Impact of cooling condition on the crystal structure and surface quality of preferred c-axis-oriented AlN films for SAW devices

AlN films with preferred c-axis orientation are deposited on Si substrates using the radio frequency(RF) magnetron sputtering method.The post-processing is carried out under the cooling conditions including high vacuum,low vacuum under deposition gas ambient and low vacuum under dynamic N2 ambient.Structures and morphologies of the films are analyzed by X-ray diffraction(XRD) and atomic force microscopy(AFM).The hardness and Young’s modulus are investigated by the nanoindenter.The experimental results indicate that the(100) and(110) peak intensities decrease in the XRD spectra and the root-mean-square of roughness(Rrms) of the film decreases gradually with the increase of the cooling rate.The maximum values of the hardness and Young modulus are obtained by cooling in low vacuum under deposition gas ambient.The reason for orientation variation of the films is explained from the perspective of the Al-N bond formation.     

具有L型栅极场板的双槽双栅绝缘体上硅器件新结构

为了降低绝缘体上硅（SOI）功率器件的比导通电阻,同时提高击穿电压,利用场板（FP）技术,提出了一种具有L型栅极场板的双槽双栅SOI器件新结构.在双槽结构的基础上,在氧化槽中形成第二栅极,并延伸形成L型栅极场板.漂移区引入的氧化槽折叠了漂移区长度,提高了击穿电压;对称的双栅结构形成双导电沟道,加宽了电流纵向传输面积,使比导通电阻显著降低;L型场板对漂移区电场进行重塑,使漂移区浓度大幅度增加,比导通电阻进一步降低.仿真结果表明：在保证最高优值条件下,相比传统SOI结构,器件尺寸相同时,新结构的击穿电压提高了123%,比导通电阻降低了32%;击穿电压相同时,新结构的比导通电阻降低了87.5%;相比双槽SOI结构,器件尺寸相同时,新结构不仅保持了双槽结构的高压特性,而且比导通电阻降低了46%.     

氮气流量对金刚石膜生长的影响研究

采用电子辅助化学气相沉积法(EA-CVD)制备掺氮金刚石薄膜,研究了不同氮气流量对金刚石膜的生长速率、表面形貌和膜品质的影响.实验发现,在较低的氮气流量下,金刚石膜的生长速率增加,在较高的氮气流量下生长速率减小.利用SEM、Raman光谱、XPS等测试手段对样品的表面形貌及品质进行了表征.结果表明,当氮气流量为4sccm时金刚石膜的结晶比较完整;当氮气流量为8sccm时生成与(100)面共存的"菜花状".氮气流量的进一步增加,"菜花"表面(100)晶面显露的数量明显降低,非金刚石碳含量和氮杂质含量增加,金刚石膜的品质明显下降.     

金刚石膜的氮掺杂行为

采用电子辅助化学气相沉积法(EA-CVD)制备了氮掺杂金刚石膜,用SEM、Raman光谱、XPS、EPR等测试手段研究了金刚石薄膜的品质和膜中的氮杂质状态。结果表明,随着氮气流量的增加,金刚石膜的形貌从完整的晶面逐渐变为与(100)面共存的“菜花状”,且非晶碳的含量增加,品质下降。金刚石膜中氮以Ns0、[N—V]0和[N—V]-1的形式存在,在较低氮气流量下[N—V]0和[N—V]-1的含量较多,Ns0氮杂质的质量分数在1.50×10-5～4.83×10-4之间变化。     

LLDPE/Al_2O_3纳米复合材料的形态、结构及力学性能

在超声作用下利用异丙基十二烷基磺酰钛酸酯改性Al2O3纳米粒子,然后把改性纳米Al2O3粒子及LLDPE颗粒引入密炼机中,以熔融共混方法制备LLDPE/纳米Al2O3复合材料.采用FESEM对复合材料中纳米粒子的分散形态进行表征,结果表明,当纳米Al2O3粒子含量为3%时,绝大多数的纳米粒子以<100nm的尺寸均匀分散在基体中;采用FTIR对纳米复合材料的结构进行表征,结果表明,纳米Al2O3与LLDPE之间形成了化学键合结构;力学分析表明,纳米复合材料的拉伸强度及断裂伸长率均有所增加;采用SEM观察拉伸断裂面的形貌,结果表明,适量的纳米Al2O3粒子可以增强、增韧聚合物基体,而基体和纳米粒子的相容性差时,会逐渐引入缺陷.     

