Improving narrow bandgap a-SiGe:H alloys grown by hot-wire chemical vapor deposition

We have improved the electronic properties of narrow-bandgap (Tauc gap below 1.5 eV) amorphous-silicon germanium alloys (a-SiGe:H) grown by hot-wire chemical vapor deposition (HWCVD) by lowering the substrate temperature and deposition rate. Prior to this work, we were unable to grow a-SiGe:H alloys with bandgaps below 1.5 eV that had photo-to-dark conductivity ratios comparable with our plasma-enhanced CVD (PECVD) grown materials [B.P. Nelson et al., Mater. Res. Soc. Symp. 507 (1998) 447]. Decreasing the filament diameter from our standard configuration of 0.5 mm to 0.38 or 0.25 mm provides first big improvements in the photoresponse of these alloys. Lowering the substrate temperature from our previous optimal temperatures (T_sub starting at 435 °C) to at 250 °C provides additional photo-to-dark conductivity ratio increasing by two orders of magnitude for growth conditions containing 20–30% GeH₄ in the gas phase (relative to the total GeH₄+SiH₄ flow).     

基于光子带隙(PBG)结构的小型K波段谐振式带通滤波器

提出了一种新的基于光子带隙结构的K波段谐振式带通滤波器，给出了近似设计公式，并在半导体衬底上，采用微电子的工艺实现了这种结构。这种滤波器设计方法简单，体积小，整个长度接近谐振频率上的导波波长，加工方便，便于与其他电路集成，带内损耗小，阻带范围宽，带外抑制高。另外，本文的理论分析和实验结果均基于半导体衬底，可以直接应用于微波集成电路中。理论模拟与实际测量值基本吻合。     

温度系数可调的基准电压产生电路研究与设计

由于TFT-LCD显示屏的物理特性随温度而发生变化,驱动电路必须提供具有相同温度特性的驱动电压,以补偿显示屏的温度特性,进而提高显示画质。文章研究并设计了一种用于TFT-LCD彩屏手机驱动芯片的基准电压产生电路,其输出电压的绝对值与温度系数可编程调节,从而可实现与液晶显示屏的温度特性相匹配。介绍了该电路的各子模块电路,包括偏置电路、带隙基准电路和输出电压调节电路,详细分析了带隙基准电路所产生的基准电压的温度系数及其调节原理。用Hspice对采用0.25μmCMOS工艺设计的电路进行了仿真。仿真结果表明,基准电压的温度系数可从-1.24~1.13mV/℃变化,输出电压的绝对值可从1.8~2.1V调节,最大可提供负载电流40mA。     

BPxN1-x薄膜的制备及磷元素对其光学能隙的影响

本文从应用出发，选择光学石英为衬底，采用热丝辅助射频化学气相沉积的方法沉积BPxN1—x薄膜，对样品进行了X射线衍射(XRD)、扫描电子显微镜(SEM)、紫外—可见等测试。XRD、SEM结果显示薄膜多晶态，表面形貌随时间变化，最终为胞状；紫外—可见光光谱结果显示BPxN1—x薄膜的紫外吸收边随沉积时间的加长、PH3流量的增加而向长波长方向移动。因此，该材料的光学能隙可以通过生长工艺适当调整。另外，BPxN1—x薄膜与液晶层能较好匹配等特性更使其适用于紫外空间光调制器。     

高精度带隙基准电压源的实现

提出了一种高精度带隙基准电压源电路 ,通过补偿其输出电压所经过的三极管的基极电流获得精确的镜像电流源 .设计得到了在 - 2 0～ +80℃温度范围内温度系数为 3e - 6 /℃和 - 85 d B的电源电压抑制比的带隙基准电压源电路 .该电路采用台积电 (TSMC) 0 .35 μm、3.3V/ 5 V、5 V电源电压、2层多晶硅 4层金属 (2 P4 M)、CMOS工艺生产制造 ,芯片中基准电压源电路面积大小为 0 .6 5 4 mm× 0 .340 mm,功耗为 5 .2 m W.     

