where it has been demonstrated for the first time by X-ray diffraction analysis of stresses in thin films that elastic grain interaction can lead to macroscopically anisotropic behaviour (shown by non-linear sin^2φ plots).A new grain interaction model,predictin the macroscopically anisotropic behaviour of thin films,is proposed.     

缓冲层对氮化镓二维生长的影响

报道了在射频等离子体（RF-Plasma)辅助的分子束外延（MBE）技术中，使用白宝石（0001）衬底，采用低温缓冲层工艺外延氮化镓（GaN)。通过原子力显微镜（AFM）的表面形貌比较及X射线双晶衍射（XRD）ω扫描摇摆曲线的分析，讨论了低温缓冲层成核机理及缓冲层生长温度与形成准二维生长的关系，确立了缓冲层的三维成核，准二维生长的生长机理，并在此基础上实现了氮化镓外延层更好地二维生长，进一步提高了氮化镓外延层的晶体质量。