中小型锅炉烟尘治理中存在的问题及对策

为了彻底解决目前许多城市中小型燃煤锅炉烟尘排放超标率仍然很高这一问题,在对山东枣庄、济宁和江苏徐州等城市数百台中小型锅炉除尘系统现状及有关情况进行了详细调查的基础上,通过分析、总结,从认识、规章制度、锅炉燃烧操作、除尘器选型以及运行管理等方面对目前中小型锅炉烟尘治理中存在的问题及对策进行了详细论述.     

Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Films by Dielectric Barrier Discharge in TiCl_4/O_2/N_2 Gas Mixtures

Low-pressure dielectric barrier discharge（DBD） TiCl4/O2and N2 plasmas have been used to deposit titanium oxide films at different power supply driving frequencies. A homemade large area low pressure DBD reactor was applied, characterized by the simplicity of the experimental set-up and a low consumption of feed gas and electric power, as well as being easy to operate. Atomic force microscopy, scanning electron microscopy, energy dispersive spectroscopy,and contact angle measurements have been used to characterize the deposited films. Experimental results show all deposited films are uniform and hydrophilic with a contact angle of about 15 o.Compared to titanium oxide films deposited in TiCl4/O2gas mixtures, those in TiCl4/O2/N2gas mixtures are much more stable. The contact angle of titanium oxide films in TiCl4/O2/N2gas mixtures with the addition of 50% N2 and 20% TiCl4 is still smaller than 20 o, while that of undoped titanium oxide films is larger than 64 owhen they are measured after one week. The low-pressure TiCl4/O2plasmas consist of pulsed glow-like discharges with peak widths of several microseconds, which leads to the uniform deposition of titanium oxide films. Increasing a film thickness over several hundreds of nm leads to the film’s fragmentation due to the over-high film stress. Optical emission spectra（OES） of TiCl4/O2DBD plasmas at various power supply driving frequencies are presented.     

等离子体作用下甲烷和氮氧化物活化转化研究

比较了不同的放电方式,即单纯脉冲火花放电、脉冲流光放电(针-板式、线-筒式)、介质阻挡放电(正脉冲、交流)对NO和CH4的活化转化能力。其中脉冲火花放电和针-板式脉冲流光放电对CH4的活化能力较强,CH4的最大转化率分别为100%和36%,但是在N2+O2体系中NOx的合成加剧。如在针-板式脉冲流光放电中,在O2体积分数为9.8%时,NO的体积分数为449μL/L。线-筒式脉冲流光放电中,即使在输入功率为14.4W时,CH4的最大转化率小于3%,而NO的最大转化率为25%。正脉冲介质阻挡放电中,在21.6kV、输入功率6.4W时,NO和CH4的转化率分别为31%和4.4%,在交流介质阻挡放电中,在低温下有利于NO的转化,在100℃、输入功率为6W时,NO转化率为34.5%,但是对CH4的活化能力较弱。     

Microscopic Damage of Tungsten and Molybdenum Exposed to Low-Energy Helium Ions

Polycrystalline tungsten(W)and molybdenum(Mo)materials both non-annealed and annealed at temperatures of 800-1750~C have been irradiated with low-energy(220 eV),high-flux(~10~(21)ions/m~2.s)He~+at an irradiation temperature of 600℃and at a dose of1.0×10~(25)ions/m~2.This non-destructive conductive atomic force microscopy technique provides direct observation and comparison of surface swellings with growth of nanoscale defects in the irradiated materials.A coral-like surface structure and nanostructured defects were formed in W when irradiated at a He+dose of 1.0×10~(25)ions/m~2.Increasing the annealing temperature resulted in an increase in the size of nanostructured defects and serious surface damage of W.Compared to W,Mo suffered much less surface damage after being irradiated at various He~+doses.     

基于小波变换利用超声估计生物组织散射元平均间距

生物组织散射元平均间距是描述生物组织微观结构和生物组织和超声散射特性和重要参数,文中构建并物理仿真了生物组织散射元一维超声散射模型,用小波变换方法估计了仿一物组织散射元的平均间距。     

Co-ZSM-5催化剂上烃类选择性催化还原NOx机理研究进展

烃类选择性催化还原氮氧化物可能是富氧条件下脱除汽车尾气中氮氧化物污染的有效途径。以Co-ZSM-5催化剂为例，综述了国内外有关Co-ZSM-5催化剂及其在富氧条件下烃类选择还原氮氧化物的机理研究，并将烃类选择还原氮氧化物的过程概括为以下三个步骤：(1) (NO)ad + (O₂)ad (NOy)ad ( y ≥2 )；(2) (NOy)ad + (CxHy)ad …… (NCaObHc )ad；(3) (NCaObHc )ad + NO + O₂ …… N₂ + CO₂ + CO + H₂O。     

ICP—CVD制备氟化非晶碳（a—C：F）薄膜的研究

本文使用CH2F2为源气体,利用电感耦合等离子体增强化学气相沉积(ICP-CVD)法在不同放电模式(连续或脉冲)、沉积气压、射频功率和位置下制备了a-C∶F薄膜.用原子力显微镜(AFM)观察了薄膜的表面形貌,通过FTIR、XPS对其结构进行了表征.研究结果表明:放电模式、放电气压、射频功率、基底位置均对薄膜的表面粗糙度(RMS)和组成具有重要的影响.在脉冲波模式下,增加放电气压,薄膜RMS值的变化呈现出先降低后升高的变化趋势;基底距离线圈的距离越远,所沉积薄膜的RMS值越小.而在连续波模式下,距离线圈较远的B、C位置薄膜的RMS值却相对较高.增加放电功率导致沉积薄膜的RMS值较小.本文也对CH2F2等离子体进行了发射光谱(OES)诊断研究.结果表明,对比脉冲波模式,连续波放电时等离子体中含碳物种明显减少.结合表征结果和OES结果对薄膜的生长机理进行了探讨.     

DBD-PECVD法制备CN薄膜的结构及性能研究

使用自行设计的真空系统,采用介质阻挡放电等离子体增强化学气相沉积(DBD-PECVD)法,分别以CH4/N2、C2H2/N2、C2H4/N2混合气体作为反应气体,在单晶硅片上成功制备了CN薄膜.FTIR结果证实了薄膜中碳氮原子结合成化学键,Raman结果说明薄膜中含有类金刚石结构,AFM结果表明薄膜粗糙度随放电气压的升高而逐渐增大.三种混合气体沉积的CN薄膜,以CH4/N2的沉积速度最慢,薄膜表面粗糙度最小,含H量最少;C2H2/N2的沉积速度最快,薄膜表面粗糙度最大.     

氦离子辐照对钨纳米丝稳定性的影响

用150 eV高能氦(He)离子在400 K对多晶钨(W)表面的W纳米丝进行间歇式辐照并使用扫描电子显微镜、透射电子显微镜以及称重法等手段对其表征,研究了He离子辐照对W纳米丝演变过程的影响。结果表明,高能He离子辐照使W纳米丝极不稳定。随着辐照剂量的增加W纳米丝之间的交联程度逐渐降低。W丝内的He泡在高能He离子溅射的作用下破裂,使W丝塌陷合并,部分溅射出来的W原子沉积在近邻的W纳米丝外壁或W丝根部,最终使W纳米丝演变成顶部细根部粗的锥型结构。