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为明确溅射偏压对ITO薄膜性质的影响,用射频磁控溅射法于室温在玻璃衬底制备出ITO透明导电薄膜,研究了不同偏压下ITO薄膜的生长模式、光学和电学性能.结果表明:随着偏压的增加,薄膜沉积模式经历了沉积、沉积和扩散、表面脱附3种方式;AFM和SEM显示,偏压为100 V时,膜层表面光洁、均匀,粗糙度最小,均方根粗糙度为1.61 nm;XRD分析表明偏压会影响与薄膜的择优取向,偏压为100 V时,薄膜晶粒取向为(222)面;薄膜偏压为120 V时,薄膜的光电性能最佳,电阻率最低为2.59×10-4Ω.cm,可见光区的平均透过率在85%以上;偏压的大小使薄膜的吸收边发生了"蓝移"或"红移".  相似文献   
2.
The Cu2ZnSnS4 (CZTS) powders are successfully synthesized by using ZnS and Cu2SnS3 as raw materials directly without any intermediate phase at 450 °C for 3 h in Ar atmosphere. The crystalline structure, morphology and optical properties of the CZTS powders are characterized by X-ray diffraction (XRD), Raman spectrum, field emission scanning electron microscopy (FESEM) and ultraviolet-visible (UV-vis) spectrophotometer, respectively. The results show that the band gap of the obtained CZTS is 1.53 eV. The CZTS film is fabricated by spin coating a mixture of CZTS powders and novolac resin with a weight percentage of 30%. The photoelectrical properties of such CZTS films are measured, and the results show an incident light density of 100 mW.cm-2 with the bias voltage of 0.40 V, and the photocurrent density can approach 9.80×10-5 A.cm2within 50 s, giving an on/off switching ratio of 1.64.  相似文献   
3.
采用磁控溅射法以铌(Nb)掺杂氧化铟锡(ITO)为靶材制备了厚度为300nm的ITO:Nb薄膜,研究了不同基底温度下,薄膜的结构、导电性和可见光区的透过率。XRD分析表明所制备的ITO:Nb薄膜均为In2O3相;AFM显示ITO:Nb薄膜的均方根粗糙度随着温度的升高逐渐变大;薄膜的电阻率随着温度的升高逐渐减小,在300℃时得到最小值1.2×10-4·cm。电阻率下降主要是因为霍耳迁移率增大和载流子浓度逐渐增加。ITO:Nb薄膜在可见光内的平均透过率均大于87%,且随着温度的升高,吸收边发生"红移",禁带宽度逐渐增加。  相似文献   
4.
Niobium-doped indium tin oxide(ITO:Nb)thin films are fabricated on glass substrates by radio frequency(RF)magnetron sputtering at different temperatures.Structural,electrical and optical properties of the films are investigated using X-ray diffraction(XRD),atomic force microscopy(AFM),ultraviolet-visible(UV-VIS)spectroscopy and electrical measurements.XRD patterns show that the preferential orientation of polycrystalline structure changes from(400)to(222)crystal plane,and the crystallite size increases with the increase of substrate temperature.AFM analyses reveal that the film is very smooth at low temperature.The root mean square(RMS)roughness and the average roughness are 2.16 nm and 1.64 nm,respectively.The obtained lowest resistivity of the films is 1.2×10-4?.cm,and the resistivity decreases with the increase of substrate temperature.The highest Hall mobility and carrier concentration are 16.5 cm2/V.s and 1.88×1021 cm-3,respectively.Band gap energy of the films depends on substrate temperature,which is varied from 3.49 eV to 3.63 eV.  相似文献   
5.
Niobium-doped indium tin oxide (ITO:Nb) thin films are prepared on glass substrates with various film thicknesses by radio frequency (RF) magnetron sputtering from one piece of ceramic target material. The effects of thickness (60-360 nm) on the structural, electrical and optical properties of ITO: Nb films are investigated by means of X-ray diffraction (XRD), ultraviolet (UV)-visible spectroscopy, and electrical measurements. XRD patterns show the highly oriented (400) direction. The lowest resistivity of the films without any heat treatment is 3.1×10-4 Ω·cm-1, and the resistivity decreases with the increase of substrate temperature. The highest Hall mobility and carrier concentration are 17.6 N·S and 1.36×1021 cm-3, respectively. Band gap energy of the films depends on substrate temperature, which varies from 3.48 eV to 3.62 eV.  相似文献   
6.
