The photoresponse and photoconductivity of micron-sized C60 whiskers and sub-millimeter-sized C60 clusters

The photoresponse and photoconductivity properties of micron-sized C60whiskers and sub-millimeter-sized C60clusters are successfully studied by the microfabrication technologies.According to the ultraviolet-visible-near infrared（UVVis-NIR）absorption spectroscopic study,a highly intense absorption is observed in the UV and visible light regions,which indicates probable applications in photoelectric devices.Furthermore,a large photocurrent is measured under the illumination of white light in nitrogen（N2）atmosphere.The micron-sized C60whiskers and the sub-millimeter-sized C60clusters have different photoresponse curves under the same condition of measurement.A quick transformation of photoelectric response is detected in parallel multi-arranged micron-sized C60whiskers,but the recovery of the photocurrent of self-assembly sub-millimeter-sized C60clusters is much slower.     

Fabrication of high aspect ratio gratings for X-ray imaging

Grating-based X-ray imaging system is an important tool to investigate the inner structure of thick samples. The key components of the system consist of three golden gratings. The high aspect ratio gratings are fabricated using the SU-8 material. Considering the grating linewidth broadening varies with exposure dose, the relationship between linewidth broadening and exposure dose is studied experimentally. A series of gratings with different periods and different duty cycles are designed by optimizing the linewidth and exposure dose. Finally, the gratings are successfully fabricated by combining UV lithography and electroplating.     

大高宽比光栅的摇床式辅助显影工艺

针对大高宽比微结构显影过程中由显影液的对流传质严重受限、光刻胶层厚、显影时间长带来的显影不均匀问题,提出了基于翘板式摇床辅助的显影方法。利用有限元法模拟了摇床工作时整个样品表面的流场分布以及显影液在不同高宽比微结构光栅表面的流场分布。模拟结果表明,通过摇床摆动可以实现显影液均匀流动。然后,提出了快速的显影参数确定方法,并通过实验给出了沟槽深宽比和显影速率之间的关系,提供了可参考的显影工艺参数,并验证了工艺参数的合理性。在显影时间为10~12 min,显影速率为0.21~0.23 m/s,沟槽深宽比为2.5,光刻胶厚度为200μm的光栅的显影均匀性优于96%。该方法可以实现大高宽比微结构的均匀显影,满足高质量大高宽比光栅的制作要求。