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1.
In this work, ZnO nanostructures are electrodeposited on a transparent conducting glass from chloride baths. The influence of H2O2 concentration on the electrochemical characteristics has been studied using cyclic voltammetry (CV) and chronoamperometry (CA) techniques. From the analysis of the current transients on the basis of the Scharifker–Hills model, it is found that nucleation mechanism is progressive with a typical three-dimensional (3D) nucleation and growth process; independently with the concentration of H2O2. However, the nucleation rate of the ZnO changes with the increase of H2O2 concentration. The Mott–Schottky measurements demonstrate an n-type semiconductor character for all samples with a carrier density varying between 5.14×1018 cm−3 and 1.47×1018 cm−3. Scanning electron microscopy (SEM) observations show arrays of vertically aligned ZnO nanorods (NRs) with good homogeneity. The X-ray diffraction (XRD) patterns show that the ZnO deposited crystallises according to a hexagonal Würtzite-type structure and with the c-axis perpendicular to the electrode surface. The directional growth along (002) crystallographic plane is very important for deposits obtained at 5 and 7 mM of H2O2. The high optical properties of the ZnO NRs with a low density of deep defects was checked by UV–vis transmittance analyses, the band gap energy of films varies between 3.23 and 3.31 eV with transparency around 80–90%.  相似文献   
2.
The size-controlled preparation of Mo powders is always a challenge and important task in the molybdenum metallurgy. In the current study, Mo powders with controllable sizes are synthesized by hydrogen reduction of MoO2 powders with the assistance of Mo nuclei in the range of 900–1100 °C. The influences of the particle sizes of Mo nuclei, the additive amount as well as reaction temperature on the morphology and particle sizes of the final products are studied. For the hydrogen reduction of MoO2 without any additive, the obtained Mo powders always have large particle sizes. However, the addition of small amounts of nuclei in MoO2 can help Mo nucleate dispersedly, and the growth of Mo could be also controlled by adjusting the sizes of added nuclei, amount of addition and the reaction temperature. With the addition of Mo nuclei, the different sizes of Mo powders with the good dispersity can be prepared. As adding commercial Mo powders with the particle size of about 2.03 μm, the micron-sized Mo powders ranged from 2.11 μm to 3.25 μm could be prepared. While for the case of adding ultrafine Mo nuclei of about 170 nm, Mo powders from 0.28 μm to 0.88 μm can be obtained. Moreover, the more the amounts of nuclei added and the lower the reaction temperature (in the range of 900–1100 °C) is, the smaller the particle size of the prepared Mo powder will be. The current method is a facile and feasible method, and is potential to be used for industrial production of Mo powder with controllable particle sizes.  相似文献   
3.
Nucleation Mechanism for Bainite   总被引:4,自引:0,他引:4  
Based on the experimental results that solute-depleted zone was observed in Cu-28Zn-4AI (mass fraction) at 523 K, AG is calculated as a positive according to the thermodynamic criteria for the spinodal decomposition of a ternary systems. So, the solute-depleted zone cannot be formed by spinodal decomposition. Dislocation density required by the formation of solute-depleted zone is estimated greater than 7.89×109 cm-2, according to the segregation of solute atoms around dislocations, which is not consistent with the practical situation for the alloy at 523 K. Associated with the internal friction experimental fact that internal friction peaks appear within the incubation for bainitic transformation in Cu-Zn-AI alloy, the equilibrium temperature, TO, is evaluated as 433 K for solute-depleted Cu-25Zn-3.4AI, which is lower than the experimental temperature 523 K. Thus, nucleation by shear mechanism is impossible in this circumstance. Therefore, it is concluded that, like bainite in steels and Ag-Cd, bainite in  相似文献   
4.
Epitaxial lamellar gallium selenide (GaSe) semiconductors have been grown on trench-patterned silicon (Si) substrates by molecular beam epitaxy. An intriguing star-like patterned morphology was identified by atomic force microscopy on these epilayers. This non-trivial feature can be correlated with the accumulation of stacking faults of two concurrent epitaxial domains around self-oriented triangular pits developed earlier on the Si(111) surface by the chemical etching. Crystallographic considerations show how the stars can be formed.  相似文献   
5.
Phenylbutazone was recrystallized from its solutions by using a supercritical fluid antisolvent process. It was dissolved in acetone and supercritical carbon dioxide was injected into the solution, thereby inducing supersaturation and particle formation. Variation in the physical properties of the recrystallized phenylbutazone was investigated as a function of the crystallizing temperature and the carbon dioxide injection rate. The recrystallized particles showed cleaner surfaces and more ordered morphology compared to the particles obtained by other methods such as solvent evaporation. X-ray diffraction patterns indicated that the crystallinity of the particles had been modified upon the recrystallization. Differential scanning calorimetry measurement revealed that the crystallizing temperature influenced the thermal stability of the resulting crystals. Larger crystals were produced when the carbon dioxide injection rate was reduced.  相似文献   
6.
