Characterization of PIII textured industrial multicrystalline silicon solar cells |
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| Authors: | Jie Liu Bangwu Liu Zenan Shen Jinhu Liu Sihua Zhong Su Liu Chaobo Li Yang Xia |
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| Affiliation: | 1. Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;2. Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China;1. School of Information and Communication Engineering, Sungkyunkwan University, Suwon, 440-746, Republic of Korea;2. Korea Institute of Machinery and Material, 171 Jang-dong, Yuseong-Gu, Daejeon, 305-343, Republic of Korea;1. Institute of Solar Energy, and Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, People?s Republic of China;2. School of Science, Huaihai Institute of Technology, Lianyungang 222005, Jiangsu Province, People?s Republic of China;3. Collaborative Innovation Center of Advanced Microstructures, Nanjing 210093, People?s Republic of China;1. State Key Laboratory of Complex Nonferrous Metal Resources Clean Utilization/Faculty of Metallurgical and Energy Engineering, Kunming University of Science and Technology, Kunming 650093, China;2. Department of Mechanical, Materials and Aerospace Engineering, Illinois Institute of Technology, Chicago, USA;1. Fraunhofer Institute for Solar Energy Systems (ISE), Heidenhofstr. 2, 79110 Freiburg, Germany;2. Nines Photovoltaics, Synergy Centre, IT Tallaght, Dublin 24, Ireland;1. Space and Propulsion Centre Singapore, Plasma Sources and Applications Centre, National Institute of Education, Nanyang Technological University, 1 Nanyang Walk, 637616 Singapore, Singapore;2. School of Chemistry, Physics and Mechanical Engineering, Queensland University of Technology, Brisbane, Queensland, Australia |
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| Abstract: | ![]()
Optimized textured structure is one of the most important elements for high efficiency multicrystalline silicon solar cells. In this paper, in order to incorporate low reflectance nanostructures into conventional industrial solar cells, structures with aspect ratios of about 1:1 and average reflectance of 8.0% have been generated using plasma immersion ion implantation. A sheet resistance of 56.9 Ω/sq has been obtained by adjusting the phosphorous diffusion conditions, while the thickness of the silicon nitride vary in 70–80 nm by extending the deposition time by 100 s. Under the conventional co-firing conditions, a solar cell with efficiency of 16.3% and short-circuit current density 34.23 mA/cm2 has been fabricated. |
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