| Abstract: | In general, high-temperature processes cause thermal stresses and diffusion of dopants, resulting in reduced device yields. It is thus desirable to reduce the number of high-temperature steps and the use of an in situ doping technique eliminates one such step. In this investigation, low-pressure chemical vapour deposition (LPCVD) and plasma-enhanced chemical vapour deposition (PECVD) have been utilised to deposit in situ doped polycrystalline silicon films. The process characteristics and properties such as spreading resistance, grain structure, etch rate using a plasma and dopant concentrations of these films have been investigated and explained using a simple model for dopant activation and grain growth. It is shown that good-quality films suitable for VLSI can be produced. |