The formation of Ti silicides has been examined in flash memories with 0.25 μm linewidth by X-ray diffraction, scanning electron microscopy, and transmission electron microscopy. It has been observed that, after the first rapid thermal process and the selective metal etch, there is no silicide on the source and on a majority of drain contacts while C49-TiSi2 is found on the gate. A pre-amorphisation implant increases drastically the formation of C49-TiSi2 in the drain zone while modifications of annealing conditions have little impact. These results indicate that the formation of C49-TiSi2 is most likely controlled by nucleation and that this nucleation is sensitive to both the width and the length of the reaction zone. The formation of a Ti rich silicide may play an important role in this nucleation by decreasing the driving force for the formation of C49-TiSi2. Curiously enough, the formation of C49-TiSi2 appears thus as a major concern for the salicide process in flash memories.  相似文献   
7.
The influence of temperature on the kinetics and the morphology of silver deposits obtained from an air and water-stable ionic liquid (the 1-butyl-3-methyl imidazolium tetrafluoroborate) was studied by means of cyclic voltammetry and chronoamperometry. The nucleation and growth mechanisms have been investigated and the effect of temperature evaluated up to 200 °C. Dense, pure and very thin (about 0.3 μm) silver coatings, with decorative properties, have been obtained on commercial copper electrodes at different temperatures. The characterization of the deposits morphology has been performed by visual investigation and SEM microscopy. Data about thickness were acquired by Calotest® measurements. The deposits result constituted by pure silver as determined by combination of EDX microanalysis and Auger Electron Spectroscopy (AES). The deposition method promises to be a new, environmentally friendly, method for silver electrodeposition which is the reason for the absence of cyanide and volatile toxic solvents in the electroplating bath.  相似文献   
8.
Nucleation kinetics during the growth of InxGa1−xN on a GaN substrate have been studied. The behavior of nonequilibrium between the InxGa1−xN and the GaN substrate has been analyzed, and hence, the expression derived for the stress-induced supercooling/superheating has been numerically evaluated. The maximum amount of stress-induced supercooling is found to be 1.017 K at x=0.12. These values are incorporated in the classical heterogeneous nucleation theory. Using the regular solution model, the interfacial tension between the nucleus and substrate and, hence, the interfacial tension between nucleus and mother phase and thermodynamical potential of the compounds have been calculated. The amount of driving force available for the nucleation has been determined for different compositions and degrees of supercooling. It has been shown that the value of the interaction parameter of InN-GaN plays a dominant role in nucleation and growth kinetics of InxGa1−xN on a GaN substrate. These values have been used to evaluate the nucleation parameters. It is shown that the nucleation barrier for the formation of a InxGa1−xN nucleus on a GaN substrate is minimum in the range of x=0.12 to x=0.17, and it has been qualitatively proved that good quality InxGa1−xN on GaN can be grown only in the range 0<x≤0.2.  相似文献   
9.
Analytic and numerical calculations are performed on the production of sulphuric acid aerosol in conditions of a very large nucleation event observed in the upper troposphere. The numerical results feature a growing peak in the size distribution whose magnitude is reproduced well analytically, and are consistent with the observed particle number concentration at sizes greater than 25 nm (measured dry diameter), but suggest that most of the aerosol was at unobserved smaller sizes. Because of growth and coagulation, number concentrations of the aerosol rapidly become independent of the number initially nucleated, so that conclusions as to the nucleation process, either homogeneous or ion-induced nucleation, cannot easily be drawn from existing atmospheric observations. The final concentration is very insensitive to the magnitude of the SO2 source, but, if condensation on, and coagulation with, a remnant background aerosol occurs, such nucleation events will be cut off for source magnitudes less than a specific value. Anthropogenic emissions of SO2 which exceed this value can produce higher aerosol number concentrations in the atmosphere with consequences for the indirect effect of aerosols on the climate.  相似文献   
10.
A comparative study for the nucleation of diamond was carried out using surface treatment like (i) surface scratching with 1 μm diamond paste and (ii) surface etching using chlorine plasma at different RF powers (50, 100 and 150 W). Atomic force microscopic study shows variation in roughness from 31 nm to 110 nm. Scratching results in random scratches, whereas plasma etches a surface uniformly. Scanning electron microscopic observations show well faceted crystallites with a predominance of angular shaped grains corresponding to 〈100〉 and 〈110〉 crystallite surfaces for the scratched as well as plasma etched substrate. Surface etching at 150 W plasma power results in a better growth in comparison with 50 and 100 W plasma powers. Chlorine-radical is found responsible for the changes in the growth morphology. Raman spectroscopy shows a sharp peak at 1,332 cm−1 and a peak at ∼1,580 cm−1 for both samples.  相似文献   
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