| 超高密度磁记录的课题与展望 |
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| 引用本文： | 郭伟,赵争强,王飞.超高密度磁记录的课题与展望[J].信息记录材料,2004,5(3):49-54. |
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| 作者姓名： | 郭伟 赵争强 王飞 |
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| 作者单位： | 1. 中国乐凯胶片集团公司,保定,071054
2. 中国人民银行保定中心支行,保定,071000 |
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| 摘 要： | 介绍了超高密度记录的研究开发状况 ,论述了垂直磁记录技术的课题以及采用TMR磁头的、记录密度为Subterabit in2 的记录 读出特性。作为高密度记录所必需的头 盘界面技术 ,提出了接触记录技术的课题 ,还就STM (Scanningtunnelingmicroscopy)存储器论述了未来超高密度技术
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| 关 键 词： | 垂直磁记录 TMR磁头 耐磨性 接触记录 STM存储器 |
| 文章编号： | 1009-5624(2004)03-0049-0006 |
| 修稿时间： | 2003年4月23日 |
Prospects and Subjects for High Recording Density |
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| GUO Wei,ZHAO Zheng-qiang,WANG Fei.Prospects and Subjects for High Recording Density[J].Information Recording Materials,2004,5(3):49-54. |
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| Authors: | GUO Wei ZHAO Zheng-qiang WANG Fei |
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| Affiliation: | GUO Wei~1,ZHAO Zheng-qiang~2,WANG Fei~1 |
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| Abstract: | The NEC’s research and development for ultra-high recording density is described.The subjects for perpendicular magnetic recording have been discussed.Read/write characteristics of Subterabit/in~2 high-density recording TMR (Tunneling magnetic resistance) head are estimated.Subjects for contact recording techniques and STM (Scanning tunneling microscopy)memory are also described. |
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| Keywords: | Perpendicular magnetic recording TMR head Pass wear resistance Contact recording STM memory |
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