Development of a single loop EPR test method and its relation to grain boundary microchemistry for alloy 600

A single loop electrochemical potentiokinetic reactivation test method has been developed for alloy 600 that produces good passivation on all the surfaces, good etching during the reactivation scan and no appreciable pitting. It is able to quantify and discriminate between samples with a wide range of degree of sensitization. The Pa value correlates well with the minimum level of chromium in the depletion regions at the grain boundaries. It has been shown that the width of the attacked regions is much larger than the width of chromium depletion regions and it does not show any direct correlation with either depth or width or with a volume parameter of chromium depletion regions. It has been shown that the chromium carbides are not attacked during the test and that the intragranular regions attacked during the test are the sites of chromium carbides in the grain matrix. A modified Pa parameter is shown to be sensitive down to 7.5 wt% chromium in the depletion regions and indicates that the intragranular carbides have shallower depletion profiles than those at grain boundaries. Comparison of the results of the single loop and the double loop tests showed a good correlation.     

A survey on enhanced subspace clustering

Subspace clustering finds sets of objects that are homogeneous in subspaces of high-dimensional datasets, and has been successfully applied in many domains. In recent years, a new breed of subspace clustering algorithms, which we denote as enhanced subspace clustering algorithms, have been proposed to (1) handle the increasing abundance and complexity of data and to (2) improve the clustering results. In this survey, we present these enhanced approaches to subspace clustering by discussing the problems they are solving, their cluster definitions and algorithms. Besides enhanced subspace clustering, we also present the basic subspace clustering and the related works in high-dimensional clustering.     

Extranasal Staphylococcus aureus colonization predisposes to bloodstream infections in patients on hemodialysis with noncuffed internal jugular vein catheters

Introduction: Staphylococcal infection of endogenous origin is an important cause of morbidity and mortality in patients who receive hemodialysis (HD). The risk of such infections in nasal carriers of the organism is well defined. Extranasal carriage of the organism at extranasal sites may pose similar risks. Methods: A total of 70 patients about to undergo internal jugular vein catheterization for HD were enrolled in this prospective observational study. Swab cultures were obtained from anterior nares, posterior pharynx, axillae, toe web spaces, and vascular access sites at baseline and 1 week later. A patient was defined as a persistent carrier when the same organism was grown in both samples. Staphylococcus aureus bloodstream infections were assessed by blood and catheter tip cultures over a 90‐day period. Findings: The mean age of the patients was 43.71 ± 16.2 years. Persistent S. aureus carriage at anterior nares, throat, axilla, toe web spaces, vascular access site, and all sites was documented in 27.9%, 11.4%, 40%, 32.9%, 4.3%, and 64.2% of patients, respectively. Fifteen patients developed S. aureus infections. Catheter related S. aureus infections (CRI) were more likely in persistent carriers than nonpersistent carriers with odds ratios (95% CI) of 10.2 (2.8–37.1), 8.6 (1.7–42.2), 17.3 (3.4–86.0), 3.0 (0.9–9.8), and 1.9 (0.2–22.4) for anterior nares, throat, axilla, toe web spaces, and vascular access site carriers, respectively. The probability of developing CRI in persistent S. aureus carriers was 55% compared to none in noncarriers at 90 days (P = 0.04). Discussion: Extranasal S. aureus carriage is as significant a risk factor as nasal carriage for staphylococcal infections in patients on HD through catheters. The study is limited by lack of molecular phenotyping.     

On techniques for angle compensation in nonideal iris recognition.

The popularity of the iris biometric has grown considerably over the past two to three years. Most research has been focused on the development of new iris processing and recognition algorithms for frontal view iris images. However, a few challenging directions in iris research have been identified, including processing of a nonideal iris and iris at a distance. In this paper, we describe two nonideal iris recognition systems and analyze their performance. The word "nonideal" is used in the sense of compensating for off-angle occluded iris images. The system is designed to process nonideal iris images in two steps: 1) compensation for off-angle gaze direction and 2) processing and encoding of the rotated iris image. Two approaches are presented to account for angular variations in the iris images. In the first approach, we use Daugman's integrodifferential operator as an objective function to estimate the gaze direction. After the angle is estimated, the off-angle iris image undergoes geometric transformations involving the estimated angle and is further processed as if it were a frontal view image. The encoding technique developed for a frontal image is based on the application of the global independent component analysis. The second approach uses an angular deformation calibration model. The angular deformations are modeled, and calibration parameters are calculated. The proposed method consists of a closed-form solution, followed by an iterative optimization procedure. The images are projected on the plane closest to the base calibrated plane. Biorthogonal wavelets are used for encoding to perform iris recognition. We use a special dataset of the off-angle iris images to quantify the performance of the designed systems. A series of receiver operating characteristics demonstrate various effects on the performance of the nonideal-iris-based recognition system.     

