雷达信号处理系统仿真

该文以海上作战指挥系统中的舰载雷达为背景,对战场环境下舰艇编队作战指挥系统中的舰载某脉冲压缩雷达信号处理系统进行建模与仿真,仿真结果表明这种方法能够较好的反映雷达信号处理系统的各部分性能,满足系统调试的要求。     

盐酸胍在阻挡层化学机械抛光中对速率选择性及表面形貌的影响

We propose an alkaline barrier slurry containing guanidine hydrochloride（GH） and hydrogen peroxide.The slurry does not contain any corrosion inhibitors, such as benzotriazole（BTA）. 3-inch samples of tantalum copper and oxide were polished to observe the removal rate. The effect of GH on removal rate selectivity along withhydrogenperoxidewasinvestigatedbycomparingslurrycontainingGHandH2O2withslurrycontainingonly GH. Details about the tantalum polishing mechanism in an alkaline guanidine-based slurry and the electrochemical reactions are discussed. The results show that guanidine hydrochloride can increase the tantalum polishing rate and the selectivity of copper and barrier materials. The variation of the dishing and wire line resistance with the polishing time was measured. The dishing value after a 300 mm pattern wafer polishing suggests that the slurry has an effective performance in topography modification. The result obtained from the copper wire line resistance test reveals that the wire line in the trench has a low copper loss.     

雷达信号处理系统仿真

该文以海上作战指挥系统中的舰载雷达为背景,对战场环境下舰艇编队作战指挥系统中的舰载某脉冲压缩雷达信号处理系统进行建模与仿真,仿真结果表明这种方法能够较好的反映雷达信号处理系统的各部分性能,满足系统调试的要求。     

碱性阻挡层CMP后铜布线粗糙度的影响机理分析

The surface roughness seriously affects the performance of devices after barrier CMP. Due to the high surface roughness of copper line, the local resistance of a device will be high when working, then the copper line will overheat prompting the generation of electro-migration and the circuit will lose efficacy. Reducing the surface roughness of the copper line in barrier CMP is still an important research topic. The main factors influencing the surface roughness of copper line in alkaline barrier slurry are analyzed in the paper. Aimed at influencing the law on the surface roughness of copper line, using a new type of alkaline barrier slurry with a different p H of the chelating agent and changing the content of non-ionic surfactant, we then analyze the influencing law both on the surface roughness of copper line, and the influence mechanism. The experimental results show that with a chelating agent with a low p H value in the barrier slurry, the surface roughness of the copper line is 1.03 nm and it is the lowest in all of the barrier slurries, and with the increase of non-ionic surfactant concentration, the surface roughness of copper line is reduced to 0.43 nm, meeting the demand of further development of integrated circuits.     

基于VMD-HS-BP的建筑光伏发电功率预测模型

本文提出了一种基于VMD-HS-BP神经网络的光伏发电功率预测模型.利用相关性分析法选出相关性高的输入变量,使用VMD将原始数据分解为多个模态分量,利用和声搜索算法优化BP神经网络权值,用优化后的神经网络预测各分量,将分量预测值叠加得出光伏发电功率预测值.实践结果表明,VMD-HS-BP预测模型能达到更高的预测精度,更贴近光伏发电的实际运行功率.     

新型碱性阻挡层抛光液的研究(英文)

为了达到Ta的高去除速率,通过实验改变碱性阻挡层抛光液中各组分的体积分数,研究各组分变化对阻挡层材料Cu和Ta抛光速率的影响。碱性阻挡层抛光液中,首先确定磨料及去离子水的比例,然后再改变盐酸胍和螯合剂等组分体积分数,得到Cu和Ta抛光速率的变化规律,便于选取此条件下阻挡层抛光液最佳配比。通过各种测试手段表征抛光液对12英寸(1英寸=2.54 cm)布线片碟形坑修正能力及铜布线表面粗糙度的影响。结果表明,Ta和Cu材料的抛光速率随各组分变化规律明显,当磨料体积分数为30%、盐酸胍体积分数为3%以及螯合剂体积分数为1%时,可以达到Ta和Cu的最大抛光速率差。优化后的新型阻挡层抛光液1 min内可以实现碟形坑的有效修正及粗糙度的明显降低。     

基于聚类与Hough变换的交通标志检测方法

交通标志检测是进行交通标志识别系统的关键技术,提出一种基于图像的颜色和形状进行交通标志检测的方法.首先对图像进行灰度拉伸和噪声滤出的预处理,然后利用改进的K-means聚类算法对彩色图像进行颜色分割,最后采用基于Hough变换的形状检测技术对交通标志中的特殊形状进行定位,从而实现交通标志的检测.实验结果显示,该方法在各种复杂背景条件下检测出结果的平均正确率达到93.0%,优于同条件的算法且具有较高的实时性.     

高稀释倍数碱性铜精抛液在Cu CMP中的应用

采用自制的不含常用的腐蚀抑制剂(BTA)碱性铜精抛液对铜和钽进行了化学机械抛光。研究了高稀释倍数(50倍)的精抛液对铜膜的静态腐蚀速率和抛光速率以及钽抛光速率的影响,并对65 nm技术节点的300 mm单层铜布线片进行了平坦化研究。结果表明,铜膜的静态腐蚀速率为1.5 nm/min,动态抛光速率为206.9 nm/min,阻挡层Ta/TaN抛光速率仅为0.4 nm/min,Cu/Ta选择比高。此精抛液能够有效去除残余铜,进一步过抛完全去除残余铜时,对阻挡层的去除速率趋于0,而沟槽里的铜布线去除量低,碟形坑和蚀坑大小满足实际平坦化要求。此精抛液可满足65 nm技术节点平坦化的要求。