Characterization of HgCdTe Diodes on Si Substrates Using Temperature-Dependent Current-Voltage Measurements and Deep Level Transient Spectroscopy

Reverse current in diodes can be dominated by generation processes, depending exponentially on temperature according to the rate-limiting step in the generation process. In this report, the current-voltage-temperature (IVT) relationship is analyzed for several midwave infrared and long-wave infrared (MWIR x = 0.295, LWIR x = 0.233) Hg_1−x Cd _x Te (MCT) diodes. The energy varied from diode to diode. At high reverse biases, the energy tends toward the band gap energy. Close to zero bias, the energy ranged from 0.06 to 0.1 eV. Deep level transient spectroscopy (DLTS) showed a broad peak centered at 55–80 K for the MWIR MCT. Comparison of the DLTS spectrum to a simulation based on the energy and capture cross section from a rate window analysis shows that the peak is a band of traps. The capacitance transient amplitude increased as the filling pulse increased from 1 μs to 0.1 s, consistent with capture at a dislocation. A shift to lower temperatures for the peak was also observed when the diodes are cooled under forward bias. The shift is reversible, indicating that the traps consist at least partially of a bistable defect.     

Design and development of multicolor MWIR/LWIR and LWIR/VLWIR detector arrays

Multicolor infrared (IR) focal planes are required for high-performance sensor applications. These sensors will require multicolor focal plane arrays (FPAs) that will cover various wavelengths of interest in mid wavelength infrared/long wavelength infrared (MWIR/LWIR) and long wavelength infrared/very long wavelength infrared (LWIR/VLWIR) bands. There has been significant progress in HgCdTe detector technology for multicolor MWIR/LWIR and LWIR/VLWIR FPAs.^1–3 Two-color IR FPAs eliminate the complexity of multiple single-color IR FPAs and provide a significant reduction of weight and power in simpler, reliable, and affordable systems. The complexity of a multicolor IR detector MWIR/LWIR makes the device optimization by trial and error not only impractical but also merely impossible. Too many different geometrical and physical variables need to be considered at the same time. Additionally, material characteristics are only relatively controllable and depend on the process repeatability. In this context, the ability of performing “simulation experiments” where only one or a few parameters are carefully controlled is paramount for a quantum improvement of a new generation of multicolor detectors for various applications.     

Inductively coupled plasma etching for large format HgCdTe focal plane array fabrication

Inductively coupled plasma (ICP) using hydrogen-based gas chemistry has been developed to meet requirements for deep HgCdTe mesa etching and shallow CdTe passivation etching in large format HgCdTe infrared focal plane array (FPA) fabrication. Large format 2048×2048, 20-μm unit-cell short wavelength infrared (SWIR) and 2560×512, 25-μm unit-cell midwavelength infrared (MWIR) double-layer heterojunction (DLHJ) p-on-n HgCdTe FPAs fabricated using ICP processing exhibit >99% pixel operability. The HgCdTe FPAs are grown by molecular beam epitaxy (MBE) on Si substrates with suitable buffer layers. Midwavelength infrared detectors fabricated from 4-in. MBE-grown HgCdTe/Si substrates using ICP for mesa delineation and CdTe passivation etching demonstrate measured spectral characteristics, RoA product, and quantum efficiency comparable to detectors fabricated using wet chemical processes. Mechanical samples prepared to examine physical characteristics of ICP reveal plasma with high energy and low ion angle distribution, which is necessary for fine definition, high-aspect ratio mesa etching with accurate replication of photolithographic mask dimensions.     

Arsenic-doped mid-wavelength infrared HgCdTe photodiodes

The recently developed Te-rich, liquid-phase-epitaxy growth technology for low arsenic-doped mid-wavelength infrared (MWIR) HgCdTe with p-type doping concentrations <10¹⁵ cm⁻³ has enabled the fabrication of n⁺/p photodiodes using the damage associated with a boron ion implantation. The diode properties are presented and compared to similar diodes fabricated in p-HgCdTe doped with Group IBs. The attraction of the arsenic-doped diode technology is associated with the fact that the arsenic resides on the Te sublattice and is immune to the Hg interstitial fluxes that are present in the diode-formation process. This leads to minimal diode spread, limited primarily to the n⁺ region and, hence, a potential for use in really high-density infrared focal planes. At the same time, the Hg interstitials generated in the diode-formation process should purge the photodiode volume of fast diffusing species, resulting in a high-quality, diode-depletion region devoid of many Shockley-Read recombination centers. These aspects of diode formation in this material are discussed.     

