Response of Sample Temperature during Straight-Line Ion Implantation

A theoretical model for calculation of the sample temperature during straight-line nitrogen ion implantation was established based on the results of experiment in this paper. Taking the pure aluminum as the samples, and from the transformation of electric energy into thermal energy, the calculated values of the temperature were in good agreement with the measured values in the experiment. According to the simulation, this technology can be applied to the control of specimens temperature during the implantation.     

射频热等离子体球化氧化铝粉末的实验研究

采用射频热等离子体作为高温热源对氧化铝粉末进行球化处理实验研究。结果表明:当送粉量为35 g/min时,球化后的氧化铝粉末表面极光滑,而且颗粒与颗粒之间没有粘连,分散性好,球化率几乎达到了100%。进一步提高送粉量,球化率有所降低。采用X射线衍射仪分析球化前后氧化铝粉末的相变。结果显示:前驱粉末为弱结晶的γ-Al2O3经射频热等离子体球化后变转为结晶度较好的α-Al2O3和θ-Al2O3。     

The Properties of the Rectangular Arc Ion Plating with Magnetic Filtering Shutter

A major obstacle to the broad application of cathodic arc plasma deposition is the presence of macroparticles. In this paper, the properties of the large rectangular arc ion plating with a magnetic filtering shutter system to filter macroparticles are studied. It is proposed that the macroparticles in the plasma beam are effectively removed with the magnetic filtering shutter system, and the quality of the deposited films is improved.     

Influence of Temperature on Nitrogen Ion Implantation of Ti6Al4V Alloy

1. IntroductionTi6A14V alloys have been widely applied in various fields from aircraft components, chemical prrycessing facilities to medical implants, because of itsremarkable mechanical and chemical properties suchas high strength--toweight ratio and corrosion resistance [l]. Hoal.ever, its poor hardness and inferior wearing-resistance make the applicable scope ofthis material limited [2,31. There are a few reportson the effects of nitrogen ion implantation on hardness: wearing resistance, …     

A study of temperature effect on Ta+N ion-implanted hardalloy

1. IntroductionIon implantation being an effective technology forsurface modification has brought about Notable effects on the surfaCe hardness, wearability and corrosion resistance Of materials [1, 2l. However, themajor limitation to its wide use in industry i8 thatthe modlfied layer is very shallow, and llot suitableto many industrial aPplicatlons. Althougb the modi-fied l8y6r can be imProved by increasing the imPlant-ing energy, yet over-ranged X-ray 1nduced would beharmful to human heal…     

钛合金微弧氧化陶瓷膜微观特性的分析

微弧氧化膜存在微米量级宏孔,这些宏孔对氧化膜特征的研究非常重要.研究了微弧氧化中电流密度对微弧氧化膜的生长速率、结构形貌及相组成的影响,并对氧化膜进行了离子束抛光处理,分析了氧化膜和微孔的组织结构.研究表明:电源频率固定为1 500 Hz/5 μs和氧化膜厚为10 μm时,随着氧化电流密度的增大,氧化膜的生成速度和孔径都随之增大,但同一膜厚的氧化层组成成分金红石型TiO2和锐钛矿型TiO2的相对含量无明显变化;离子束抛光后的氧化膜膜层外疏内密,放电通道内表面更是淀积了电解液溶质、氧化膜颗粒及基材等多种物质的纳米微颗粒.     

渗硼注氮复合处理表面硬化层研究

采用渗硼工艺和新型的等离子体源氮离子注入技术对Cr12MoV钢进行复合处理 ,获得了高硬度的表面硬化层。用XPS对硬化层进行相分析和性能试验 ,结果表明 :硬化层主要由立方氮化硼 (C BN)和FeB组成 ,硬化层具有很高的硬度和耐磨性     

新一代全方位离子注入及增强沉积工业机

本文报告了核工业西南物理研究院最近研制开发的新一代全方位离子注入及增强沉积工业机。该机直径 90 0 m m,高 10 5 0 m m,立式放置 ,抽气系统由分子泵及机械泵构成并且实现了 PL C控制 ,本底真空小于 4× 10 - 4Pa。气体和金属等离子体可分别由热阴极放和三个高效磁过滤式金属等离子体源产生。真空室顶部预留了法兰口并配有冷却靶台。该机的负高压脉冲幅值为 10～ 80 k V,重复频率为 5 0～ 5 0 0 Hz,脉冲上升沿小于 2 μs,并且可根据需要产生脉冲串。一般地等离子体密度为 10 8～ 10 1 0 cm- 3,膜沉积速率为0 .1～ 0 .5 nm/s。文中亦报道了一些实验结果     

全方位离子注入及增强沉积工业机和应用

报道了等离子体源离子注入 (PSII)或等离子体浸没离子注入 (PIII)及增强沉积工业机的实验结果及应用。该机真空室直径 90 0mm ,高 10 5 0mm ,立式放置 ,抽气系统由分子泵及机械泵构成并且实现了PLC控制 ,本底真空小于 4× 10 - 4Pa。等离子体由热阴极放电或三个高效磁过滤式金属等离子体源产生 ,因此可实现全方位离子注入或增强沉积成膜。该机的负高压脉冲最高幅值为 80kV ,最大脉冲电流为 6 0A ,重复频率为 5 0— 5 0 0Hz ,脉冲上升沿小于 2 μs,并且可根据需要产生脉冲串。其等离子体密度约为 10 8— 10 10 ·cm- 3,膜沉积速率为 0 .1— 0 .5nm/s。     

磁控溅射矩形靶磁场的优化设计

磁控溅射靶材的利用率在降低生产成本中起着重要作用.正交的靶电磁场能显著地延长电子的运动路程,增加同工作气体分子的碰撞几率,提高等离子体密度,使磁控溅射速率数量级的提高,因此靶面正交电磁场的分布将决定靶的烧蚀情况.提出了2种改善矩形平面靶磁场分布的方法,经过分析,这2种设计将拓宽靶面的刻蚀范围,提高靶材的利用率.