薄膜均匀性的分析研究

目前,薄膜在现代科学技术中的重要性与日俱增,基本上各种技术都离不开薄膜。薄膜均匀性在光学、光电及微机电系统(MEMS)等器件的加工工艺中起着不可估量的作用。首先,对点源小面积薄膜均匀性的公式进行理论推导;其次,分析了平面和球面夹具的基片薄膜均匀性公式,并根据这些理论公式着重分析影响薄膜均匀性的各种因素以及改进措施;最后,通过对实验数据的分析研究来不断地改进薄膜均匀性的夹具,改善器件的膜厚均匀性、一致性,从而达到提高器件的稳定性和可靠性,降低生产成本的目的。

Study and Analysis on the Film Uniformity

The importance of the film technology in modern science and technology is increasing daily.The film uniformity plays an importance role in the manufacturing of the optical.Optoelectronic and MEMS devices.In this paper,the formulas of the small area film uniformity in the point source are derived.Then the formulas of the base film uniformity of the plane and spherical fixtures are studied.Various factors affecting the film uniformity are also analyzed with these formulas.The results obtained can be used to improve the stabilities and reliabilities of the devices,thus reduce the cost.