还原时间对AlOx/WOx RRAM开关速度的调制作用

基于128 kbit AlOx/WOx双层结构阻变存储器(RRAM)芯片,提出并验证了还原时间对RRAM开关速度的调制作用,同时设计了一种固定电压幅值逐步增大脉宽的算法用于RRAM阵列中速度的测试.还原处理的时间越长,AlOx层的厚度越薄,同时氧空位的含量增多,可加快导电细丝的形成、断裂和重新连接,进而提升芯片的开关速度.测试结果表明,还原时间由10 min增加至30 min,在4V和4.5V操作电压下,FORMING速度分布的均值分别由200 ns减小至120 ns和由100 ns减小至60 ns;在4V和4.5V操作电压下,RESET速度分布的均值分别由160 ns减小至120 ns和由120 ns减小至100 ns;SET速度分布的均值在4V电压下可由120 ns减小至80 ns.此外,还原时间的增长可以改善速度分布的一致性,减小速度的波动.     

Organic nonpolar nonvolatile resistive switching in poly(3,4-ethylene-dioxythiophene): Polystyrenesulfonate thin film

In this paper, the reproducible nonpolar resistive switching is demonstrated in devices with the sandwiched structure of Au/poly(3,4-ethylene-dioxythiophene): polystyrenesulfonate/Au for nonvolatile memory application. The switching between high resistance state (OFF-state) and low resistance state (ON-state) does not depend on the polarity of the applied voltage bias, which is different from both the WORM characteristics and the bipolar switching characteristics reported before. The resistive ratio between the ON- and OFF-state is on the order of 10³ and increases with the device area decreasing. Both the ON- and OFF-state of the memory devices are stable, showing no significant degradation over 10⁴ s under continuous readout testing. It is proposed that the reduction and oxidation of PEDOT: PSS film might be the switching mechanism.     

Nanoscale Plasmon‐Enhanced Spectroscopy in Memristive Switches

Resistive switching memories are nonvolatile memory cells based on nano‐ionic redox processes and offer prospects for high scalability, ultrafast write and read access, and low power consumption. In two‐terminal cation based devices a nanoscale filament is formed in a switching material by metal ion migration from the anode to the cathode. However, the filament growth and dissolution mechanisms and the dynamics involved are still open questions, restricting device optimization. Here, a spectroscopic technique to optically characterize in situ the resistive switching effect is presented. Resistive switches arranged in a nanoparticle‐on‐mirror geometry are developed, exploiting the high sensitivity to morphological changes occurring in the tightly confined plasmonic hotspot within the switching material. The focus is on electrochemical metallization and the optical signatures detected over many cycles indicate incomplete removal of metal particles from the filament upon RESET and suggest that the filament can nucleate from different positions from cycle to cycle. The technique here is nondestructive and the measurements can be easily performed in tunable ambient conditions and with realistic cell geometries.     

Evidence for compliance controlled oxygen vacancy and metal filament based resistive switching mechanisms in RRAM

We present electrical evidence on asymmetric metal-insulator-semiconductor (MIS) based test structures in support of the presence of two different independent switching mechanisms in a resistive random access memory (RRAM) device. The valid mechanism for switching depends on the compliance capping (I_gl) for forming/SET transition. Our results convincingly show that low compliance based switching only involves reversible oxygen ion drift to and from oxygen gettering gate electrodes, while high compliance switching involves formation and rupture of conductive metallic nanofilaments, as verified further by our physical analysis investigations. We have observed this unique dual mode switching mechanism only in NiSi-based gate electrodes, which have a moderate oxygen solubility as well as relatively low melting point.     

二氧化铪材料中Cu的最佳迁移路径

The movement of Cu in a HfO2-based resistive random access memory （RRAM） device is investigated in depth by first-principle calculations. Thermodynamics analysis shows that the dominant motion of Cu tends to be along the [001] orientation with a faster speed. The migration barriers along different routes are compared and reveal that the [001] orientation is the optimal migration route of Cu in HfO2, which is more favorable for Cu transportation. Furthermore, the preferable HfOz growth orientation along [100], corresponding to Cu migration along [001], is also observed. Therefore, it is proposed that the HfO2 material should grow along [100] and the operating voltage should be applied along [001], which will contribute to the improvement of the response speed and the reduction of power consumption of RRAM.     

Unipolar resistive switching of Au+-implanted ZrO2 films

The resistive switching characteristics of Au+-implanted ZrO2 films are investigated.The Au/Cr/Au+-implanted-ZrO2/n+-Si sandwiched structure exhibits reproducible unipolar resistive switching behavior.After 200 write-read-erase-read cycles,the resistance ratio between the high and low resistance states is more than 180 at a readout bias of 0.7 V. Additionally,the Au/Cr/Au+-implanted-ZrO2/n+-Si structure shows good retention characteristics and nearly 100% device yield.The unipolar resistive switching behavior is due to changes in the film conductivity related to the formation and rupture of conducting filamentary paths,which consist of implanted Auions.