| 净化厂房中气相分子沾污(AMC)的来源和危害 |
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| 引用本文： | 潘文伟,蔡蕾.净化厂房中气相分子沾污(AMC)的来源和危害[J].电子与封装,2012(12):44-48. |
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| 作者姓名： | 潘文伟 蔡蕾 |
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| 作者单位： | 华润上华半导体有限公司;中国电子科技集团公司第58研究所 |
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| 摘 要： | 越来越多的研究发现,在半导体圆片加工净化厂房中,除了存在空气悬浮颗粒沾污外,还存在以气相或蒸汽形式存在的分子污染物(Airborne Molecular Contaminants,AMC)。随着特征尺寸(CD)的不断缩小,AMC将会越来越严重地影响圆片加工质量和成品率,并会影响净化厂房内工作人员的身体健康。文章介绍了AMC的分类、来源、危害性、控制标准和方法,希望以此引起人们对AMC的重视,并采取相应的控制措施。
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| 关 键 词： | 净化厂房 空气中分子污染物 酸性分子污染物 碱性分子污染物 可凝结的分子有机化合物 分子掺杂物 |
Sources and Effects of AMC in Clean Rooms |
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| PAN Wenwei,CAI Lei.Sources and Effects of AMC in Clean Rooms[J].Electronics & Packaging,2012(12):44-48. |
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| Authors: | PAN Wenwei CAI Lei |
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| Affiliation: | 1.Facilities Department,China Resources CSMC Semiconductor Ltd.,Wuxi 214035,China;2.China Electronics Technology Group Corporation No.58 Research Institute,Wuxi 214035,China) |
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| Abstract: | More and more investigations hanve shown that,as the criticle dimension(CD) continually shrinks,in addition to particle contamination,airborne molecular contaminants(AMC) in clean rooms have a detrimental effect on the process and product yield,as well as on the health of the operators and engineers working in clean rooms.The source,effects,control standards of AMC are described to help understand and take appropriate measures to control AMC. |
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| Keywords: | clean room airborne molecular contaminants(AMC) molecular acids(MA) molecular base(MB) molecular condensable(MC) molecular dopants(MD) |
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