Graphite Oxide and Aromatic Amines: Size Matters

Experimental and theoretical studies are performed in order to illuminate, for first time, the intercalation mechanism of polycyclic aromatic molecules into graphite oxide. Two representative molecules of this family, aniline and naphthalene amine are investigated. After intercalation, aniline molecules prefer to covalently connect to the graphene oxide matrix via chemical grafting, while napthalene amine molecules bind with the graphene oxide surface through π–π interactions. The presence of intercalated aromatic molecules between the graphene oxide layers is demonstrated by X‐ray diffraction, while the type of interaction between graphene oxide and polycyclic organic molecules is elucidated by X‐ray photoelectron spectroscopy. Combined quantum mechanical and molecular mechanical calculations describe the intercalation mechanism and the aniline grafting, rationalizing the experimental data. The present work opens new perspectives for the interaction of various aromatic molecules with graphite oxide and the so‐called “intercalation chemistry”.     

Raman and X-ray photoelectron spectroscopy study on the influence of La2O3 on the melt structure of SiO2–CaO–Al2O3–MgO

In order to gain more insights into the influence of rare earth elements on the melt structure of SiO₂–CaO–Al₂O₃–MgO glass ceramics, Raman and X-ray photoelectron spectroscopy techniques were used to study the influence of La₂O₃ on the Si–O/Al–O tetrahedron structure within SiO₂–CaO–Al₂O₃–MgO–quenched glass samples in this study. Results showed that some Raman peak shapes at low frequencies (200–840 cm^?1) changed significantly after the addition of La₂O₃, compared to the high frequency (840–1200 cm^?1) region that corresponds to the [SiO₄] structure, suggesting that the depolymerization of the low-frequency T–O–T (T=Si or Al) structure was more prevalent with La³⁺ addition. Besides, the depolymerization extent of the Si–O/Al–O tetrahedral network varied when the melt composition altered. Most notably, depolymerization is the most significant at a low CaO/SiO₂ ratio (0.25) and a high Al₂O₃ content (8%). Meanwhile, La³⁺ can promote the transformation of Si–O–Si and Al–O–Al bonds to the Si–O–Al ones, thereby forming a complex ionic cluster network interwoven with Si–O and Al–O tetrahedrons.     

Impact of adhesive ingredients on adhesion between rubber and brass-plated steel wire in tire

Proficiency on underlying mechanism of rubber-metal adhesion has been increased significantly in the last few decades. Researchers have investigated the effect of various ingredients, such as hexamethoxymethyl melamine, resorcinol, cobalt stearate, and silica, on rubber-metal interface. The role of each ingredient on rubber-metal interfacial adhesion is still a subject of scrutiny. In this article, a typical belt skim compound of truck radial tire is selected and the effect of each adhesive ingredient on adhesion strength is explored. Out of these ingredients, the effect of cobalt stearate is found noteworthy. It has improved adhesion strength by 12% (without aging) and by 11% (humid-aged), respectively, over control compound. For detailed understanding of the effect of cobalt stearate on adhesion, scanning electron microscopy and energy dispersive spectroscopy are utilized to ascertain the rubber coverage and distribution of elements. X-ray photoelectron spectroscopy results helped us to understand the impact of Cu_XS layer depth on rubber-metal adhesion. The depth profile of the Cu_XS layer was found to be one of the dominant factors of rubber-metal adhesion retention. Thus, this study has made an attempt to find the impact of different adhesive ingredients on the formation of Cu_XS layer depth at rubber-metal interface and establish a correlation with adhesion strength simultaneously.     

氮化钛薄膜的高分辨AES谱和XPS谱研究

着重讨论了TiNx薄膜俄歇电子谱的定量分析方法和X射线光电子谱中线形的变化。利用已知组元强度定量分析技术和Ti的LMV俄歇电子峰，探讨TiNx薄膜中N含量的定量方法。由该方法给出的定量结果与X射线光电子谱定量结果相一致。同时，利用X射线光电子谱测定了TiN和Ti2N2p轨道的结合能。并针对Ti2p峰形随N含量的变化，给出新的解释。     