光子带隙结构在微波方面的应用

20世纪80年代末出现的光子晶体是一种具有光子带隙的新材料，它独特的性质使得光子晶体具有广泛的应用前景。介绍了光子晶体的概念，综述了光子带隙结构在微波领域的应用和研究进展。     

溶胶-凝胶法制备掺镧钛酸钡薄膜及其光学性质研究

以硝酸镧、醋酸钡、钛酸四丁酯为原料,采用溶胶一凝胶旋涂法制备掺La的钛酸钡薄膜,研究薄膜的晶体结构、表面形貌、紫外-可见光吸收性能及光学带隙。研究结果表明,纯钛酸钡和掺La钛酸钡薄膜均为单一四方钙钛矿结构,La3＋的引入可以使钛酸钡薄膜在可见光区的透过率和光学带隙有一定程度下降,而退火温度对掺镧钛酸钡薄膜光学带隙基本无...     

一种二阶补偿的高精度带隙基准电压源设计

基于charter 0.35μm标准CMOS工艺,设计了一种带自启动电路的高精度、低温漂、低功耗带隙基准电压源。电路在传统带隙基准源的基础上进行改进,利用不同材料电阻温漂系数的比值实现二阶补偿。仿真结果表明,在-40-120℃范围内,输出电压达到1.148 V,平均温漂系数为4.9ppm/℃,功耗仅为57μW。     

Design of a low temperature coefficient bandgap reference with a wide temperature range

In order to meet the requirements of different applications and markets for the accuracy and reliability of IoT chips,a low temperature coefficient bandgap reference with a wide temperature range is proposed.On the basis of the traditional Banba bandgap reference structure,the circuit utilizes high-order temperature compensation technology and piecewise temperature compensation technology to improve the curvature of the output reference voltage.The temperature coefficient of the circuit is reduced.At the same time,the operating temperature range of the circuit is extended.The circuit performances are verified in the TSMC 180 nm CMOS process.Test results show that the temperature coefficient of the circuit is as low as 7.2×10^-6/℃ in the range of-40 ℃ to 160 ℃.The power supply rejection ratio at a low frequency is -48.52 dB.The static current under the 1.8 V power supply voltage is 68.38 μA,and the core area of the chip is 0.025 mm².     

Room‐Temperature‐Operated Ultrasensitive Broadband Photodetectors by Perovskite Incorporated with Conjugated Polymer and Single‐Wall Carbon Nanotubes

In this work, room‐temperature‐operated ultrasensitive solution‐processed perovskite photodetectors (PDs) with near infrared (NIR) photoresponse are reported. In order to enable perovskite PDs possessing extended NIR photoresponse, novel n‐type low bandgap conjugated polymer, poly[(N,N′‐bis(2‐octyldodecyl)‐1,4,5,8‐naphthalene diimide‐2,6‐diyl) (2,5‐dioctyl‐3,6‐di(thiophen‐2‐yl)pyrrolo[3,4‐c]pyrrole‐1,4‐dione‐5,5′‐diyl)] (NDI‐DPP), which has strong absorption in the NIR region, is developed and then employed in perovskite PDs. By the formation of type II band alignment between NDI‐DPP with single‐wall carbon nanotubes (SWCNTs), the NIR absorption of NDI‐DPP is exploited, which contributes to the NIR photoresponse for the perovskite PDs, where perovskite is incorporated with NDI‐DPP and SWCNTs as well. In addition, SWCNTs incorporated with perovskite active layer can offer the percolation pathways for high charge‐carrier mobility, which tremendously boosts the charge transfer in the photoactive layer, and consequently improves the photocurrent in the visible region. As a result, the perovskite PDs exhibit the responsivities of ≈400 and ≈150 mA W^?1 and the detectivities of over 6 × 10¹² Jones (1 Jones = 1 cm Hz^1/2 W^?1) and over 2 × 10¹² Jones in the visible and NIR regions, respectively. This work reports the development of perovskite PDs with NIR photoresponse, which is terrifically beneficial for the practical applications of perovskite PDs.