Fabrication of Y_2O_3 buffer layer on polished Ni substrates for YBCO superconducting tape

1IntroductionIn recent years,worldwide research efforts have been made to develop YBCOsuperconducting tapes.Two promising approaches for the profitable production of long YBCOtapes that are suitable for carryinghigh currents in magnetic fields are RABi TS(Rolling Assisted Biaxially Textured Substrates)[1]and IBAD(Ion Beam Assisted Deposition)methods[2].In RABi TS process,the necessarily strong biaxial texture ofthe YBCOfil mis achieved by epitaxial growth of buffer layers andthe …     

Recrystallization Texture and Microstructure of Metal Substrate for Y123 Coated Superconductor

Thesecondgenerationofhigh temperaturesuper conductingtapesusingYBCO 12 3superconductorhavebeenanattractivesubjectinrecentyears .IncomparisonwithBibasedsuperconductors ,YBCOshowsbetterirreversibility ,lowAClosscapabilityandhighcriticalcurrentdensityJC inhighmagneticfields[1] .However ,owingtoitspropertyofphysicalmetallurgy ,YBCOtapescannotbeproducedbyOPIT(OxidePowderinTube)technique ,whichhasbeenusedinBibasedsuperconductorsuccessfully[2 ] .Fur thermore ,poorintergrainbondinginpolycrys…     

铜材表面化学抛光工艺研究

为满足铜材钝化时对于处理表面的要求,本文系统地研究了多种化学抛光液配方与工艺,并对其中效果较好的两种进行了较深入研究,进而提出了可获得最佳表面抛光效果的配方与工艺．     

Influence of the substrate thickness on texture of tape

1 IntroductionThree different approaches are applied to increase the engineering current densuity of the coated con-ductor . The first is to enhance the critical current density of the YBCOfil m[1 -3]. The secondis toincreasethe thichness of the YBCOfil m[1 -3]. The third is to reduce the thickness of the metallic tape[4]. For theRABi TS technique the metallic tape has to provide the cube texture for the epitaxial fil m and sufficientstrength . Therefore it is necessarytoincrease the tap…     

移动Ni-5W基带上制备钇系涂层导体隔离层的研究

采用电子束蒸发和磁控溅射两种工艺在移动的Ni-5W合金基带上制备了Y2O3隔离层,研究了镀膜过程中基带移动速度对隔离层性能的影响,同时详细比较了两种镀膜方法.利用扫描电镜、X射线衍射等手段对Y2O3隔离层进行了分析.结果表明:通过严格控制工艺条件,两种方法都能在移动Ni-5W合金基带上制备高立方织构、表面致密光滑的Y2O3隔离层.研究发现,电子束蒸发工艺中,理想的基带移动速度是0.4～1.0 mm·s-1;磁控溅射工艺中,适宜的基带移动速度应该是0.5～2.0mm·s-1.     

{001}LaAlO_3衬底上沉积YBa_2Cu_3O_（7-x）薄膜的HRXRD研究

采用脉冲激光沉积技术（PLD）在{001}LaAlO3（LAO）衬底上生长YBa2Cu3O7-x（YBCO）薄膜,并通过极图、摇摆曲线以及倒易空间图谱等高分辨X射线衍射技术（HRXRD）对其微结构进行表征。结果表明,YBCO薄膜的晶粒取向主要为{001}YBCO//{001}LAO,〈100〉YBCO//〈100〉LAO,但还有2%的{001}YBCO//{001}LAO,〈110〉YBCO//〈100〉LAO取向。摇摆曲线结果表明,YBCO的面外取向有一定的漫散（宽度为0.75°）;薄膜面内存在90°±0.65°〈110〉孪晶畴结构,主要是由四方到正交的相变过程中较大的局部应力以及〈100〉和〈010〉方向应力差异引起的。     

基带厚度对涂层导体立方织构Ni基带组织的影响

大变形量加工及随后再结晶热处理制备的立方织构Ni及其合金带材广泛用于YBa2Cu3O7-x(YBCO)涂层导体的基带。基带厚度的减小有利于提高涂层导体的工程电流密度。主要研究基带厚度对其立方织构、晶界角分布以及晶粒尺寸的影响。实验结果表明:随着基带厚度的减小,再结晶基带平均晶粒尺寸先减小后增大,当基带厚度为60μm时,晶粒平均尺寸达到最小值70μm;随基带厚度的减小,再结晶基带立方织构取向越接近其标准位置;晶界角分布随基带厚度变化不大,但所有样品晶界角几乎都小于15°。