AFM study of the surface morphology of L-CVD SnO2 thin films

In this paper we present the results of Atomic Force Microscopy (AFM) characterisation of the surface morphology of the L-CVD SnO₂ thin films prepared by L-CVD technology and studied after exposure to air, dry air oxidation, and ion beam profiling. The L-CVD SnO₂ thin films after air exposure have a very smooth surface morphology with an average surface roughness (RMS) smaller than 0.5 nm, and average and maximal grain heights of about 1 and 2 nm, respectively. After dry air oxidation the L-CVD SnO₂ thin films exhibit an average surface roughness (RMS), as well as the average and maximal grain height, increased by one order of magnitude. Finally, after the ion beam profiling the L-CVD SnO₂ thin films exhibit an evidently disordered structure with a lot of craters. These experiments showed that the L-CVD SnO₂ thin films exhibit a very high quality surface morphology, what can be useful for solar cells and gas sensors application.