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SOI/SDB薄膜全耗尽隐埋n—MOSFET导电机理研究
引用本文:周天舒 黄庆安. SOI/SDB薄膜全耗尽隐埋n—MOSFET导电机理研究[J]. 微电子学, 1992, 22(5): 42-46
作者姓名:周天舒 黄庆安
作者单位:东南大学微电子中心,东南大学微电子中心,东南大学微电子中心 南京 210018,南京 210018,南京 210018
摘    要:
本文详细研究了SOI/SDB薄膜全耗尽隐埋n沟 MOSFET的器件结构及导电机理,建立了明确的物理解析模型,给出了各种状态下器件工作电流的解析表达式。最后,将解析模型的计算结果与实验数据进行了比较和讨论。

关 键 词:薄膜 MOSFET器件 导电机理

A Study on the Conduction Mechanism of Thin-Film SOI/SDB MOSFETs With Fully-Depleted Buried n-Channel
Zhou Tianshu,Huang Qing'an and Tong QinyiMicroelectronics Center,Southeast University,,Nanjing,Jiangsu. A Study on the Conduction Mechanism of Thin-Film SOI/SDB MOSFETs With Fully-Depleted Buried n-Channel[J]. Microelectronics, 1992, 22(5): 42-46
Authors:Zhou Tianshu  Huang Qing'an  Tong QinyiMicroelectronics Center  Southeast University    Nanjing  Jiangsu
Affiliation:Zhou Tianshu,Huang Qing'an and Tong QinyiMicroelectronics Center,Southeast University,210018,Nanjing,Jiangsu
Abstract:
Conduction mechanism for thin film SOI/SDB MOSFETs with fully depleted buried n-channel is explored in detail in the paper. A definite physically analytical model has been developed and analytical expressions for operating current in the device under different conditions have been provided. Finally,calculated results based on this model and the experimental results are compared and discussed.
Keywords:SOI/SDB  Thin film  MOSFET  Conduction mechanism
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