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针对凤凰山矿对北矸井绞车进行的变频改造,分析变频器调速的优点与产生干扰后的抑制措施。本次改造利用PLC与变频器配合,通过改变输出电源频率,控制电动机的效果,达到了节能、调速的目的。  相似文献   
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A new photolithography technique for 248 nm based on the interference of surface plasmon waves is proposed and demonstrated by using computer simulations.The basic structure consists of surface plasmon polariton(SPP)interference mask and multi-layer film superlens.Using the amplification effect of superlens on evanescent wave,the near field SPP interference pattern is imaged to the far field,and then is exposed on photo resist(PR).The simulation results based on finite difference time domain(FDTD)method show that the full width at half maximum(FWHM)of the interference pattern is about 19 nm when the p-polarization light from 248 nm source is vertically incident to the structure.Meanwhile,the focal depth is 150 nm for negative PR and 60 nm for positive PR,which is much greater than that in usual SPP photolithography.  相似文献   
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