Ten-inch molecular beam epitaxy production system for HgCdTe growth

Growth of Hg_1−xCd_xTe by molecular beam epitaxy (MBE) has been under development since the early 1980s at Rockwell Scientific Company (RSC), formerly the Rockwell Science Center; and we have shown that high-performance and highly reproducible MBE HgCdTe double heterostructure planar p-on-n devices can be produced with high throughput for various single- and multiplecolor infrared applications. In this paper, we present data on Hg_1−xCd_xTe epitaxial layers grown in a ten-inch production MBE system. For growth of HgCdTe, standard effusion cells containing CdTe and Te were used, in addition to a Hg source. The system is equipped with reflection high energy electron diffraction (RHEED) and spectral ellipsometry in addition to other fully automated electrical and optical monitoring systems. The HgCdTe heterostructures grown in our large ten-inch Riber 49 MBE system have outstanding structural characteristics with etch-pit densities (EPDs) in the low 10⁴ cm⁻² range, Hall carrier concentration in low 10¹⁴ cm⁻³, and void density <1000 cm². The epilayers were grown on near lattice-matched (211)B Cd_0.96Zn_0.04Te substrates. High-performance mid wavelength infrared (MWIR) devices were fabricated with R₀A values of 7.2×10⁶ Ω-cm² at 110 K, and the quantum efficiency without an antireflection coating was 71.5% for cutoff wavelength of 5.21 μm at 37 K. For short wavelength infrared (SWIR) devices, an R₀A value of 9.4×10⁵ Ω-cm² at 200 K was obtained and quantum efficiency without an antireflection coating was 64% for cutoff wavelength of 2.61 μm at 37 K. These R₀A values are comparable to our trend line values in this temperature range.     

双色中波红外图像差异纹理特征分析方法研究

针对双色中波红外图像特征空间维数高,不易于对其双波段成像差异进行综合分析的问题,提出了一种基于赋权思想及雷达图的双波段图像差异纹理特征的分析方法。该方法首先构造一个特征选择矩阵,利用其选择出能够满足双波段图像差异分布规律的有效纹理特征;然后利用赋权思想将差异不显著的纹理特征去除;最后采用雷达图对保留下的差异特征进行高维显示,并由雷达图中多边形的形状信息得到维数较少的图形特征。实验数据表明,降维后的特征能够综合反映双波段图像的纹理差异幅度,为后期差异特征驱动的多级融合方法探索奠定了基础。     

中波红外光学系统无热化设计

介绍了无热化在红外光学系统中的作用和意义,分析了温度对光学参量的影响,探讨了无热化设计方法及光学被动式无热化基本原理.设计了一种用于320×256制冷型探测器光学被动式无热化中波红外光学系统,镜筒材料采用钛合金,光学材料为硅、锗和硒化锌组合消热差.该系统在-50~70℃温度范围内,最大离焦量小于1倍焦深,空间分辨率17 lp/mm处,光学调制传递函数(MTF)值大于0.7,比较接近衍射极限,探测器单像元内能量集中度大于84%.分析结果表明:该系统具有良好的成像质量和无热效果.     

A novel simultaneous unipolar multispectral integrated technology approach for HgCdTe IR detectors and focal plane arrays

In the last few years Rockwell has developed a novel simultaneous unipolar multispectral integrated HgCdTe detector and focal plane array technology that is a natural and relatively straightforward derivative of our baseline double layer planar heterostructure (DLPH) molecular beam epitaxial (MBE) technology. Recently this technology was awarded a U.S. patent. This simultaneous unipolar multispectral integrated technology (SUMIT) shares the high performance characteristics of its DLPH antecedent. Two color focal plane arrays with low-10¹³ cm⁻²s⁻¹ background limited detectivity performance (BLIP D^*) have been obtained for mid-wave infrared (MWIR, 3–5 m) devices at T>130 K and for long-wave infrared (LWIR, 8–10 m) devices at T∼80 K.     

Status of the MBE technology at leti LIR for the manufacturing of HgCdTe focal plane arrays

This paper presents recent developments that have been made in Leti Infrared Laboratory in the field of molecular beam epitaxy (MBE) growth and fabrication of medium wavelength and long wavelength infrared (MWIR and LWIR) HgCdTe devices. The techniques that lead to growth temperature and flux control are presented. Run to run composition reproducibility is investigated on runs of more than 15 consecutively grown layers. Etch pit density in the low 10⁵ cm⁻² and void density lower than 10³ cm⁻² are obtained routinely on CdZnTe substrates. The samples exhibit low n-type carrier concentration in the 10¹⁴ to 10¹⁵ cm⁻³ range and mobility in excess of 10⁵ cm²/Vs at 77 K for epilayers with 9.5 μm cut-off wavelength. LWIR diodes, fabricated with an-on-p homojunction process present dynamic resistance area products which reach values of 8 10³ Ωcm² for a biased voltage of −50 mV and a cutoff wavelength of 9.5 μm at 77 K. A 320 × 240 plane array with a 30 μm pitch operating at 77 K in the MWIR range has been developed using HgCdTe and CdTe layers MBE grown on a Germanium substrate. Mean NEDT value of 8.8 mK together with an operability of 99.94% is obtained. We fabricated MWIR two-color detectors by the superposition of layers of HgCdTe with different compositions and a mixed MESA and planar technology. These detectors are spatially coherent and can be independently addressed. Current voltage curves of 60 × 60 μm² photodiodes have breakdown voltage exceeding 800 mV for each diode. The cutoff wavelength at 77 K is 3.1 μm for the MWIR-1 and 5 μm for the MWIR-2.     

一种轴向变倍四视场中波红外光学系统

设计了一款长焦距大变倍比轴向变倍四视场中波红外光学系统.该光学系统由前固定组、变倍调焦组、中间补偿组、后固定组、反射镜一、反射镜二、中继组组成.光学系统采用光学补偿叠加机械补偿方式克服单一光学补偿或机械补偿变焦方式无法同时满足光学系统长焦距、大变倍比、光学系统小型化、光学系统宽温度范围(-40℃~70℃)温度补偿等问题,实现了兼具长焦距和大变倍比的轴向变倍四视场中波红外光学系统.设计结果表明该光学系统像质良好,满足热象仪整机使用要求.