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GaAs基长波长InAs耦合量子点材料的分子束外延生长
引用本文:朱岩,李密锋,贺继方,喻颖,倪海桥,徐应强,王娟,贺振宏,牛智川.GaAs基长波长InAs耦合量子点材料的分子束外延生长[J].半导体学报,2011,32(8):083001-4.
作者姓名:朱岩  李密锋  贺继方  喻颖  倪海桥  徐应强  王娟  贺振宏  牛智川
作者单位:中国科学院半导体研究所,中国科学院半导体研究所,中国科学院半导体研究所,中国科学院半导体研究所,中国科学院半导体研究所,中国科学院半导体研究所,中国科学院半导体研究所,中国科学院半导体研究所,中国科学院半导体研究所
基金项目:国家基础研究重大项目基金;国家自然科学基金
摘    要:系统介绍了利用分子束外延方法在纯GaAs材料上生长InAs/GaAs耦合量子点结构。讨论了生长温度和上下两层量子点中InAs的淀积量对于材料发光性质和表面形貌的影响。通过优化生长参数,得到了室温发光波长在1.436μm,FWHM为27meV的耦合量子点材料。第二层量子点的密度在9109到1.41010cm-2之间。耦合量子点结构为拓展GaAs基材料在量子功能器件应用中的发光波长提供了新的途径。

关 键 词:分子束外延生长  GaAs  量子点  砷化铟  长波长  矩阵结构  量子功能器件  InAs
收稿时间:2/28/2011 7:55:54 PM
修稿时间:3/22/2011 4:13:50 PM

GaAs-based long-wavelength InAs bilayer quantum dots grown by molecular beam epitaxy
Zhu Yan,Li Mifeng,He Jifang,Yu Ying,Ni Haiqiao,Xu Yingqiang,Wang Juan,He Zhenhong and Niu Zhichuan.GaAs-based long-wavelength InAs bilayer quantum dots grown by molecular beam epitaxy[J].Chinese Journal of Semiconductors,2011,32(8):083001-4.
Authors:Zhu Yan  Li Mifeng  He Jifang  Yu Ying  Ni Haiqiao  Xu Yingqiang  Wang Juan  He Zhenhong and Niu Zhichuan
Affiliation:State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
Abstract:
Keywords:InAs bilayer quantum dots  molecular beam epitaxy  long wavelength  photoluminescence
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