磷光粉表面包覆对铜基磷光复合材料发光及摩擦性能影响

选用热稳定性好的SiO2为包覆物,采用溶胶-凝胶法,以正硅酸乙酯为硅源,对商用磷光粉SrAl2O4∶Eu2+,Dy3+表面进行包覆,以解决磷光粉在高温下制备复合材料过程中因与金属粒子接触以及高温氧化产生猝灭的问题。实验通过热压烧结制备块体铜基磷光复合材料,考评包覆工艺对高温下制备的复合材料发光及摩擦性能的影响。通过X射线衍射、扫描电镜、荧光分光仪等设备对包覆前后磷光粉的表面形貌和发光性能进行分析和表征,采用摩擦试验机对包覆前后磷光粉与高铝青铜粉末混合制备复合材料烧结试样的摩擦性能进行研究。结果表明磷光粉表面包覆可有效避免其在高温下氧化猝灭和接触猝灭,包覆后磷光粉应用于铜基复合材料中可有效降低复合材料的磨损量,提高材料的耐磨性,当包覆比为10%时复合材料的发光性能、耐磨损性能最佳。     

聚丙烯酸对纳米SiO_2薄膜性能的影响

采用溶胶-凝胶法,以正硅酸乙酯(TEOS)为前驱体、聚丙烯酸(PAA)为增孔剂制备大孔径SiO_2薄膜,研究了PAA添加量对薄膜孔径的影响、烧结温度与薄膜孔径及晶相转化之间的关系。通过热重分析仪(TG-DTG)、氮气吸附-脱附法、X射线衍射仪(XRD)、原子力显微镜(AFM)、红外光谱仪(IR)对样品性能进行表征。结果表明,随着PAA添加量的增多,孔径随之增大,当添加量达到15%(体积分数)时,薄膜表面出现裂纹;随着烧结温度的升高,SiO_2晶相发生转变及PAA完全炭化使得薄膜孔径增大。实验确定,PAA最佳加入量为10%,且最佳烧结温度为800℃时制得的SiO_2薄膜的热稳定性良好,表面平整致密,平均孔径为53.73nm。     

Reconstructing design parameters of a rectangular resonator via peak signal-to-noise ratio and global optimization algorithms

This article proposes an approach for reconstructing physical parameters of a sample in a rectangular resonator during microwave radiation, knowing a priori, its electric field distribution. The inverse problem was solved using two global optimization algorithms and the peak signal-to-noise ratio (PSNR) criterion. First, the Self-regulated Fretwidth Harmony Search algorithm (SFHS) identified suitable resonant frequencies for a given configuration. Next, the unified Particle Swarm Optimization (UPSO) optimized said configuration. Together, they became a maximization strategy of the PSNR through a dual optimization process. Results showed the ability of the approach for estimating the height of each sample block and the resonating frequency of the cavity. This process takes longer to finish as a higher PSNR is demanded (mainly due to the aforementioned dual optimization). Even so, it allows for more similar electric field distributions between both, the direct and inverse problems.     

非线性规划在工业产品设计中的应用

目的判断非线性规划方法能否在满足用户使用要求的前提下节约生产加工成本。方法以平板折叠桌作为研究对象,以加工方便作为目标函数,以桌面和桌腿之间的几何关系作为约束条件,建立非线性规划模型,通过MATLAB软件求解得到最优加工方案。结论在给定高为70 cm和圆形桌面直径为80 cm时,平板折叠桌最优加工方案为平板长度158 cm,宽度79.9 cm,厚度3 cm,木条宽度4.7 cm,单侧木条数为17条。     

太阳能吸收AAO复合氧化膜的制备与性能

通过阳极氧化技术制备高度有序的多孔阳极氧化铝(AAO),交流扩孔后,在不同条件下向氧化铝孔内以50Hz的交流频率沉积Cu-Ni纳米复合粒子。经光谱测试分析可知:在电压12V、时间600s、温度25℃条件下制备的涂层具有良好的太阳光吸收性能,吸收率为0.91、发射率为0.18、品质因子为4.9。经SEM,XRD分析可知,复合氧化膜涂层表面得到CuAl_2O_4/Cu-Ni复合纳米棒阵列。目标涂层经600℃高温处理后,吸收率、发射率波动很小,涂层体系的热稳定性得到提高。其中,CuAl_2O_4的存在限制高温环境下Cu,Ni金属颗粒在界面处的扩散,减小氧化概率。     

旋转摩擦挤压法制备CNTs/Mg复合材料的组织和力学性能

通过显微硬度和抗拉强度试验、X射线衍射仪、扫描电镜和金相显微镜观察,研究经旋转摩擦挤压法制备的CNTs/Mg复合材料的组织及性能。结果表明:CNTs/Mg复合材料的组织为细小等轴晶,且随着CNTs含量的增加,复合材料晶粒尺寸逐渐细化,当CNTs含量为5%时,晶粒尺寸最小,由63μm减小至3.79μm,为AZ91基材晶粒尺寸的6.01%。经过旋转摩擦挤压加工后基材内第二相β-Al12Mg17相的量减少,CNTs的加入使复合材料中出现了Al4C3相,且第二相β-Al12Mg17相网状结构消失。加工后的镁合金抗拉强度提高,最大值为330.9 MPa,较原基材提高了90.6%,当CNTs含量小于2%时,复合材料强度高于原基材。复合材料硬度随着CNTs含量的增加呈先增加后降低的趋势,当CNTs含量为2%时,硬度最高,达101.3HV,比AZ91基材提高了40.3%。     