利用Ti掺杂ITO靶材,采用单靶磁控溅射法在玻璃基底上制备厚度为50~300 nm的ITO:Ti薄膜。借助X射线衍射(XRD)、原子力显微镜(AFM)、可见光分光光度计、霍尔测试系统和四探针电阻测量仪,研究薄膜厚度对薄膜的晶体结构、表面形貌和光电性能的影响。结果表明:ITO:Ti薄膜呈现(400)择优取向,随薄膜厚度增加,薄膜的结晶程度增强,晶粒度增大,薄膜更致密。随薄膜厚度增加,薄膜的均方根粗糙度和平均粗糙度以及电阻率都先减小再增加,薄膜厚度为250 nm时,表面粗糙度最小,蒋膜厚度为200 nm时,电阻率最低,为2.1×10-3?·cm。不同厚度的薄膜对可见光区的平均透过率都在89%以上。  相似文献   
7.
Cu2NiSnS4 nanoparticles were prepared for the first time using a facile solid-phase process at a temperature of 180 °C. The crystalline structure, morphology and optical properties of the Cu2NiSnS4 nanoparticles were characterized by means of X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), transmission electron microscope (TEM) and ultraviolet-visible (UV-vis) spectrophotometer. The band gap and conversion efficiency of Cu2NiSnS4 nanoparticles were studied at various temperature. The results showed that the Cu2NiSnS4 nanoparticles exhibited an optimum band gap of 1.58 eV and a conversion efficiency of 0.64% at 180 °C, indicating that it maybe be useful in low-cost thin film solar cells.  相似文献   
8.
Quaternary chalcogenide Cu2FeSnS4 (CFTS) nanoparticles, as a kind of potential absorber layer material in thin film solar cells (TFSCs), were successfully synthesized by using a convenient solvothermal method. Alkali element K is incorporated into CFTS thin films in order to further improve the surface morphology and the optical properties of related films. X-ray diffraction (XRD), Raman spectroscopy and field emission scanning electron microscopy (FESEM) were used to characterize the phase purity, morphology and composition of CFTS particles and thin films. The results show that the particle elemental ratios of Cu/(Fe+Sn) and Fe/Sn are 1.2 and 0.9, respectively, which are close to the characteristics of stoichiometric CFTS. The band gaps of CFTS films before and after doping K ions are estimated to be 1.44 eV and 1.4 eV with an error of ±0.02 eV. This work has been supported by National Natural Science Foundation of China (No. 51674026), and the Fundamental Research Funds for the Central Universities in 2015 (No.FRF-BD-15-004A). E-mail:chywang@yeah.net   相似文献   
9.
Chalcopyrite-type CulnSe2 nanoparticles are successfully prepared by using In2Se3 nanoparticles as a precursor reacted with copper chloride (CuCl) solution via a phase transformation process in low temperature. The reaction time is a key parameter. After the reaction time increasing from 0.5 h to 8 h, In2Se3 and CuCl react with each other gradually via phase transformation into CuInSe2 without any intermediate phase. The crystalline structure and morphology of the CuInSe2 nanoparticles are characterized by X-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM). The diameter of CuInSe2 nanoparticles with good dispersibility ranges from 10 nm to 20 nm. The band gap of the CulnSe2 nanoparticles is 1.04 eV calculated from the ultraviolet-visible (UV-VIS) spectrum.  相似文献   
10.
Amorphous indium-gallium-zinc oxide (IGZO) transparent conductive thin films are prepared on glass substrates by radio frequency (RF) magnetron sputtering. The effects of seven factors, which are substrate temperature, sputtering atmosphere, working pressure, sputtering power, annealing temperature, negative bias voltage and sputtering time, on Hall mobility, transmittance and surface roughness are studied through orthogonal experiments. The results show that the effects of working pressure, substrate temperature and sputtering atmosphere on performance of films are the most prominent. According to the experimental results and discussion, relatively reasonable process parameters are obtained, which are working pressure of 0.35 Pa, substrate temperature of 200 ℃, sputtering atmosphere of Ar, sputtering power of 125 W, sputtering time of 30 min, negative bias voltage of 0 V and annealing temperature of 300 ℃.  相似文献   
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