苯并三氮唑及其衍生物对铜的协同缓蚀效应

以苯并三氮唑(BTA)和溴代正丁烷为原料,采用一步法合成了N-丁基苯并三氮唑(N-BBTA),研究了BTA、N-BBTA以及N-BBTA与BTA的复配体系对铜在3％(质量分数)NaC1溶液中的缓蚀行为.结果表明,单一N-BBTA和BTA对铜均具有一定的缓蚀能力.当N-BBTA、BTA浓度为10 mmol/L时,缓蚀率分...     

镁合金交流电氧化工艺研究

在氢氧化钠、硼酸盐、硅酸盐及有机胺的混合溶液中,用普通交流电对AZ91D镁合金进行电解氧化。研究了溶液组成、氧化电压、温度和时间等对镁合金电解氧化的影响。最佳工艺条件为:30g/LNaOH,25g/LNa2B4O7,50g/LNa2SiO3,40mL/L三乙醇胺,交流电压130～160V,时间10min。在最佳工艺条件下,镁合金表面形成了一层致密光滑的类陶瓷膜层,该膜层具有良好的耐蚀性能。     

Preparation of anodic films on 2024 aluminum alloy in boric acid-containing mixed electrolyte

The anodizing oxidation process on 2024 aluminum alloy was researched in the mixed electrolyte with the composition of 30 g/L boric acid, 2 g/L sulfosalicylic acid and 8 g/L phosphate. The results reveal that the pre-treatment and the composition of the mixed electrolyte have influence on the properties of the films and the anodizing oxidation process. Under the condition of controlled potential, the anodizing oxidation current-time response curve displays “saddle” shape. First, the current density reaches a peak value of 8-20 A/dm^2 and then decreases rapidly, finally maintains at 1-2 A/dm^2. The film prepared in the mixed electrolyte is of porous-type with 20 nm in pore size and 500 μm^-2 in porosity. Compared with the conventional anodic film obtained in sulfuric acid, the pore wall of the porous layer prepared in this work is not continuous, which seems to be deposited by small spherical grains. This porous structure of the anodic film may result from the characteristics of the mixed electrolyte and the special anodizing oxidation process. The surface analysis displays that the anodic film is amorphous and composed of O, Al, C, P, S, Si and no copper element is detected.     

环氧板二氧化铅电极的制备及其性能测试

报道了以环氧塑料为基体制备二氧化铅电极的工艺,测定了电极的极化曲线、电位－时间曲线及其耐腐蚀性能,结果表明,该电极具有稳定性好、寿命长、耐腐蚀性强等优点。     

定向/有序碳纳米管制备的研究进展

综述了国内外有序、定向碳纳米管制备的研究进展。着重介绍了模板法和等离子体增强化学气相沉积技术在碳纳米管制备方面的应用，并就制备原理、影响因素等作了简单介绍。     

铸铝合金在有机羧酸体系中电化学陶瓷成膜

利用电化学沉积陶瓷膜（EDCF）技术将铸铝ZL108合金置于有机羧酸复合体系，制得了具有较高硬度和良好外观的灰色类陶瓷膜。详细研究了各工艺参数对膜层性能的影响，结果表明，有机羧酸是主要成膜物质；金属硫酸盐是阳极反应的活化剂，但浓度过高会加快膜层溶解；方波脉冲电源有利于生成厚膜；峰值电流密度越大，成膜时间越短，但过大会使膜层减薄；溶液pH值、搅拌等对成膜过程有一定影响。     

ZL系列铸铝合金的微弧氧化

对含硅量为 8 %～ 12 %的ZL系列铸铝合金的微弧氧化工艺条件、膜层结构以及成膜过程进行了研究。结果表明 :采用不对称交变电压和在以硅酸钠为主要成分的复合电解液体系中 ,铸铝合金表面可获得一层性能优异的微弧氧化膜层。电子能谱 (EDS)和X射线衍射 (XRD)分析结果表明微弧氧化膜主要由Al,Si和O元素组成 ,膜的相结构主要为 η Al2 O3 ,α Al2 O3 和SiO2 ,并含有γ Al2 O3 和Mg ,W ,Cu等元素的氧化物。扫描电镜 (SEM)分析表明微弧氧化膜由致密层 (内层 )和疏松层 (外层 )构成 ,疏松层表面存在许多气孔 ,而致密层完整光滑 ,具有较高的显微硬度和优异的耐磨耐蚀性能     

化学镀镍磷合金工艺中问题与探讨

从化学镀镍磷合金生产工艺、镀层性能的各种影响因素、镀液中离子浓度的测定方法等三个方面论述了化学镀镍磷合金工艺中的主要问题和研究方向.     

Adsorption behavior of cross-linked chitosan modified by graphene oxide for Cu（Ⅱ） removal

Cross-linked chitosan（CS）,cross-linked chitosan/graphene（CS/RGO10） and cross-linked chitosan/graphene oxide（CS/GO10） were prepared as adsorbents for Cu（Ⅱ）.The effects of pH,contact time,adsorbent dosage and initial concentration of Cu（Ⅱ） on the adsorbing abilities of CS,CS/RGO10 and CS/GO10 to Cu（Ⅱ） were investigated.The results demonstrate that the adsorption capacities of CS/GO10 and CS/RGO10 are greater than that of CS,especially at pH 5.0 and the adsorption capacities are 202.5,150 and 137.5 mg/g,respectively.Their behaviors obey the Freundlich isotherm model very well.Additionally,CS/GO10 has the shortest time to achieve adsorption equilibrium among them and can be used as a perspective adsorbent for Cu（Ⅱ）.