Growth of Fe on Si (100) at room temperature and formation of iron silicide

Low-energy electron diffraction (LEED), Auger electron spectroscopy and X-ray photoelectron spectroscopy (XPS) investigations of both the growth of an iron film on silicon (100) at room temperature and the subsequent formation of iron silicide are the subjects of this paper. An in-situ cleaned silicon (100) wafer without carbon or oxygen contamination exhibiting the known 2 × 1 reconstruction in the LEED pattern served as the substrate. Iron was deposited on this reconstructed surface at 300 K. The comparison of theoretical calculations based on three growth mechanisms with XPS data obtained with take-off angles of 0° and 50° clearly demonstrates a layer-by-layer growth of the iron film on silicon (100). At 300 K no formation of iron silicide was observed, although an interaction between iron and silicon could be detected at the interface. The formation of iron silicide was observed at annealing temperatures of 630–730 K. Quantitative XPS analysis yields the presence of FeSi₂, when the thickness is large enough. Neither the iron film on silicon nor the silicide shows any LEED pattern.     

Corrosion behavior of NiCrMo Alloy 625 in high temperature, hydrogenated water

The corrosion behavior of NiCrMo Alloy 625 (UNS N06625) has been characterized in a 10,000 h test conducted in hydrogenated water at 260 °C. The corrosion kinetics were observed to be parabolic, the parabolic rate constant being determined by chemical descaling to be 0.074 mg dm⁻² h^−1/2. Characterizations of the corrosion oxide layer via grazing incidence X-ray diffraction and X-ray photoelectron spectroscopy in combination with argon ion milling and target factor analysis, revealed the presence of two spinel oxide phases and significant amounts of recrystallized nickel. Based on the distribution of three oxidized alloying constituents (Ni, Cr, Fe) with respect to depth and oxidation state, it was concluded that: (a) corrosion occurs in a non-selective manner, but significant amounts of nickel(II) ions are released to the water, and (b) the spinel oxides exist as a chromite-rich inner layer (Ni_0.7Fe_0.3)(Cr_0.8Fe_0.2)₂O₄ underneath a coarser, ferrite-rich outer layer (Ni_0.9Fe_0.1)(Cr_0.1Fe_0.9)₂O₄. The trivalent cation distribution in each of these phases appears to represent a solvus in the immiscible NiCr₂O₄-NiFe₂O₄ binary.     

Application of Rachinger''s method to separate overlapped doublets in the X-ray photoelectron spectrum

Rachinger's method of separating ₁ and ₂ doublets in X-ray emission spectra is applied for the first time to separate the superimposed doublets due to spin-orbit coupling. This method has been applied to separate closely lying doublets such as (Ag 4p_3/2and Ag 4p_1/2, (Ni 3p_3/2and Ni 3p_1/2) and (Cu 3p_3/2and Cu 3p_1/2). The intensities ratios of the separated peaks are measured and compared with the ratios obtained from a first-order calculation. An excellent agreement between the measured and calculated ratios are obtained. Residual background intensities compared with the estimated values are found to agree within certain uncertainties.     

含氟聚酰亚胺的辐射交联及其交联度的XPS表征

含氟聚酰亚胺(FPI)是一种耐高温、耐水解的新型聚酰亚胺。到目前为止,尚未见文献报道它的辐射交联。本文发现它能在高温辐射下交联,交联后的含氟聚酰亚胺的玻璃化转变温度以及高温力学性能有明显提高。本文还首次用XPS方法做了它的交联度表征。用XPS方法求得FPI的凝胶化剂量为50Mrad。     

用变角XPS定量分析研究GaAs光电阴极激活工艺

用变角X射线光电子能谱 (XPS)技术分析了GaAs光电阴极的激活工艺 ,定量计算了阴极表面激活层和界面氧化层的厚度和组成。界面氧化物是由于O原子穿过激活层 ,扩散到GaAs与 (Cs,O)激活层的界面上而形成的。导入过量O会增加O GaAs界面层的厚度 ,而对 (Cs,O)激活层厚度影响较小。在激活过程中 ,严格控制和减少每次导入的O量是减少界面氧化层厚度 ,提高灵敏度的重要途径。在第一步激活后的阴极样品 ,通过较低温度的加热和再激活 ,能获得比第一步高出 30 %的光电灵敏度的原因是较低温度加热减少了界面氧化层的厚度和界面势垒