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1.
Using the photonic band gap in photonic crystals, the fundamental waveguide structures for the light wavelength range have been developed. Based on the fine structure of these many functional devices have been proposed by analytical or numerical simulation methods and the experiments of trial manufacture. In this paper, the treatment of chiral dielectric in the Condensed Node Spatial Network for the vector potential is explained, and we show the polarization plane rotation property in air‐hole and pillar type photonic crystal waveguide structures with the chiral medium substrate. Then, we show the fundamental advantage of the air‐hole type photonic crystal waveguide structure in application to a mode converter. © 2005 Wiley Periodicals, Inc. Electr Eng Jpn, 152(1): 7–14, 2005; Published online in Wiley InterScience ( www.interscience. wiley.com ). DOI 10.1002/eej.20098 相似文献
2.
Sang-Hoon Shin Sung-Dae Kim Jong-Ha Moon Jin-Hyeok Kim 《Journal of Electroceramics》2006,17(2-4):1097-1101
Er3+/Pr3+ co-doped soda-lime glass thin films have been fabricated using RF magnetron sputtering method and their structural and optical
properties have been studied. Deposition rate, crystallinity, and composition of glass thin films were investigated by scanning
electron microscopy, transmission electron microscopy, and electron probe micro area analysis. Refractive index, birefringence
and binding characteristics have been investigated using a prism coupler and X-ray photoelectron spectroscopy. Er3+/Pr3+ co-doped soda lime glass thin films were prepared by changing substrate temperature (room temp. ∼550∘C), RF power (90 W–130 W), and Ar/O2 gas flow ratio at processing pressure of 4 mTorr. Glass thin films could be obtained at the optimized processing condition
at 350∘C, RF power of 130 W, and gas flow of Ar:O2 = 40:0 with maximum deposition rate of 1.6 μm/h. Refractive index and birefringence increased from 1.5614 to 1.5838 and from
0.000154 to 0.000552, respectively, as the content of Pr3+ increased. Binding energy of Pr3d also increased as the content of Pr3+ increased. 相似文献
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利用相位关系和交叉耦合的模型,提出了直线型波导滤波器的一种关于交叉耦合的具体实现方法:即在不相邻的腔体之间直接用同轴线引入交叉耦合。采用这种方法设计了一种五腔滤波器,应用HFSS软件进行了仿真验证。结果表明,所设计的滤波器整体结构得到简化,中心频率为8.5 GHz,带宽为150 MHz。 相似文献
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本文给出了一种能够传输均匀场的介质壁矩形波导,在数值计算的基础上得出了其结构参数;并进一步分析了加载工作物质对其场型的影响。 相似文献
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DAI Hong-quan CHEN Hai-yan 《半导体光子学与技术》2007,13(3):206-209
Addressed is the calculation of millimeter wave attenuation on coplanar waveguide(CPW). A novel conformal wavelet finite-difference time-domain(CWFDTD) algorithm is proposed with emphasis on its application in calculation of millimeter wave attenuation on CPW, which is the combination of conformal algorithm dealing with the deformed cell with Wavelet-FDTD using multi-resolution analysis(MRA). Derived is the difference formulation for multi-resolution time domain(MRTD) based on Daubechies wavelets, and also given is the stability conditions for wavelet-FDTD algorithm. To validate its accuracy and efficiency, this novel method is applied to calculate the millimeter wave attenuation on lithium niobate CPW. Numerical results demonstrate that this new CWFDTD algorithm has the same accuracy with the conformal finite-difference timedomain(CFDTD) and conformal finite-difference time-domain based on alternating-direction implicit method (ADI-CFDTD), but saves computational time and computer memory. 相似文献
10.
CsLiB6O10 (CLBO) thin films are grown on Si (100) and (111) substrates using lower index SiO2 and CaF2 as buffer layers by pulsed KrF (248 nm) excimer laser ablation of stoichiometric CLBO targets over a temperature range of
425 to 725°C. A CaF2 buffer layer is grown on Si by laser ablation while SiO2 is prepared by standard thermal oxidation. From extended x-ray analysis, it is determined that CaF2 is growth with preferred orientation on Si (100) at temperatures lower than 525°C while on Si (111) substrate, CaF2 is grown epitaxially over the temperature range; this agrees well with observed reflection high energy electron diffraction
patterns. X-ray 2θ-scans indicate that crystalline CLBO are grown on SiO2/Si and CaF2/Si (100). Analysis of reflectance spectra from CLBO/SiO2/Si yields the absorption edge at 182 nm. Surface roughness of the CaF2 and CLBO/CaF2/Si film are 19 and 15 nm, respectively. This relatively rough surface caused by the ablation of wide bandgap CaF2 and CLBO limits the application of CLBO for waveguiding measurement. 相似文献