原奥氏体晶粒尺寸对珠光体钢组织及韧性的影响

探索了奥氏体晶粒尺寸对珠光体等温转变组织特征以及对韧性性能的影响规律。研究表明,在相同等温转变温度下,珠光体片层间距无明显变化,随奥氏体晶粒尺寸的增加,先共析铁素体量减少而珠光体团尺寸增加。珠光体断裂韧性受控于裂纹前沿塑性影响区尺寸(1~2)δc,其中δc为临界裂纹张开位移,当原奥氏体晶粒大于(1~2)δc时,裂纹扩展阻力主要来自穿越珠光体片层α、θ相的颈缩、破断。当原奥氏体晶粒尺寸接近或小于(1~2)δc时,裂纹主要沿晶界、珠光体团界、α+θ片层界面扩展,通过扩展路径发生多次弯折消耗能量,随原奥氏体晶粒尺寸增加,准静态断裂韧度J变化幅度较小。而冲击韧性缺口前沿塑性影响区远大于原奥氏体晶粒,大角度晶界将促使裂纹的转折而提高扩展阻力,提高裂纹前沿塑性区大角度晶界密度有利于提高冲击功,冲击韧性Ak随晶粒尺寸的增加显著下降。     

A study on the effect of polishing fluid volume in ball end magnetorheological finishing process

Ball end magnetorheological finishing is a unique process that utilizes a magnetically controlled ball of polishing fluid at the tip of the rotating tool to finish workpiece of different materials and shapes. The aim of this research is to study the effect of polishing fluid volume on finishing spot size and the surface finish associated with it. A magnetostatic simulation is done to find the variation of flux density in the working gap and on the workpiece surface. The maximum limit of the polishing fluid volume is selected on the basis of area of threshold magnetic flux density (minimum value required for finishing) region on the workpiece surface. The surface characteristics and the diameter of the finished spot are analyzed by varying the fluid volume. The surface obtained with high fluid volume is poorly finished and has scratch marks as the excess fluid flows out from the working gap and forms a thick ring at the periphery of the tool tip. Contrary to this, if the fluid volume is too less, then it merely rotates over the workpiece surface without causing any finishing action. An optimum range of fluid volume produces a good quality surface finish with constant finished spot size.     

Reinforcement in Al Matrix Composites: A Review of Strengthening Behavior of Nano‐Sized Particles

Aluminum matrix composites (AMCs) reinforced with the nano‐sized particles are very important materials for the applications in industrial fields. These aluminum matrix composites consist of an aluminum matrix and nano‐sized particles, which own very different physical and mechanical properties from those of the matrix. Nano‐sized particles show a more obvious strengthening effect on the matrix than the micro‐sized particles do, because of the high specific surface area which is positive for the pinning effect during the deformation process. Thus, the nano‐sized particle‐reinforced AMCs usually exhibit a good ductility. The main issues of the fabrication methods are the low wettability between the nano‐sized particles and the molten aluminum alloys, which is fatal to the conventional casting methods, and the agglomeration of nano‐sized particles which happened easier than the larger particles. Several alternative processes have been presented in literature for the production of the nano‐sized particle‐reinforced aluminum composites. This paper is aimed at reviewing the feasible manufacturing techniques used for the fabrication of nano‐sized particle‐reinforced aluminum composites. More importantly, the strengthening mechanisms and models which are responsible for the improvement of mechanical properties of the nano‐sized particle‐reinforced aluminum composites have been reviewed.

     

Fabrication and Optical Properties of Periodic Ag Nano‐Pore and Nano‐Particle Arrays with Controlled Shape and Size over Macroscopic Length Scales

A facile and economical route to preparation of highly ordered sliver pore or particle arrays with controlled pore‐shape and size extended over cm² areas is described. The substrates are prepared at planar and curved surfaces via sphere‐imprinted polymer (PDMS) templating using polystyrene spheres with diameters of 820, 600, or 430 nm. Nano‐pore arrays are created by sputtering 80 nm of Ag directly onto the templates and nano‐particle arrays are prepared by electrode‐less deposition of Ag from Tollen's reagent. The shape of the nano‐pore or particles in the array conformed to that of the imprint of the sphere on the template. Stretching the flexible template enable creation of cuboid shaped nano‐voids and nano‐particles following Ag deposition. Diffuse reflectance from the spherical Ag nano‐cavity arrays showed absorbance maxima at wavelengths comparable similar to the diameter of the templating sphere, whereas reflectance from the cuboid arrays, showed little correlation with the sphere diameter. The cuboid nano‐particle arrays showed the most intense visible absorption which is red‐shifted compared to the spherical arrays. White light diffraction from the arrays, observed by rotating 1 cm² substrates relative to a fixed light source, reflected exactly the symmetry axes of the periodic nano‐features in the arrays demonstrating the remarkable macroscopic order of the periodic structures. Raman spectra of 1‐benzenethiol adsorbed at the arrays indicated SERS enhancements from the substrates are attributed mainly to surface nano‐roughness with only moderate contributions from the periodically corrugated structures. Despite excitation at the major resonance dip in the reflectance spectrum, a weak, localized rim dipole mode is found to elicit a small increase in the SERS enhancement factor for the 430 nm diameter spherical arrays. FDTD studies of nano‐void arrays provided insights into v arious factors affecting the SERS experiment and confirmed the array's plasmonic spectra are dominated by propagating plasmon modes under microscope excitation/collection angles.