Polarity control of GaN epilayers grown on ZnO templates

We report the successful growth of Ga-polar GaN epilayers on O-polar ZnO templates pre-deposited on c-sapphire. Prior to GaN growth, NH₃ is exposed onto the ZnO template. The polarity of the GaN layers is confirmed by etching of the surface and by conversion beam electron diffraction (CBED), while the O-polar ZnO is confirmed by CBED. It is suggested that the NH₃ pre-exposure helps form a Zn₃N₂ layer, which possesses inversion symmetry and inverts the crystal from anion polar to cation polar.     

Surface structural change of ZnO-coated LiNi0.5Mn1.5O4 spinel as 5 V cathode materials at elevated temperatures

LiNi_0.5Mn_1.5O₄ powder was synthesized via sol-gel method and coated with ZnO in order to test the electrochemical cyclability of the material as a cathode for the secondary Li battery in the 5 V range at 55 °C. The ZnO-coated LiNi_0.5Mn_1.5O₄ powder nearly maintained its initial capacity of 137 mA h g⁻¹ after 50 cycles whereas the uncoated powder was able to retain no more than 10% of the initial capacity after 30 cycles. TEM analysis of the cycled cathodes suggests that the formation of the graphitic surface phase, hindering the Li migration, may be responsible for the rapid capacity loss of the uncoated material while no such phase was observed on the surface of the ZnO coated LiNi_0.5Mn_1.5O₄ powder.     

Electron transport in InGaO3(ZnO)m (m=integer) studied using single-crystalline thin films and transparent MISFETs

We have investigated the characteristics of transparent metal-insulator-semiconductor field-effect transistors (MISFETs) fabricated using InGaO₃(ZnO)_m (m=integer) single-crystalline thin films as n-channel layers and amorphous alumina as gate insulator films. The MISFETs exhibit good characteristics such as insensitivity to visible light illumination, off-current as low as ∼1 nA with a positive threshold voltage of ∼3 V and on/off current ratio of 10⁵. The field-effect mobility increased from ∼1 to ∼10 cm² (V s)⁻¹ as the m-value increased. Room temperature Hall mobility also increased. However, unexpectedly these values were lower than the field-effect mobility. It is explained by existence of shallow localized state in the homologous compounds.     

氧化锌压敏陶瓷烧结致密化过程的研究

本文研究了氧化锌压敏陶瓷的致密化过程，结果发现只有当烧结温度升高到一定值时，试样中的ＺｎＯ粉粒产生聚集，致密化过程才开始．致密化是瓷体获得稳定电性能的基础．低熔点添加剂Ｂ２Ｏ３可以降低致密化的起始温度，而致密化过程中的等温烧结对ＺｎＯ压敏陶瓷的最大密度几乎没有影响．     

Non-aqueous electrodeposition of ZnO and CdO films

ZnO films were electrodeposited from a dimethylsulfoxide bath containing dissolved gaseous oxygen. Variations in deposition parameters and their effects on the structural (crystal size, growth direction), optical (bandgap variations, photoluminescence) and electrical (conductivity) properties are described. The technique was extended to give highly-conducting films of CdO.     

ZnO薄膜应用的最新研究进展

ZnO是一种新型的Ⅱ-Ⅵ族半导体材料。详细介绍了ZnO薄膜在太阳能电池、表面声波器件、气敏元件、压敏器件等领域的应用以及在紫外探测器、LED、LD等潜在应用领域研究开发的最新进展。     

超细氧化锌粉体的制备及尺寸控制

根据气相化学反应法 (CAD)制备超细粉的原理 ,从低品位氧化锌矿中采用火法冶金方法直接制备超细氧化锌粉 ,对所得氧化锌的粒度尺寸、微观结构和粒度分布进行测试 ;考察了冷却强度以及收集装置对超细氧化锌粒度及粒度分布的影响 ;讨论了氧化锌粉体团聚的原因及对策、试验条件对氧化锌尺寸的控制等     

纳米ZnO薄膜制备及液态源掺杂

用真空蒸发法在玻璃和单晶硅片 (10 0 )上制备Zn薄膜 ,然后对Zn薄膜进行氧化、热处理获得纳米ZnO薄膜。对在硅片上制备的Zn薄膜一次性进行高温掺杂、氧化获得纳米ZnO∶P和ZnO∶B薄膜。研究不同氧化、掺杂温度和时间对薄膜结构、电学性能的影响。结果表明 :氧化温度和时间对ZnO薄膜结构影响较大 ,液态源掺P可明显改善纳米ZnO薄膜的导电性能、结构特性和化学组分     

Nb2O5掺杂对ZnO压敏电阻器电性能的影响

本文研究了Ｎｂ＿２Ｏ＿５掺杂以及Ｎｂ＿２Ｏ＿５与ＺｎＯ煅烧对ＺｎＯ压敏电阻器电性能的影响。实验表明，Ｎｂ＿２Ｏ＿５的掺入使压敏电场减少，当Ｎｂ＿２Ｏ＿５含量为０．１％ｍｏｌ时，其压敏电场最小．非线性系数最大。煅烧温度越高，压敏电场越高，非线性系数越大。     

掺杂对低压ZnO压敏陶瓷材料显微结构及性能的影响

本文探讨了多种金属氧化物对ＺｎＯ－Ｂｉ＿２Ｏ＿３－ＴｉＯ＿２系材料的改性作用和对其微结构的影响，为得到预定性能的材料提供了掺杂方面的实验依据。