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ZnO纳米棒与Si(111)和Si(100)衬底的外延关系(英文)
引用本文:唐斌,邓宏,张强,税正伟,刘忠华. ZnO纳米棒与Si(111)和Si(100)衬底的外延关系(英文)[J]. 微纳电子技术, 2011, 48(4): 237-241. DOI: 10.3969/j.issn.1671-4776.2011.04.007
作者姓名:唐斌  邓宏  张强  税正伟  刘忠华
作者单位:1. 西南石油大学理学院,成都,610500
2. 电子科技大学电子薄膜与集成器件国家重点实验室,成都,610054
基金项目:the Research Foundation of Education Bureau of Sichuan Province of China (10ZB066); the Natural Science Foundation of Southwest Petroleum University of China (2010XJZ197)
摘    要:运用热蒸发技术在Si(111)和Si(100)基片上制备了ZnO纳米棒。SEM表征显示,ZnO纳米棒的直径约100nm,长度均匀,大约3μm;XRD表征发现ZnO纳米棒沿[0001]晶向择优生长。通过实验结果与理论分析得出:对于Si(111)基片上的样品,大部分ZnO纳米棒沿6个对称方向生长,而且与基片之间的夹角为54.7°,ZnO与Si(111)的外延关系为[0001]ZnO‖[114]Si,[0001]ZnO‖[4]Si,[0001]ZnO‖[141]Si,[0001]ZnO‖[4]Si,[0001]ZnO‖[411]Si,或[0001]ZnO‖[4]Si。对于Si(100)基片上的样品,大部分ZnO纳米棒沿4个对称方向生长,与基片之间的夹角为70.5°,其外延关系为[0001]ZnO‖[114]Si,[0001]ZnO‖[4]Si,[0001]ZnO‖[14]Si,或[0001]ZnO‖[14]Si。通过比较分析得出Si基片可以控制ZnO纳米棒的生长方向。

关 键 词:ZnO纳米棒  热蒸发  外延生长  晶格常数  失配

Epitaxial Relationship of ZnO Nanorods with Si(111)and Si(100) Substrates
Tang Bin,Deng Hong,Zhang Qiang,Shui Zhengwei,Liu Zhonghua. Epitaxial Relationship of ZnO Nanorods with Si(111)and Si(100) Substrates[J]. Micronanoelectronic Technology, 2011, 48(4): 237-241. DOI: 10.3969/j.issn.1671-4776.2011.04.007
Authors:Tang Bin  Deng Hong  Zhang Qiang  Shui Zhengwei  Liu Zhonghua
Affiliation:Tang Bin1,Deng Hong2,Zhang Qiang1,Shui Zhengwei1,Liu Zhonghua1(1.School of Science,Southwest Petroleum University,Chengdu 610500,China2.National Key Laboratory of Electronic Thin Films and Integrate Devices,University of Electronic Science and Technology of China,Chengdu 610054,China)
Abstract:The zinc oxide (ZnO) nanorods were synthesized using aurum as the catalyst on the n-type Si (111) and Si (100) substrates with the thermal evaporation technique. The SEM result shows that the diameter of the ZnO nanorods is about 100 nm with uniform length of about 3 μm, and the XRD result indicates that the ZnO nanorods exhibit [0001] orientation. Through the experimental results and theory analysis, the majority of the nanorods on the silicon (111)substrate grow in one of the six directions at an angle of 54. 7°off the substrate plane with the epitaxial relation of ZnO and Si (111) as [0001]ZnO ‖ [114]S1, [0001]ZnO ‖ [(1-1-)4]S1, [0001]ZnO ‖[141]Si, [0001]ZnO ‖ [(1-)4(1-)]Si, [0001]ZnO ‖ [411]Si or [0001]ZnO ‖ Si. The majority of the nanorods on the Si (100) substrate grow in one of the four directions at an angle of 70. 5° off the substrate plane with the epitaxial relation of ZnO and Si (100) as [0001]ZnO ‖ [114]Si,[0001]ZnO ‖ [(1-1-)4]Si, [0001]ZnO ‖ [1(1-)4]s1 or [0001]ZnO ‖ [(1-)14]Si. The comparison result indicates that the growing orientation of ZnO nanorods can be controlled by Si substrate.
Keywords:ZnO nanorod  thermal evaporation  epitaxial growth  crystal lattice constant  mismatch  
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