| 应用L-MBE方法制备ZnO薄膜的结构和光学特性 |
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| 引用本文： | 张世玉,李清山,张立春,李平,马自侠,张志峰.应用L-MBE方法制备ZnO薄膜的结构和光学特性[J].新技术新工艺,2010(12):79-83. |
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| 作者姓名： | 张世玉 李清山 张立春 李平 马自侠 张志峰 |
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| 作者单位： | [1]鲁东大学物理学院,山东烟台264025 [2]海军航空工程学院,山东烟台264001 |
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| 基金项目： | 山东省自然科学基金，海军航空工程学院基础研究基金 |
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| 摘 要： | 用激光分子束外延(Laser Molecular Beam Epitaxy,L-MBE)设备在p型Si(111)衬底上制备了不同衬底温度和不同氧压的ZnO薄膜,用X射线衍射仪(XRD)和原子力显微镜(AFM)分别对薄膜的结构和形貌进行了分析,用He-Cd激光(325nm)激发的光致发光测试系统对薄膜进行了荧光光谱分析。研究发现,在衬底温度为400℃,氧压1Pa左右所制备的ZnO薄膜表面比较均匀致密,晶粒生长较充分,有较高的结晶质量和发光强度。ZnO薄膜的近带边发射与薄膜的结晶质量和化学配比均有关系。
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| 关 键 词： | 激光分子束外延 ZnO薄膜 结构特性 光致发光 |
The Structural and Optical Properties of ZnO Thin Films by L-MBE |
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| ZHANG Shiyu,LI Qingshan,ZHANG Lichun,LI Ping,MA Zixia,ZHANG Zhifeng.The Structural and Optical Properties of ZnO Thin Films by L-MBE[J].New Technology & New Process,2010(12):79-83. |
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| Authors: | ZHANG Shiyu LI Qingshan ZHANG Lichun LI Ping MA Zixia ZHANG Zhifeng |
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| Affiliation: | 1.Department of Physics,Ludong University,Yantai 264025,China;2.Naval Aeronautical Engineering Institute,Yantai 264001,China) |
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| Abstract: | ZnO films were fabricated on p-type Si（111） substrates by laser molecular beam epitaxy（L-MBE） at different substrate temperatures and different oxygen pressure.The structure and morphological properties of the films were investigated by X-ray diffraction（XRD） and atomic force microscope（AFM） measurements respectively.The optical properties of the films were studied by photoluminescence spectra using a 325 nm He-Cd laser.It was found that the film grew at the substrate temperature of 400 ℃ and the oxygen pressure of 1 Pa has a much smoother and denser morphology,ideal crystalline quality and better optical properties.Near the band edge emission of ZnO thin films are involved in the crystal quality and chemical ratios. |
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| Keywords: | L-MBE ZnO thin film Structural property Photoluminescence |
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