| 低能量离子束辐照磁控溅射沉积超硬质nc-TiN/nc-Cu纳米复合膜 |
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| 引用本文： | 李铸国,俞海良,吴毅雄,三宅正司.低能量离子束辐照磁控溅射沉积超硬质nc-TiN/nc-Cu纳米复合膜[J].金属学报,2006,42(9):993-997. |
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| 作者姓名： | 李铸国 俞海良 吴毅雄 三宅正司 |
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| 作者单位： | 1. 上海交通大学材料科学与工程学院,上海,200030
2. 近畿大学,大阪,577-8502,日本 |
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| 基金项目： | 国家自然科学基金;教育部留学回国人员科研启动基金 |
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| 摘 要： | 利用诱导型等离子体辅助双靶磁控溅射法在Si（100）基板表面沉积Cu含量（原子分数）为0～10．0％的Ti—Cu—N膜，研究了Cu含量对薄膜结构及硬度的影响．结果表明，添加少量Cu可极大地提高薄膜硬度．Cu含量为2．0％的Ti—Cu—N薄膜具有超硬特性，硬度HV达到42，约为纯TiN薄膜硬度的2倍．超硬质Ti—Cu—N薄膜为nc-TiN／nc—Cu纳米复合薄膜，具有柱状晶结构．薄膜的超硬特性源于薄膜的纳米复合结构．
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| 关 键 词： | 磁控溅射 离子照射 纳米复合膜 硬度 |
| 文章编号： | 0412-1961（2006）09-0993-05 |
| 收稿时间： | 2005-06-29 |
| 修稿时间： | 2005-06-292006-04-07 |
SUPERHARD nc-TiN/nc-Cu NANOCOMPOSITE FILM SYNTHESIZED BY MAGNETRON SPUTTERING WITH LOW ENERGY ION FLUX IRRADIATION |
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| LI Zhuguo, YU Hailiang, WU Yixiong,MIYAKE Shoji.SUPERHARD nc-TiN/nc-Cu NANOCOMPOSITE FILM SYNTHESIZED BY MAGNETRON SPUTTERING WITH LOW ENERGY ION FLUX IRRADIATION[J].Acta Metallurgica Sinica,2006,42(9):993-997. |
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| Authors: | LI Zhuguo YU Hailiang WU Yixiong MIYAKE Shoji |
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| Affiliation: | 1.School of Materials Science and Engineering, Shanghai Jiaotong University, Shanghai 200030 ;2. Kinki University, Osaka 577-8502, Japan |
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| Abstract: | Ti-Cu-N films containing approximately 0-10.0% Cu (atomic fraction) were synthe- sized by inductively coupled plasma assisted magnetron sputtering with two elemental targets.The effects of Cu content on film hardness and microstructure have been investigated.The addition of a small amount of Cu significantly enhanced film hardness.The Ti-Cu-N film containing 2.0%Cu has a superhard trait,with a hardness HV value of 42,which is nearly two times of that of pure TiN film.The superhard Ti-Cu-N film was characterized as a nanocomposite structure,consisting of nanocolumns of TiN crystallites with nanocrystal Cu inside the column boundaries.The hardness enhancement was attributed to nanocomposite effect. |
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| Keywords: | magnetron sputtering ion irradiation nanocomposite film hardness |
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