Ni/MgO催化剂下碳纳米管的生长特性

采用射频等离子体增强化学气相沉积法(RF-PECVD),以Ni/MgO为催化剂,在Si基片上生长了碳纳米管,采用X射线衍射(XRD)、扫描电镜(SEM)、Raman光谱以及高分辨透射电镜(HRTEM)等对不同的MgO含量下制备的碳纳米管形貌及结构进行了表征。结果表明,随着MgO含量的增加,从碳纳米洋葱转化为碳纳米管,其直径逐渐变小、均匀,碳纳米管纯度提高,结晶性能越好;碳纳米管顶端形成开口或闭口的碳洋葱纳米结构,而管的主干区域则存在催化剂,并且随着MgO含量的增加,呈现纳米颗粒转化为纳米线的趋势;MgO含量为50%时,部分碳纳米管的外壁剥离,形成了单原子石墨层,长度达到7nm,并在碳纳米管内部填充了Ni纳米线,其长度有60nm。     

Characterization of sputtered ZnO films under different sputter-etching time of substrate

Polycrystalline ZnO films are prepared using radio frequency magnetron sputtering on glass substrates which are sputteretched for different time. Both the size of ZnO grains and the root-mean-square (RMS) roughness decrease, as the sputteretching time of the substrate increases. More Zn atoms are bound to O atoms in the films, and the defect concentration is decreased with increasing sputter-etching time of substrate. Meanwhile, the crystallinity and c-axis orientation are improved at longer sputter-etching time of the substrate. The Raman peaks at 99 cm⁻¹, 438 cm⁻¹ and 589 cm⁻¹ are identified as E₂(low), E₂(high) and E₁(LO) modes, respectively, and the position of E₁(LO) peak blue shifts at longer sputter-etching time. The transmittances of the films, which are deposited on the substrate and etched for 10 min and 20 min, are higher in the visible region than that of the films deposited under longer sputter-etching time of 30 min. The bandgap increases from 3.23 eV to 3.27 eV with the increase of the sputter-etching time of substrate.     

氮掺杂金刚石膜的生长特性

采用电子辅助化学气相沉积法(EA-CVD),在含氮气氛中制备出金刚石膜,利用SEM、Raman光谱、EPR测试手段研究了氮气对金刚石膜品质的影响及氮掺杂特性.结果表明,在950℃基片温度下,沉积气氛中掺入氮气后,金刚石膜晶形变为"菜花状", 非金刚石碳的含量增加,膜的品质下降.在800℃基片温度下,沉积气氛中掺入氮气后,孪晶和二次成核减少,金刚石膜的结晶形貌得到改善.通过Raman光谱和EPR分析发现,在金刚石膜中氮杂质主要以Ns0,[N-V]0和[N-v]-1的形式存在,而且随着氮气流量的增加,Ns0的含量增加,[N-V]0含量减少,[N-V]-1含量变化不明显.     

氮掺杂金刚石膜的生长特性

采用电子辅助化学气相沉积法(EA-CVD),在含氮气氛中制备出金刚石膜,利用SEM、Raman光谱、EPR测试手段研究了氮气对金刚石膜品质的影响及氮掺杂特性.结果表明,在950℃基片温度下,沉积气氛中掺入氮气后,金刚石膜晶形变为"菜花状", 非金刚石碳的含量增加,膜的品质下降.在800℃基片温度下,沉积气氛中掺入氮气后,孪晶和二次成核减少,金刚石膜的结晶形貌得到改善.通过Raman光谱和EPR分析发现,在金刚石膜中氮杂质主要以Ns0,[N-V]0和[N-v]-1的形式存在,而且随着氮气流量的增加,Ns0的含量增加,[N-V]0含量减少,[N-V]-1含量变化不明显.