Profile Prediction and Fabrication of Wet-Etched Gold Nanostructures for Localized Surface Plasmon Resonance

Dispersed nanosphere lithography can be employed to fabricate gold nanostructures for localized surface plasmon resonance, in which the gold film evaporated on the nanospheres is anisotropically dry etched to obtain gold nanostructures. This paper reports that by wet etching of the gold film, various kinds of gold nanostructures can be fabricated in a cost-effective way. The shape of the nanostructures is predicted by profile simulation, and the localized surface plasmon resonance spectrum is observed to be shifting its extinction peak with the etching time.     

Design and evaluation of a mechanical nanomanufacturing system for nanomilling

This paper presents design and evaluation of a mechanical nanomanufacturing system for performing the nanomilling process. The nanomilling process uses a nanotool (an atomic force microscope probe tip) that is rotated at high speeds to fabricate three-dimensional (3D) nano-scale features on a sample surface. After explaining the kinematics of the two nanomilling process configurations, the nanomilling system, including the 3D piezoelectric actuator that rotates the nanotool, the nanopositioning stage that provides the feeding and depth motions, and the software program that controls the nanomilling motions are described. A measurement system is then constructed to measure the dynamic nanomilling motions. A compensation algorithm is developed to enable obtaining desired nanotool motions in the presence of frequency and amplitude-dependent nonlinearities of the 3D piezoelectric actuator. The nanomilling system is then evaluated directly by measuring the nanotool motions, and indirectly by assessing the accuracy of the fabricated nanoscale features. It was shown that the nanomilling system facilitates fabrication of complex nano-scale features with high accuracy through the high-stiffness nanotool assembly and high-frequency (compensated) nanotool motions.     

Bacterial surface-layer proteins for electrochemical nanofabrication

We have used electrochemical processing to fabricate ordered arrays of metals and metal oxides on surfaces at densities exceeding 10¹² cm⁻², on mm² areas, and with typical feature sizes of 2-3 nm. This is achieved via masks obtained from naturally occurring proteins that assemble into two-dimensional crystals containing internal porous structure within each unit cell of the crystalline lattice. We have proven this process with bacterial cell surface proteins (S-layer proteins) from Deinococcus radiodurans and Sporosarcina ureae. Each of these S-layer proteins has unique lattice geometry and internal structure. Substrates are coated by adsorption from a dilute suspension of purified, stabilized protein extract. Electrochemical deposition proceeds through solvent accessible pores of the S-layer crystal to build surface structures with nanometer scale feature sizes and spacings precisely matching the geometry of the protein “mask”. Comparisons between the structure of the electrodeposited material through the protein mask and the protein surface topography suggest that the S-layers of D. radiodurans possess pores providing straight through-holes to the surface, whereas the S-layers of S. ureae presents a more tortuous pathway to the electrode surface.     

光刻技术及其应用的状况和未来发展

光刻技术及其在产业中的开发应用一直是业界人们关注的焦点之一,概述了目前几种具有潜力的光刻机技术及其应用的状况,同时通过对相关光刻的技术性和经济性比较,简述了其未来的发展。     

Photolithographic Route to the Fabrication of Micro/Nanowires of III–V Semiconductors

Nano/microwires of semiconducting materials (e.g., GaAs and InP) with triangular cross‐sections can be fabricated by “top–down” approaches that combine lithography of high‐quality bulk wafers (using either traditional photolithography or phase‐shift optical lithography) with anisotropic chemical etching. This method gives good control over the lateral dimensions, lengths, and morphologies of free‐standing wires. The behaviors of many different resist layers and etching chemistries are presented. It is shown how wire arrays with highly ordered alignments can be transfer printed onto plastic substrates. This “top–down” approach provides a simple, effective, and versatile way of generating high‐quality single‐crystalline wires of various compound semiconductors. The resultant wires and wire arrays have potential applications in electronics, optics, optoelectronics, and sensing.     

动态电场诱导氧化实现纳米结构的加工

利用原子力显微镜 (AFM )进行表面的局部氧化加工是进行纳米结构加工的一种很有前途的方法。它具有广泛的应用范围 ,可以进行功能性纳米电子器件和纳米机械结构的加工。实验采用了动态电场作用下的AFM诱导氧化的方法 ,提高了氧化物的生长速度 ,并且改善了氧化结构的纵横比 ,能够更好地控制生成氧化物的结构和电属性。