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Kinetics of hydrogen underpotential deposition at polycrystalline rhodium in acidic solutions
Authors:B. ?osiewicz  R. Jurczakowski  A. Lasia
Affiliation:aInstitute of Materials Science, University of Silesia, 12 Bankowa, 40-007 Katowice, Poland;bDepartment of Chemistry, University of Warsaw, ul. Pasteura 1, 02-093 Warsaw, Poland;cDépartement de chimie, Université de Sherbrooke, 2500 blvd. de l’Universite, Sherbrooke, Québec, J1K 2R1, Canada
Abstract:Kinetics of hydrogen underpotential deposition (H UPD) reaction at smooth polycrystalline rhodium wire has been studied in 0.1 M H2SO4 and HClO4 using cyclic voltammetry and electrochemical impedance spectroscopy. Real surface area of the Rh electrodes was determined by hydrogen adsorption method.For all impedance spectra registered at potentials corresponding to the H UPD deviations from the ideal capacitive behavior was revealed and a constant phase element was used instead of capacitance for description of Rh impedance behavior. Double layer and adsorption capacitances and charge transfer resistances of the H UPD were determined as functions of the electrode potential. It has been found that the kinetics of the H UPD reaction at Rh is slower than that at polycrystalline Pt but similar to that found at polycrystalline Ru. Slightly higher values of Rct were determined in perchloric acid.
Keywords:Polycrystalline rhodium   Hydrogen underpotential deposition   H UPD kinetics   Electrochemical impedance spectroscopy   Surface roughness
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