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The GaAs based InGaAs metamorphic structures and their growth by molecular beam epitaxy (MBE) are investigated. The controlling of the source temperature is improved to realize the linearly graded InGaAs metamorphic structure precisely. The threading dislocations are reduced. We also optimize the growth and annealing parameters of the InGaAs quantum well (QW). The 1.3-μm GaAs based metamorphic InGaAs QW is completed. A 1.3-μm GaAs based metamorphic laser is reported.  相似文献   
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以量子线作为导电沟道的场效应弱光探测器可在低工作电压下达到很高灵敏度.文章主要对可用于此种弱光探测器的V型和脊形量子线的生长机理和制备方法进行综述,给出了量子线的PL测试结果.采用MBE外延生长法在V型槽图形衬底上生长了OaAs/AlGaAs量子线FET外延结构,扫描电子显微镜下初步判定在V型槽底部形成了截面近三角形的量子线结构.  相似文献   
3.
Molecular beam epitaxy growth of an InxGa1-xAs/GaAs quantum well(QW) structure(x equals to 0.17 or 0.3) on offcut(100) Ge substrate has been investigated.The samples were characterized by atomic force microscopy,photoluminescence(PL),and high resolution transmission electron microscopy.High temperature annealing of the Ge substrate is necessary to grow GaAs buffer layer without anti-phase domains.During the subsequent growth of the GaAs buffer layer and an InxGa1-xAs/GaAs QW structure,temperature plays a key role. The mechanism by which temperature influences the material quality is discussed.High quality InxGa1-x As/GaAs QW structure samples on Ge substrate with high PL intensity,narrow PL linewidth and flat surface morphology have been achieved by optimizing growth temperatures.Our results show promising device applications forⅢ-Ⅴcompound semiconductor materials grown on Ge substrates.  相似文献   
4.
Molecular beam epitaxy growth of a bilayer stacked InAs/GaAs quantum dot structure on a pure GaAs matrix has been systemically investigated.The influence of growth temperature and the InAs deposition of both layers on the optical properties and morphologies of the bilayer quantum dot(BQD) structures is discussed.By optimizing the growth parameters,InAs BQD emission at 1.436μm at room temperature with a narrower FWHM of 27 meV was demonstrated.The density of QDs in the second layer is around 9×109 to 1.4×1010 cm-2. The BQD structure provides a useful way to extend the emission wavelength of GaAs-based material for quantum functional devices.  相似文献   
5.
系统介绍了利用分子束外延方法在纯GaAs材料上生长InAs/GaAs耦合量子点结构。讨论了生长温度和上下两层量子点中InAs的淀积量对于材料发光性质和表面形貌的影响。通过优化生长参数,得到了室温发光波长在1.436μm,FWHM为27meV的耦合量子点材料。第二层量子点的密度在9109到1.41010cm-2之间。耦合量子点结构为拓展GaAs基材料在量子功能器件应用中的发光波长提供了新的途径。  相似文献   
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本文研究了斜切割(100)Ge衬底上InxGa1-xAs/GaAs量子阱结构的分子束外延生长(In组分为0.17或者0.3)。所生长的样品用原子力显微镜、光致发光光谱和高分辨率透射电子显微镜进行了测量和表征。结果发现,为了生长没有反相畴的GaAs缓冲层,必须对Ge衬底进行高温退火。在GaAs外延层和InxGa1-xAs/GaAs量子阱结构的生长过程中,生长温度是一个至关重要的参数。文中讨论了温度对于外延材料质量的影响机理。通过优化生长温度,Ge衬底上的InxGa1-xAs/GaAs量子阱结构的光致发光谱具有很高的强度、很窄的线宽,样品的表面光滑平整。这些研究表面Ge 衬底上的III-V族化合物半导体材料有很大的器件应用前景。  相似文献   
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