Production and characterization of Si-N films obtained by r.f. magnetron sputtering

Si-N films were deposited by sputtering from an Si₃N₄ target with different deposition pressures and negative substrate bias. The films were amorphous and showed a “featureless” morphology. A high oxygen content was detected in unbiased films. For these films the Si/N ratio was very high compared with the target composition, whereas for biased films the opposite was observed. Si-N films presented cohesive failures for loads as high as 21 N and adhesive failure at 45 N when they were analysed by scratch test. Very high hardness (45 GPa) was obtained, particularly for biased films. Unbiased films were softer, which is attributed to the formation of silicon oxide and/or to a lower compressive stress level.