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<正> Cryogenic CMOS circuits provide a great promise at very high speed operation because of the enhanced mobility of the carriers at low temperature. However, at low temperature, part of the impurities in Si will not be ionized because the Fermi level moves toward the bottom of conduction band(n-Si) or the top of the valence band(p-Si). In the channel region of MOSFET, the freezeout of the carriers is determined not only by the temperature but also the band bending caused by the gate voltage. In this paper, the effects of carrier freezeout on the characteristics of cryogenic CMOS devices are investigated through a numerical simulation and the measurement of device I-V characteristics at liquid nitrogen temperature. It is found that, at 77K, the impurities in the channel region of the surface channel device are completely ionized while that of the burried channel 相似文献
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设计制作了不同沟道长度、栅材料以及栅电极构形的各种双栅MOSFET。通过实验全面研究了设计和工艺参数对器件高频特性的影响,阐明了双栅MOSFET的高频设计思想,给出了全离子注入高频低噪声工艺。有效沟道长度为1μm的超高频双栅MOSFET在900MHz下功率增益为17dB,有效沟道长度为1.5μm的甚高频器件在200MHz下功率增益为23dB. 相似文献
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