On a transistor-type hydrogen gas sensor prepared by an electrophoretic deposition (EPD) approach

A Pd/GaN/AlGaN heterostructure field-effect transistor (HFET)-type hydrogen gas sensor, based on an electrophoretic deposition (EPD) approach, is fabricated and studied. Due to the formation of good Schottky gate contact by an EPD approach, the studied HFET shows improved DC performance including the suppressed gate current and better thermal stabilities on current–voltage (I–V) characteristics. This is mainly attributed to the reduction of interface trap density and improved Pd morphology. The EPD-based Pd morphologies are examined by X-ray diffraction, energy dispersive spectroscopy, Auger electron spectroscopy, scanning electron microscopy, and atomic force microscopy. For the used gate-dimension of 1 μm × 100 μm, an EPD-based HFET shows low gate current of 2.9 nA, maximum drain saturation current of 490 mA/mm, and maximum extrinsic transconductance of 78.9 mS/mm at room temperature. Also, solid thermal stabilities on maximum drain saturation current (−0.46 mA/mm K) and maximum extrinsic transconductance (−0.08 mS/mm K) are found as the temperature is increased from 300 to 600 K. For hydrogen gas sensing application, at 370 K, the maximum hydrogen sensitivity of 600.1 μA/mm ppm H₂/air under a 5 ppm H₂/air ambiance and fast response time (30 s) and recovery time (47 s) under a 10,000 ppm H₂/air ambiance are obtained. The EPD approach also demonstrates advantages of low cost, simple apparatus, easy process, little restriction on the shaped substrate, composited deposition, and adjustable alloy grain size. Therefore, the proposed EPD approach gives the promise for fabricating high-performance HFET devices and hydrogen gas sensors.     

Superior suppression of gate current leakage in Al<Subscript>2</Subscript>O<Subscript>3</Subscript>/Si<Subscript>3</Subscript>N<Subscript>4</Subscript> bilayer-based AlGaN/GaN insulated gate heterostructure field-effect transistors

AlGaN/GaN-based metal-insulator-semiconductor heterostructure field-effect transistors (MIS-HFETs) with Al₂O₃/Si₃N₄ bilayer as insulator have been investigated in detail, and compared with the conventional HFET and Si₃N₄-based MIS-HFET devices. Al₂O₃/Si₃N₄ bilayer-based MIS-HFETs exhibited much lower gate current leakage than conventional HFET and Si₃N₄-based MIS devices under reverse gate bias, and leakage as low as 1×10⁻¹¹ A/mm at −15 V has been achieved in Al₂O₃/Si₃N₄-based MIS devices. By using ultrathin Al₂O₃/Si₃N₄ bilayer, very high maximum transconductance of more than 180 mS/mm with ultra-low gate leakage has been obtained in the MIS-HFET device with gate length of 1.5 μm, a reduction less than 5% in maximum transconductance compared with the conventional HFET device. This value was much smaller than the more than 30% reduction in the Si₃N₄-based MIS device, due to the employment of ultra-thin bilayer with large dielectric constant and the large conduction band offset between Al₂O₃ and nitrides. This work demonstrates that Al₂O₃/Si₃N₄ bilayer insulator is a superior candidate for nitrides-based MIS-HFET devices.     

基于再生长欧姆接触工艺的220 GHz InAlN/GaN 场效应晶体管

本文在蓝宝石衬底上研制了具有高电流增益截止频率(f_T)的InAlN/GaN异质结场效应晶体管 (HFETs)。基于MOCVD外延n -GaN欧姆接触工艺实现了器件尺寸的缩小,有效源漏间距(L_sd)缩小至600 nm。此外,采用自对准工艺制备了50 nm直栅。由于器件尺寸的缩小,V_gs= 1 V下器件最大饱和电流(I_ds)达到2.11 A/mm,峰值跨导达到609 mS/mm。小信号测试表明,器件f_T达到220 GHz、最大振荡频率(f_max)达到48 GHz。据我们所知,该f_T值是目前国内InAlN/GaN HFETs器件报道的最高结果。     

GaN HFET的性能退化

在综述大功率AlGaN/GaN HFET性能退化实验结果的基础上,研究了器件退化与电流崩塌间的关联。分析了现有各类器件失效模型的优点和不足之处。通过沟道中强电场和热电子分布的研究,完善了热电子触发产生缺陷陷阱的器件退化模型。使用这一模型解释了实验中观察到的各类性能退化现象,指出优化设计异质结构可以有效减弱GaN HFET的性能退化。最后提出减弱器件性能退化的方法和途径。     

