Large-area pattern transfer of metallic nanostructures on glass substrates via interference lithography

In this paper, we report a simple and effective nanofabrication method for the pattern transfer of metallic nanostructures over a large surface area on a glass substrate. Photoresist (PR) nano-patterns, defined by laser interference lithography, are used as template structures where a metal film of controlled thickness is directly deposited and then transferred onto a glass substrate by the sacrificial etching of the PR inter-layer. The laser interference lithography, capable of creating periodic nano-patterns with good control of their dimensions and shapes over a relatively large area, allows the wafer-scale pattern transfer of metallic nanostructures in a very convenient way. By using the approach, we have successfully fabricated on a glass substrate uniform arrays of hole, grating, and pillar patterns of Ti, Al, and Au in varying pattern periodicities (200 nm-1 μm) over a surface area of up to several cm(2) with little mechanical crack and delamination. Such robust metallic nanostructures defined well on a transparent glass substrate with large pattern coverage will lead to advanced scientific and engineering applications such as microfluidics and nanophotonics.