Nano and micro structural studies of thin films of ZnO

Zinc oxide thin films grown by sol–gel and RF sputtering methods have been characterized. The characterization techniques used involve ellipsometry, optical absorption, scanning tunneling microscopy, scanning and transmission electron microscopy. The films grown by sol–gel spin method which followed zinc acetate route exhibited a smoother texture than the films, which were deposited by using zinc nitrate route. The later type of films showed a dendritic character. Nano-structured fine grains of size ranging from 20 to 60 nm were observed with zinc nitrate precursor film. Individual grains show a sharp contrast with different facets and boundaries. Crystal planes and lattice parameters calculated by electron diffraction and X-ray diffraction are quite close and in agreement with the reported values in literature. Scanning tunneling microscopy has been used for measuring the average roughness of the surface and estimating the lattice constants. The STM studies of RF sputtered films, although showing a ZnO structure, exhibited a disturbed lattice. This was presumably due to the fact that after deposition the films were not annealed. Nanographs of 2D and 3D view of atomic positions of ZnO have been presented by using scanning tunneling microscopy.     

Role of residual stresses induced by industrial fabrication on stress corrosion cracking susceptibility of austenitic stainless steel

Effect of residual stress generated during tube fabrication, roll expansion and machining of stainless steel on the stress corrosion cracking (SCC) susceptibility was studied by testing fabricated tubes, tube–tube sheet joint and heavily machined plate of austenitic stainless steel (SS) in boiling MgCl₂. U bend samples of machined plate were exposed to acidified SO₄ + Cl^? environment at room temperature to study its ambient temperature SCC behavior. The results correlate the SCC behavior of the SS tubes and roll expanded joints to the nature and magnitude of residual stresses present. The study also highlights the distinct difference in ambient temperature SCC behavior of machined vs. nonmachined surfaces.     

Investigation of RF sputtered PSG films for MEMS and semiconductor devices

In this work, we report the preparation of phospho-silicate-glass (PSG) films using RF magnetron sputtering process and its application as a sacrificial layer in surface micromachining technology. For this purpose, a 76 mm diameter target of phosphorus-doped silicon dioxide was prepared by conventional solid-state reaction route using P₂O₅ and SiO₂ powders. The PSG films were deposited in a RF (13.56 MHz) magnetron sputtering system at 200-300 W RF power, 10-20 mTorr pressure and 45 mm target-to-substrate spacing without external substrate heating. To confirm the presence of phosphorus in the deposited films, hot-probe test and sheet resistance measurements were performed on silicon wafers following deposition of PSG film and a drive-in step. As a final confirmatory test, a p-n diode was fabricated in a p-type Si wafer using the deposited film as a source of phosphorus diffusion. The phosphorus concentration in the target and the deposited film were analyzed using energy dispersive X-rays (EDAX) tool. The etch rate of the PSG film in buffered HF was measured to be about 30 times higher as compared to that of thermally grown SiO₂ films. The application of RF sputtered PSG film as sacrificial layer in surface micromachining technology has been explored. To demonstrate the compatibility with MEMS process, micro-cantilevers and micro-bridges of silicon nitride were fabricated using RF sputtered PSG as a sacrificial layer in surface micromachining. It is envisaged that the lower deposition temperature in RF sputtering (<150 °C) compared to CVD process for PSG film preparation is advantageous, particularly for making MEMS on temperature sensitive substrates.     

Catalytic oxidation of toluene and m-xylene by activated carbon fiber impregnated with transition metals

The catalytic oxidation of volatile organic compounds (VOCs) into mainly CO₂ and H₂O appears promising in the context of the abatement of atmospheric gaseous pollutants and is the subject of this paper. The catalytic oxidation of toluene and m-xylene was carried out in a tubular reactor on a phenolic resin based activated carbon fiber (ACF) impregnated with nitrates of Co, Cr, Ni, and Cu at the reaction temperatures below 300 °C. The extent of the removal (i.e. conversion) of toluene and m-xylene was examined through the breakthrough curves and was found to strongly depend on the types and loading of the metal precursors. The experimental results showed that the reaction rate was significantly affected by O₂ concentration below 3% (v/v). The performance of the ACFs impregnated with 5% (w/w) of Ni oxide was found to be superior to that of other metal oxides at reaction temperature between 170 and 290 °C. A surface kinetic mechanism for the catalytic oxidation of volatile organic compound was proposed and incorporated in a transport model developed to explain the experimental breakthrough data.