AlGaN/GaN HFET的优化设计

从自洽求解薛定谔方程和泊松方程出发研究了不同掺杂方式下异质结能带和二维电子气的行为。发现掺杂能剪裁异质结能带的弯曲度、控制电子气的二维特性和浓度。在此基础上研究了不同掺杂方式的掺杂效率。通过掺杂和势垒结构的优化设计,得出了用δ掺杂加薄AlN隔离层的结构,既提高了电子气浓度,又保持电子气的强二维特性。从电子气浓度和栅对电子气的控制力度出发,提出了HFET势垒优化设计中的电子气浓度与势垒层厚度乘积规则。依据二维表面态理论,研究了表面态随帽层掺杂结构的变化。从前述乘积规则和表面态变化出发进行了内、外沟道异质结构的优化设计。优化结构既提高了电子气浓度和跨导,降低了欧姆接触电阻,又抑制了电流崩塌。     

S波段GaAs高效率线性内匹配HFET研制

介绍了一种基于GaAs HFET结构的S波段内匹配器件的设计方法。由于大栅宽器件模型难以准确确定,提取了具有相似结构的小栅宽器件模型。在ADS设计环境中,利用Load-Pull算法推算出大栅宽器件的管芯阻抗。器件采用两个栅宽为16mm的管芯进行功率合成。对于匹配电路的设计,首先通过一级LC低通滤波网络进行阻抗变换,将每个管芯的阻抗提升到10Ω左右,再通过Wilkinson功分器将阻抗变换到50Ω。电容和功分器采用瓷片加工,电感则通过金丝实现。研制成功的内匹配功率管,其工作频率为2.2～2.5GHz,输出功率P1dB大于20W,功率增益G1dB大于14dB,功率附加效率大于48%。     

GaN基HFET中极化诱导二维电子气和电流崩塌效应

从纤锌矿GaN的晶体结构和微电子学理论出发,介绍了GaN基HFET中两种极化效应的物理机制,分析了二维电子气(2DEG)的形成,极化与2DEG浓度的关系以及提高2DEG浓度的方法.列举了三种典型的电流崩塌效应,分别介绍了其成因和抑制方法,并对各种抑制电流崩塌的方法进行了比较.     

GaN HFET沟道中的电子态转换和沟道右势垒剪裁

在分析AIGaN／GaN沟道阱中电子迁移率、截止频率fT和噪声性能随电子气密度变化的基础上，研究了沟道电子态随电子密度的变化。发现在高电子密度下电子会向量子限制较弱的退局域态转移。同时还经由热电子隧穿而跃迁到表面态。在低电子密度下，沟道阱产生畸变而蜕化为三维态。运用这一电子态转换模型解释了输运噪声特性随电子气密度的变化。最后指出剪裁沟道右势垒可以弱化高、低电子气密度下输运和噪声性能的衰退。     

RF-MBE生长AlN/GaN超晶格结构二维电子气材料

用射频等离子体辅助分子束外延技术( RF- MBE)在c面蓝宝石衬底上外延了高质量的Ga N膜以及Al N/Ga N超晶格结构极化感应二维电子气材料.所获得的掺Si的Ga N膜室温电子浓度为2 .2e1 8cm- 3,相应的电子迁移率为2 2 1cm2 /( V·s) ;1μm厚的Ga N外延膜的( 0 0 0 2 ) X射线衍射摇摆曲线半高宽( FWHM)为7′;极化感应产生的二维电子气室温电子迁移率达到10 86cm2 /( V·s) ,相应的二维电子气面密度为7.5e1 2 cm- 2 .     

Au-AlGaN/GaN HFET研制与器件特性

报道了栅长为1.5μm Au-AlGaN/GaN HFET器件的研制和器件的室温特性测试结果.同时,研究了器件经300℃、30min热处理对器件性能的影响,并对比了热处理前后器件的室温特性.实验证明:室温下,器件具有良好的输出特性和肖特基结伏安特性,反向漏电流较小,最大跨导可达47mS/mm;经过300℃、30min热处理后器件的室温输出特性有显著改善,而且器件饱和压降明显降低,说明300℃热处理没有给器件造成不可恢复的破坏.